A robot system and a control method of a robot are provided. The robot system includes a robot, a liquid application part being provided on the robot, an application thickness measurement part measuring an application thickness of a liquid applied by the liquid application part, a distance measurement part measuring a first distance from the distance measurement part to an application object, a control part controlling the robot based on the first distance so that a second distance from the liquid application part to the application object becomes constant, a supply amount adjustment part adjusting a supply amount of the liquid to the application object according to the application thickness measured by the application thickness measurement part, wherein the distance measurement part, the liquid application part and the application thickness measurement part are arranged in this order in an application direction of the liquid.

Aspects herein are directed to an article of apparel having a vent opening formed by overlapping the edges of a first panel and a second panel. A plurality of discrete overlay film structures are applied to the second panel adjacent to the vent opening. When the article of apparel is exposed to an external stimulus, the film structures undergo a reversible increase in dimension in at least the z-direction which cause the second panel of material to undergo a reversible decrease in dimension in the direction of a longitudinal axis of the vent opening thereby causing the vent opening to dynamically transition from a closed state to an open state.

Aspects herein are directed to articles of apparel formed from a base textile and including a plurality of discrete overlay film structures affixed to the base textile at one or more locations on the article of apparel. When exposed to an external stimulus, the film structures undergo an increase in dimension in at least the z-direction and the base textile undergoes a decrease in dimension in one or more of the x-direction and the y-direction.

Aspects herein are directed to articles of apparel formed from a base textile and including a plurality of discrete overlay film structures affixed to the base textile at one or more locations on the article of apparel. When exposed to an external stimulus, the film structures undergo an increase in dimension in at least the z-direction and the base textile undergoes a change in dimension in at least the z-direction to produce stand-off nodes.

A method of detecting a defect in an applied volume of material includes detecting a pressure discontinuity during dispensing the volume of material along a predetermined path on a substrate. The pressure discontinuity is indicative of the defect in the applied volume of material. The location of the defect along the predetermined path is function of a start time of the pressure discontinuity and the size of the defect is a function of a time duration of the pressure discontinuity. The method can further include determining whether or not to repair the defect as a function of the location and the size of the defect in the applied volume of material. The method includes repairing the defect by re-directing the material applicator to the location of the defect and dispensing additional material at the location of the defect.

A slot-die coating apparatus for manufacturing a patterned coating layer (3) on a substrate surface (1s) of a substrate (1) comprises a slot-die coating head (2), a controlled coating fluid supply system (7) and a substrate carrier (6) for carrying the substrate (1). The slot-die coating head (2) comprises an inlet (21) for receiving coating fluid from the coating fluid supply system and a slit-shaped outflow opening (22) that is communicatively coupled to the inlet and has a slit direction. The controlled coating fluid supply system (7) alternately operates in a first mode (M1) to provide for a flow of coating fluid out of the slit-shaped outflow opening (22) for deposition on the substrate surface and in a second mode (M2) wherein a deposition of coating fluid out of the slit-shaped outflow opening (22) on the substrate surface is interrupted (21). The coating head (2) has an internal coating fluid trajectory extending from the inlet (21) to the slit-shaped outflow opening (22). In a stream-downwards order, the coating fluid trajectory comprises a lateral distribution portion (23) to distribute a flow of fluid over said slit direction, a collection channel (24) extending transverse to the stream-downwards direction, and a flow resistive output portion (25). Upon a transition from the first mode (M1) to the second mode (M2) the coating fluid supply system (7) sucks coating fluid from at least one outlet (26) of the slot-die coating head (2) that is communicatively coupled to the collection channel (24).

An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a fluid supply unit for supplying supercritical fluid to the treatment space, and a controller configured to control the fluid supply unit, wherein the fluid supply unit is configured to selectively supply the supercritical fluid at a first density or a second density higher than the first density into the treatment space. Thus, drying efficiency of the substrate when drying the substrate using the supercritical fluid may be improved.

A substrate treating apparatus includes a plurality of solution treating units for performing solution treatment of substrates, and a plurality of individual gas supply devices provided to correspond individually to the solution treating units, each for supplying gas at a variable rate only to one of the solution treating units. The solution treating units perform the solution treatment by supplying treating solutions to the substrates. The individual gas supply devices supply gas only to the solution treating units corresponding thereto. The individual gas supply devices supply the gas at adjustable rates to the solution treating units. The rate of gas supply to the solution treating units can therefore be varied for each solution treating unit. A pair of the solution treating units are both arranged and carry out the solution treatment in a same chamber.

A printing apparatus includes a support plane to support at least a print support; at least two printing groups aligned along a longitudinal axis, and each provided with at least a printing head; a support structure provided to support said printing groups above said support plane, at least a moving device to move said printing groups towards/away with respect to said support plane, at least two containment devices each associated with respective positioning means, and configured to collect printing liquid form said printing heads.

The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.