An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.

A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.

Adsorbent materials are disclosed, along with filter elements containing the adsorbent materials methods of using adsorbents to remove siloxane contaminants from a gas stream. The method includes providing an adsorbent material that has been washed with an acid and passing a gas through the adsorbent material so as to reduce siloxane levels in the gas. A filter element for reducing siloxane levels in a gas includes a first adsorbent material, the first adsorbent material comprising an acid-washed adsorbent; and a second adsorbent material, the second adsorbent material comprising an acid-impregnated adsorbent.

A vacuum pump includes a vacuum pump having a discharge port to which an abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The vacuum pump includes a cylindrical member having an exhaust gas introduction port for introducing the exhaust gas to be treated and a gas outlet port for discharging gases which have been treated, a plurality of fuel nozzles provided at a circumferential wall of the cylindrical member for ejecting a fuel, and a plurality of air nozzles provided at the circumferential wall of the cylindrical member for ejecting air so as to form a swirling flow of air along an inner circumferential surface of the circumferential wall. The air nozzles are disposed at a plurality of stages spaced in an axial direction of the cylindrical member.

A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamber—and a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.

An object of the present invention is to provide a new frameless catalytic thermal oxidation device capable of treating concentrations of harmful materials including NOx at a low temperature. Further, another object of the present invention is to provide a frameless catalytic thermal oxidation device capable of minimizing the occurrence of THC and minimizing a risk of accidents and environmental pollution which may occur in maintenance operations. According to the objects, the present invention provides a cartridge-type thermal oxidation device capable of being separated for maintenance, wherein a cartridge internal structure is configured so that the time while the material to be treated stays in a zone with the catalyst is increased, and a member capable of dropping and collecting powder generated by thermal oxidation reaction is configured.

A hydrogen recycle system comprises a processing device, an electrochemical hydrogen purification device and a dewatering device. The processing device is used to receive and process a mixed gas and to remove harmful substances; the electrochemical hydrogen purification device is connected with the processing device and used to remove non-hydrogen gases and impurities in the mixed gas; and the dewatering device is connected with the electrochemical hydrogen purification device and used to remove moisture in the purified hydrogen.

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

A method of obtaining helium from a process gas. The process gas is at a pressure less than 15 bar to a first membrane separation stage having a first membrane more readily permeable for helium than for at least one other component in the process gas. A first retentate stream is fed to a second membrane separation stage having a second membrane more readily permeable for helium than for at least one other component in the process gas. Helium is separated from a first helium-containing permeate stream using a pressure swing adsorption to obtain a helium-containing product stream. A second helium-containing permeate stream is recycled to the first membrane separation stage. A purge gas from the pressure swing adsorption is also recycled to the first membrane separation stage.

Provided is a novel exhaust gas processing device which allows processing target exhaust gas having a large flow volume to be handled with a small-capacity plasma generator, by preheating a high-temperature decomposable gas component of the processing target exhaust gas. An exhaust gas processing device 10 preheats processing target exhaust gas F in the presence of moisture with heat from at least either an electric heater 15 or a heat exchanger 17 and subsequently thermally decomposes the exhaust gas with an atmospheric pressure plasma P. A device main body 11 has a heating decomposition chamber T therein. A plasma generator 14 is of a non-transferred type and is installed at a top surface portion 11a of the device main body 11. A reactor 12 has a cylindrical shape and is installed within the device main body 11 such that an upper end opening 12i thereof is directed toward a plasma emission port 14f of the plasma generator 14. A moisture supply unit 18 is provided at an inlet side of the device main body 11. At least either the electric heater 15 or the heat exchanger 17 is disposed in a first space T1.