In the method for scrubbing a chemical from a medium, wherein the improvement comprises the steps of using a carbide derived carbon to adsorb the chemical which may later be released by heating. The carbide derived carbon may be a powder, a fiber, a solid foam, a mesh, or other solid form. The carbide derived carbon can adsorb a chemical in the gaseous, liquid, particulate, or aerosol phase.

A method of obtaining helium from a process gas. The process gas is at a pressure less than 15 bar to a first membrane separation stage having a first membrane more readily permeable for helium than for at least one other component in the process gas. A first retentate stream is fed to a second membrane separation stage having a second membrane more readily permeable for helium than for at least one other component in the process gas. Helium is separated from a first helium-containing permeate stream using a pressure swing adsorption to obtain a helium-containing product stream. A second helium-containing permeate stream is recycled to the first membrane separation stage. A purge gas from the pressure swing adsorption is also recycled to the first membrane separation stage.

Provided are a microorganism including a gene encoding a protein having a dehalogenase activity, a composition including the microorganism for use in reducing a concentration of a fluorine-containing compound in a sample, and a method of reducing the concentration of the fluorine-containing compound in the sample by using the microorganism.

The invention relates to a composition for the purification of flue gas containing 1 to 99 wt. % of a powder of a sodium salt of carbonic acid and 1 to 99 wt. % of a powder of an absorptive material, wherein the powder of an absorptive material has a specific pore volume that is equal to or greater than 0.1 cm.sup.3/g. The invention also relates to a process for dry flue gas purification and the use of an absorptive material to improve the flowability and/or storability and/or HF absorptivity of a sodium salt of carbonic acid.

The invention relates to a composition for the purification of flue gas containing 35 to 99 wt. % of a powder of an alkali metal salt of carbonic acid and 1 to 65 wt. % of a powder of an absorptive material, wherein the powder of an absorptive material has a specific pore volume that is equal to or greater than 0.1 cm.sup.3/g. The invention also relates to a process for dry flue gas purification and the use of an absorptive material to improve the flowability and/or storability and/or HF absorptivity of an alkali metal salt of carbonic acid.

A process is described for removing halogen compounds, particularly chlorine compounds, from a process fluid, comprising the steps of (i) passing a process fluid containing hydrogen halide over a first sorbent to remove hydrogen halide and generate a hydrogen halide depleted process fluid and then, (ii) passing the hydrogen halide depleted process fluid over a second different sorbent to remove organic halide compounds therefrom. A purification system suitable for removing hydrogen halide and organic halide compounds from process fluids is also described.

Implementations of the present disclosure relate to systems and techniques for abating F-gases present in the effluent of semiconductor manufacturing processes. In one implementation, a water and oxygen delivery system for a plasma abatement system is provided. The water and oxygen delivery system comprises a housing that includes a floor and a plurality of sidewalls that define an enclosed region. The water and oxygen delivery system further comprises a cylindrical water tank positioned on the floor, wherein a longitudinal axis of the cylindrical water tank is parallel to a plane defined by the floor and a length of the water tank is 1.5 times or greater than the diameter of the cylindrical water tank. The water and oxygen delivery system further comprises a flow control system positioned within the housing above the cylindrical water tank.

Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.

A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.

Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.