A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.

The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe positioned above the semiconductor manufacturing equipment and having a top surface and a bottom surface extending parallel to the top surface; a first branch pipe including an upstream end coupled to a source of a gas mixture and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including an upstream end and a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

An apparatus for purifying a process gas containing at least one pollutant gas, having a reactor vessel, has a cylindrical region and a tapering region, and into which oxygen or an oxygen-containing gas can be introduced as a reaction gas into at least one gas inlet and can be discharged through at least one gas outlet. The at least one gas inlet introduces a defined volumetric flow of the reaction gas into the reactor vessel tangentially to a circumferential surface of the cylindrical region. The apparatus may have a pollutant gas inlet, which introduces a defined volumetric flow of the process gas containing at least one pollutant gas into the reactor vessel, so that the at least one pollutant gas and the reaction gas are mixed with each other in the direction of the gas outlet and chemically react with each other on their way through the reactor vessel.

Siloxane compounds are removed from the atmospheres by silica supporting an organic sulfonic acid compound. The silica with the organic sulfonic acid compound has a specific surface area down to 500 m.sup.2/g and up to 750 m.sup.2/g and a pore volume down to 0.8 m.sup.3/g and up to 1.2 m.sup.3/g, both measured by nitrogen gas adsorption method and has a pore diameter down to 4 nm and up to 8 nm, at the peak of differential pore volume measured by nitrogen gas adsorption method. The durability of gas sensing element against siloxanes is improved.

A heated inlet tube for use in a wet scrubber is disclosed. In one embodiment, the heated inlet tube comprises a heated tube concentric to the inlet tube to which a heated gas is applied thereby maintaining temperature of a waste gas stream as it flows through the inlet tube. In a further embodiment, an insulating tube concentrically surrounds the heated tube to further maintain the temperature of the waste gas stream.

A membrane process is provided for separating light olefins from light paraffins to produce a polymer grade light olefin product stream that is about 99.5 mol % ethylene or propylene. The process involves multiple stages to achieve the high purity product and provides for processing hydrocarbon streams that have differing concentrations of light olefins.

An air separation system includes an air separation module configured to receive feed air and separate the feed air into nitrogen-enriched air and oxygen-enriched air, a nitrogen-enriched air line for transporting the nitrogen-enriched air from the air separation module to a fuel tank for inerting, an oxygen sensing line connected to the nitrogen-enriched air line, a gas adsorption filter located in the oxygen sensing line, and an oxygen sensor downstream of the gas adsorption filter in the oxygen sensing line.

A reheating collection device for a gas phase process is provided with a container elongated in an axial direction along an axis to define a chamber, an inflow path and an exhaust path respectively in communication with the chamber and apart in the axial direction from each other, and a heater heating the chamber between the inflow path and the exhaust path.

A method for the purification of a raw gas stream by selective catalytic oxidation, in which organic and inorganic sulfur compounds, halogenated and non-halogenated volatile organic compounds are selectively oxidized without substantially oxidizing the lower hydrocarbons and the sulfur containing compounds present in the gas to sulfur trioxide and excess of oxygen is removed by oxidation of lower alcohols, ethers or hydrogen added to the raw gas stream upstream the catalytic oxidation.

A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The absorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.