A separating stage for inertial separation of components contained in a fluid flowing through, in particular paint particles and/or paint agglomerates includes at least one separating segment, which has at least one acceleration section for the fluid on the inlet side, in which the fluid is accelerated in a through-flow direction, and a first impaction surface for components contained in the fluid is downstream of the acceleration section. A separating unit having at least one separating stage, a kit, a transport cart, a coating facility, and a method for producing a separating unit are also provided.

A separating stage for inertial separation of components contained in a fluid flowing through, in particular paint particles and/or paint agglomerates includes at least one separating segment, which has at least one acceleration section for the fluid on the inlet side, in which the fluid is accelerated in a through-flow direction, and a first impaction surface for components contained in the fluid is downstream of the acceleration section. A separating unit having at least one separating stage, a kit, a transport cart, a coating facility, and a method for producing a separating unit are also provided.

A particle separator is provided with a passage with a plurality of baffles arranged extending from a top plate through a bottom surface; the baffles spaced to define a sinuous flow path therebetween from an inlet side to an outlet side. Each of the baffles provided with a cavity area open to the inlet side, the cavity area extending longitudinally along the baffles and through the bottom surface; the baffles provided in rows, successive rows offset horizontally to align an interval between the baffles in each of the rows with the cavity of the baffles of the next row. The baffles retractable out of the passage, through the top plate.

A blasting or stripping booth is provided creating a generally downward flow for treatment of fluid and particle flow, which reduces operator exposure to potentially hazardous debris. The booth comprises an enclosure defining an upper region for a workpiece, a lower region, and a separator assembly. In some instances the separator assembly includes individual separator units which are discrete units, each having a generally square or rectangular plan view configuration which are arranged in an array for providing the required process flow capabilities. Further embodiments utilize structures forming the separator which have an elongated trough-like configuration. These embodiments find a particular application in large-scale stripping or blasting booth used in production environments where workpieces may flow through a treatment system in a serial manner. Other suitable applications include batch type processing of parts.

A particle separator is provided with a passage with a plurality of baffles arranged extending from a top plate through a bottom surface; the baffles spaced to define a sinuous flow path therebetween from an inlet side to an outlet side. Each of the baffles provided with a cavity area open to the inlet side, the cavity area extending longitudinally along the baffles and through the bottom surface; the baffles provided in rows, successive rows offset horizontally to align an interval between the baffles in each of the rows with the cavity of the baffles of the next row. The baffles retractable out of the passage, through the top plate.

An applying apparatus according to one embodiment of the invention includes an application liquid nozzle, a wall and an air nozzle. The application liquid nozzle sprays an application liquid onto a predetermined area of a board. The wall is arranged so as to surround the predetermined area of the board, and includes a flow channel through which the application liquid that has been sprayed from the application liquid nozzle flows to the predetermined area. The air nozzle is provided adjacent to the wall, and sprays air onto the board.

A substrate treating apparatus includes a treatment unit including a container, and a support member in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit.

A substrate treating apparatus includes a treatment unit including a container, and a support member in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit.

A chamber for fluid application to a piece of material (M), such as a web or strip arranged to nm in the chamber (10), has a fluid applicator (2) for fluid application to the material. It further includes an inlet (11a) through which the material is fed into the chamber (10), an outlet (11b) through which the material exits the chamber (10), an outlet passage device (15) arranged at the outlet (11b) and configured to form an outlet fluid sealing of the chamber, and an inlet passage device (16) arranged at the inlet (11a) and configured to form an inlet fluid sealing of the chamber.

A chamber for fluid application to a piece of material (M), such as a web or strip arranged to nm in the chamber (10), has a fluid applicator (2) for fluid application to the material. It further includes an inlet (11a) through which the material is fed into the chamber (10), an outlet (11b) through which the material exits the chamber (10), an outlet passage device (15) arranged at the outlet (11b) and configured to form an outlet fluid sealing of the chamber, and an inlet passage device (16) arranged at the inlet (11a) and configured to form an inlet fluid sealing of the chamber.