Method for scrubbing sulfuryl fluoride, which is accomplished by placing a fluid comprising sulfuryl fluoride in contact with an aqueous solution of a base and a peroxide having at least oneOOH group. Also described is kit suitable for use with the sulfuryl fluoride scrubbing method.

The present invention relates to a process for producing methanol (MeOH) and hydrogen (H.sub.2) from methane, comprising the steps: a) providing a gaseous feed stream comprising methane; b) reacting said gaseous feed stream with at least one halogen reactant (X.sub.2), under reaction conditions effective to produce an effluent stream comprising methyl halide (MeX), hydrogen halide (HX); c) separating from the effluent stream obtained in step b): (i) a methyl halide (MeX) stream, optionally comprising unreacted methane; and, (ii) a hydrogen halide (HX) stream; d) reacting the methyl halide (MeX) stream separated in step c) with a solid metal hydroxide (MOH.sub.(s)) under reaction conditions effective to produce metal halide (MX) and methanol (MeOH); and, e) decomposing by means of electrolysis said hydrogen halide (HX) stream separated in step c) under conditions effective to produce a gaseous hydrogen (H.sub.2) stream and a stream comprising halogen reactant (X.sub.2).

There is provided a method for producing high-purity bromine pentafluoride while leaving a less amount of an unreacted fluorine gas. The method for producing bromine pentafluoride includes a reaction step of feeding a bromine-containing compound, which is at least one of a bromine gas and bromine trifluoride, and a fluorine gas to a reactor to give a (fluorine atom):(bromine atom) molar ratio, that is, F/Br of 3.0 or more and 4.7 or less and reacting the bromine-containing compound and the fluorine gas to each other to obtain a reaction mixture containing bromine pentafluoride and bromine trifluoride; and a separation step of separating bromine pentafluoride and bromine trifluoride in the reaction mixture from each other.

Systems and methods for reducing or mitigating violet or pink emissions are provided. In one aspect, a system comprises a process component that produces a process stream comprising iodines; an emissions component configured to process and exhaust emissions comprising iodine or iodide; and a reducing agent injection component configured to inject a reducing agent into the system at a point before a stream comprising iodide is received by the emissions component. In another aspect, a method comprises producing, by a process component, a process stream comprising iodines; injecting a reducing agent into the process stream comprising iodines and generating an emissions stream comprising iodides; receiving, by an emissions component, the emissions stream comprising iodides; and processing the emissions stream.

A desulfurization wastewater zero discharge treatment method and system suitable for multiple working conditions. A tail flue of a boiler and a bottom outlet of a wastewater drying tower are both communicated with an inlet of a dust collector; an outlet of the dust collector is communicated with flue gas inlets of a wastewater concentration tower and a desulfurization absorption tower; the wastewater concentration tower is communicated with the desulfurization absorption tower; the desulfurization absorption tower is communicated with a chimney; the desulfurization absorption tower is communicated with a gypsum cyclone; the gypsum cyclone is communicated with a filtrate water tank; the gypsum cyclone is communicated with a gypsum dewatering machine; the gypsum dewatering machine is communicated with a gas liquid separating tank; and a flue gas port of the tail flue of the boiler is communicated with the flue gas inlet of the wastewater drying tower.

A filtration membrane including a first layer having a triamine-functionalized copper oxide polysilicate mesoporous material, a second layer including a polysulfone, and a third layer including a polyester terephthalate. The triamine-functionalized copper oxide polysilicate mesoporous material includes a copper oxide polysilicate backbone and a silicon atom of a silicon-containing triamine bonded to a silicate group in the copper oxide polysilicate backbone. The copper oxide polysilicate backbone is datively bonded to one or more tetramines, and the silicon-containing triamine and one or more tetramines are covalently cross-linked with terephthaloyl chloride to form a polyamide.

Disclosed is a process stop loss reduction system, in which in case that pressure in a trapping apparatus and pressure in a process chamber are increased because of space clogging or the like caused by reaction by-products while the trapping apparatus for trapping of a reaction by-product contained in exhaust gas discharged from the process chamber operates over a long period of time during a semiconductor process, only the trapping apparatus, to which a supply of exhaust gas is cut off, may be quickly replaced while inert gas is received in an idle state and continuously supplied to a vacuum pump through a bypass pipe of the trapping apparatus without stopping an operation of (shutting down) a semiconductor manufacturing process chamber facility, and then the trapping apparatus may be supplied with the exhaust gas again.

An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas; an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction; and a collector configured to collect the powder.

A process includes providing a reactor containing a compound of the formula SiO.sub.x, wherein 0x2, and receiving, at the reactor, fluorinated gas. The process also includes obtaining a gaseous mixture formed at an elevated temperature in the reactor and removing silicon tetrafluoride from the gaseous mixture. An apparatus includes a reactor containing a compound of the formula SiO.sub.x, wherein 0x2, a component for receiving fluorinated gas at the reactor, a heating element for heating the compound of the formula SiO.sub.x and the fluorinated gas in the reactor, and a separation component for removing silicon tetrafluoride from a gaseous mixture formed in the reactor. A process of semiconductor manufacturing includes defluorinating exhaust gas using the process. A system for semiconductor manufacturing includes a set of components for carrying out the process.

An abatement apparatus includes: an abatement chamber configured to receive aneffluent stream and to provide an abated effluent stream; a wet scrubber located downstream of the abatement chamber, the wet scrubber being configured to receive the abated effluent stream and provide a scrubbed effluent stream; and a catalyst bed located downstream of the wet scrubber, the catalyst bed being configured to receive the scrubbed effluent stream and provide a remediated effluent stream. In this way, undesirable compounds present in the abated effluent stream, which are there because they were either already present in the effluent stream and were insufficiently abated by the abatement chamber or because they are abatement by-products generated within the abatement chamber, can be remediated, removed or reduced by the catalyst bed prior to being vented by the abatement apparatus.