A bath processing tool includes a bath chamber for wet processing wafers in a bath solution, the bath chamber having wafer loading arms extending along a first direction. The tool includes a light sensor to capture light from a bath solution in the bath chamber and a plurality of light sources disposed within a plurality of gas injectors. The plurality of light sources is configured to project light of different wavelengths from each of the plurality of gas injectors towards the wafers. The plurality of light sources includes a first light source emitting light at a first wavelength towards a first zone and a second light source emitting light at a second wavelength towards a second zone, where the second wavelength is different from the first wavelength, and the first zone and second zone are different volume of the bath solution along the first direction.

A bath processing tool includes a bath chamber for wet processing wafers in a bath solution, the bath chamber having wafer loading arms extending along a first direction. The tool includes a light sensor to capture light from a bath solution in the bath chamber and a plurality of light sources disposed within a plurality of gas injectors. The plurality of light sources is configured to project light of different wavelengths from each of the plurality of gas injectors towards the wafers. The plurality of light sources includes a first light source emitting light at a first wavelength towards a first zone and a second light source emitting light at a second wavelength towards a second zone, where the second wavelength is different from the first wavelength, and the first zone and second zone are different volume of the bath solution along the first direction.

An apparatus for coating a glass substrate having a plurality of through-holes, the apparatus including a support frame including one or more abutment portions configured to support the glass substrate in a levelled orientation; a dispenser head operable to deposit a liquid coating on the glass substrate; and a coating unit configured to apply a force on the liquid coating so as to urge the liquid coating to permeate the plurality of through-holes in the glass substrate.

An apparatus for coating a glass substrate having a plurality of through-holes, the apparatus including a support frame including one or more abutment portions configured to support the glass substrate in a levelled orientation; a dispenser head operable to deposit a liquid coating on the glass substrate; and a coating unit configured to apply a force on the liquid coating so as to urge the liquid coating to permeate the plurality of through-holes in the glass substrate.

An apparatus for surface treatment of a workpiece in a production line comprises a positioning frame (1) for the workpiece to be treated. The positioning frame has a coupling (3) for a positioning drive (4). In order to achieve an increase in the production cadence irrespective of the type of surface treatment without having to accept losses with regard to the surface quality of the coating, a hermetically sealable capsule (2) is supported against the positioning frame (1), which capsule (2) has connection lines (5) for the exchange of operating media with different operating medium supply units (6) arranged along the production line.

An apparatus for surface treatment of a workpiece in a production line comprises a positioning frame (1) for the workpiece to be treated. The positioning frame has a coupling (3) for a positioning drive (4). In order to achieve an increase in the production cadence irrespective of the type of surface treatment without having to accept losses with regard to the surface quality of the coating, a hermetically sealable capsule (2) is supported against the positioning frame (1), which capsule (2) has connection lines (5) for the exchange of operating media with different operating medium supply units (6) arranged along the production line.

Systems and methods for dip coating a working wire of a metabolic sensor include a dipping station having a container and a fluid monitoring device. The fluid monitoring device is positioned to detect a fluid level of a dipping solution in the container. The systems and methods may include a heater, a conveyor between the dipping station and the heater, an optical measurement tool, and a robot positioned to move the wire-holding fixture between the conveyor, optical measurement tool and dipping station. The robot may be configured to dip the working wire into the dipping solution. A controller may be communication with the dipping station and the robot, wherein the controller is configured to control i) a motion of the robot for dipping the working wire into the container based on the fluid level and ii) a dipping parameter based on the diameter measured by the optical measurement tool.

Systems and methods for dip coating a working wire of a metabolic sensor include a dipping station having a container and a fluid monitoring device. The fluid monitoring device is positioned to detect a fluid level of a dipping solution in the container. The systems and methods may include a heater, a conveyor between the dipping station and the heater, an optical measurement tool, and a robot positioned to move the wire-holding fixture between the conveyor, optical measurement tool and dipping station. The robot may be configured to dip the working wire into the dipping solution. A controller may be communication with the dipping station and the robot, wherein the controller is configured to control i) a motion of the robot for dipping the working wire into the container based on the fluid level and ii) a dipping parameter based on the diameter measured by the optical measurement tool.