A product dispensing system includes at least one recirculation network configured for communication with a system pump. The at least one recirculation network includes at least one sprayer boom tube and a plurality of product dispensers distributed along the at least one sprayer boom tube. A network pump is in communication with the at least one sprayer boom tube. The at least one recirculation network includes a dispensing configuration and a recirculation configuration. In the dispensing configuration the recirculation network is configured for communication with a supply tank and an agricultural product reservoir. In the recirculation configuration the recirculation network is isolated from the supply tank and the agricultural product reservoir, and the recirculation network includes a recirculation loop continuously extending through the network pump and the at least one sprayer boom tube.

To provide a production method capable of producing an antiglare film-coated substrate having excellent antiglare performance in a short time, an antiglare film-coated substrate having excellent antiglare performance, and an article provided with the substrate. A method for producing an antiglare film-coated substrate 1 comprising a substrate 3 and an antiglare film 5 formed on the substrate 3, characterized by comprising a step of preparing a coating composition comprising at least one of a silica precursor (A) and particles (C), and a liquid medium (B), wherein the liquid medium (B) contains a liquid medium (B1) having a boiling point of at most 150° C. in an amount of at least 86 mass % based on the total amount of the liquid medium (B), a step of electrically charging and spraying the coating composition by using an electrostatic coating apparatus having an electrostatic coating gun having a rotary atomizing head, to apply it on the substrate 3 to form a coating film, and a step of firing the coating film to form an antiglare film 5.

To provide a production method capable of producing an antiglare film-coated substrate having excellent antiglare performance in a short time, an antiglare film-coated substrate having excellent antiglare performance, and an article provided with the substrate. A method for producing an antiglare film-coated substrate 1 comprising a substrate 3 and an antiglare film 5 formed on the substrate 3, characterized by comprising a step of preparing a coating composition comprising at least one of a silica precursor (A) and particles (C), and a liquid medium (B), wherein the liquid medium (B) contains a liquid medium (B1) having a boiling point of at most 150° C. in an amount of at least 86 mass % based on the total amount of the liquid medium (B), a step of electrically charging and spraying the coating composition by using an electrostatic coating apparatus having an electrostatic coating gun having a rotary atomizing head, to apply it on the substrate 3 to form a coating film, and a step of firing the coating film to form an antiglare film 5.

A humidifier includes a container for containing a fluid; a cartridge for nebulizing the fluid, the cartridge configured to be fixed inside the container, the cartridge including a cartridge housing including a bottom side that is configured to contact a bottom of the container, a top side opposite to the bottom side; a back side; a front side; a left side; and a right side; and a handle on the top side of the cartridge housing, the handle projecting upward and away from the cartridge housing.

The disclosure relates to a coating installation for coating components with a coating agent, in particular for painting motor vehicle body components, with a nozzle applicator, in particular a print head, with at least one nozzle for delivering a coating agent jet of the coating agent onto the component to be coated. The disclosure provides a device for preventing and/or detecting clogging of the nozzle.

The disclosure relates to a coating installation for coating components with a coating agent, in particular for painting motor vehicle body components, with a nozzle applicator, in particular a print head, with at least one nozzle for delivering a coating agent jet of the coating agent onto the component to be coated. The disclosure provides a device for preventing and/or detecting clogging of the nozzle.

A spraying assembly is provided. The spraying assembly includes at least one nozzle for liquid that is to be sprayed, and at least one active substance injector which is situated directly upstream from the at least one nozzle and to which liquid to be sprayed is supplied by a pump or a pressurized reservoir, with interposition of an obturator on a conduit connecting the pump or the pressurized reservoir to the injector. The spraying assembly also includes an outlet valve for each injector designed to close each outlet orifice. The present invention avoids overdosing or underdosing of the product that is to be sprayed as active substance.

A spraying assembly is provided. The spraying assembly includes at least one nozzle for liquid that is to be sprayed, and at least one active substance injector which is situated directly upstream from the at least one nozzle and to which liquid to be sprayed is supplied by a pump or a pressurized reservoir, with interposition of an obturator on a conduit connecting the pump or the pressurized reservoir to the injector. The spraying assembly also includes an outlet valve for each injector designed to close each outlet orifice. The present invention avoids overdosing or underdosing of the product that is to be sprayed as active substance.

A semiconductor process system includes a semiconductor process chamber having an interior volume. A pump extracts gases from the semiconductor process chamber via an outlet channel communicably coupled to the semiconductor process chamber. The system includes a plurality of fluid nozzles configured to prevent the backflow of particles from the outlet channel to interior volume by generating a fluid barrier within the outlet channel responsive to the pump ceasing to function.

A semiconductor process system includes a semiconductor process chamber having an interior volume. A pump extracts gases from the semiconductor process chamber via an outlet channel communicably coupled to the semiconductor process chamber. The system includes a plurality of fluid nozzles configured to prevent the backflow of particles from the outlet channel to interior volume by generating a fluid barrier within the outlet channel responsive to the pump ceasing to function.