An abatement method is disclosed. The method comprises: supplying a combustion chamber of an abatement apparatus with an effluent stream containing a perfluoro compound, together with combustion reagents and a diluent; heating a combustion zone of said combustion chamber by reacting said combustion reagents to perform abatement of said perfluoro compound to stable by-products, said diluent being selected to remain inert during said abatement. In this way, the perfluoro or other compound is abated in the combustion chamber during the combustion of the combustion reagents, but without creating undesirable compounds such as, for example, NOx or other compounds.

A method for removing a halogen fluoride in a mixed gas by reacting the mixed gas containing a halogen fluoride including bromine or iodine with a removing agent, wherein the removing agent is a chloride, bromide or iodide of potassium, sodium, magnesium, calcium and barium. Also disclosed is a quantitative analysis method as well as a quantitative analyzer for a gas component contained in a hydrogen fluoride mixed gas, the method characterized by reacting a mixed gas containing a halogen fluoride and another gas component with a removing agent, thereby removing the halogen fluoride in the mixed gas, further removing produced by-products, and quantitatively analyzing a residual gas by a gas chromatograph.

The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe positioned above the semiconductor manufacturing equipment and having a top surface and a bottom surface extending parallel to the top surface; a first branch pipe including an upstream end coupled to a source of a gas mixture and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including an upstream end and a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

The present invention discloses methods for extracting and recycling ammonia in MOCVD processes by FTrPSA. Through pretreatment, medium-shallow temperature PSA concentration, condensation and freezing, liquid ammonia vaporization, PSA ammonia extraction, and ammonia gas purification procedures, ammonia-containing exhaust gases from MOCVD processes are purified to meet the electronic-level ammonia gas standard required by the MOCVD processes, so as to implement recycling and reuse of the exhaust gases, where the ammonia gas yield is greater than or equal to 70-85%. The present invention solves the technical problem that atmospheric-pressure or low-pressure ammonia-containing exhaust gases in MOCVD processes cannot be returned to the MOCVD processes for use after being recycled, and fills the gap in green and circular economy development of the LED industry.

A device, such as a wet scrubber for cleaning a stream of gas by removing gaseous, liquid and solid impurities, has a gas inlet and a gas outlet. At the gas inlet there is a first structured packing. A spray-scrubber area with atomizing nozzles is provided above the first structured packing. A first demister is provided for separating larger drops above the spray-scrubber area. A woven fabric is above the first demister, and spray nozzles are arranged around this woven fabric to spray washing liquid in the direction of the gas stream onto the surface of the woven fabric. A final demister is located above the woven fabric and has a demister rinsing apparatus. The device may be used to dispose of industrial waste gases encountered in the semiconductor industry, particularly for the disposal of waste gases stemming from CVD processes in microelectronics production.

An adsorbent composition comprises a bismuth material, a promoter and optionally a support. The adsorbent composition is suitable for adsorbing an arsenic material, such as arsine, from a process stream.

Adsorbent materials are disclosed, along with filter elements containing the adsorbent materials methods of using adsorbents to remove siloxane contaminants from a gas stream. The method includes providing an adsorbent material that has been washed with an acid and passing a gas through the adsorbent material so as to reduce siloxane levels in the gas. A filter element for reducing siloxane levels in a gas includes a first adsorbent material, the first adsorbent material comprising an acid-washed adsorbent; and a second adsorbent material, the second adsorbent material comprising an acid-impregnated adsorbent.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

An apparatus includes a filter body, which filters an exhaust gas and feeds it to an adsorption reaction device and is disposed below the adsorption reaction device; and a housing which provides an internal space for storing powder separated from the filter body and is installed below the adsorption reaction device, which housing includes a filter installation unit, which is a space projected below the adsorption reaction device and which provides a filter installation space internally for installing the filter body and an expansion unit that protrudes sideways from the filter installation unit and provides an expansion space which communicates internally with the filter installation space, and the internal space is expanded by the expansion space to increase the powder collection capacity. A suction port for sucking in the exhaust gas is installed in the expansion unit.

Described are methods, devices, and systems useful for adsorbing organometallic vapor onto solid adsorbent material to remove the organometallic vapor from a gas mixture that contains the organometallic vapor and other vapor, particulate materials, or both.