B05C11/08

System for coating heat transfer tube for condenser

A system for coating a heat transfer tube for a condenser is disclosed. The system simplifies a process of coating the heat transfer tube, and is able to uniformly coat a plurality of heat transfer tubes. In addition, the system is economically feasible in that coating solution can be reused by collecting and circulating it. Due to super-hydrophobic coating, the size of a droplet condensed on the surfaces of the heat transfer tubes coated by the system can be reduced, and a condensation heat transfer coefficient can be increased.

System for coating heat transfer tube for condenser

A system for coating a heat transfer tube for a condenser is disclosed. The system simplifies a process of coating the heat transfer tube, and is able to uniformly coat a plurality of heat transfer tubes. In addition, the system is economically feasible in that coating solution can be reused by collecting and circulating it. Due to super-hydrophobic coating, the size of a droplet condensed on the surfaces of the heat transfer tubes coated by the system can be reduced, and a condensation heat transfer coefficient can be increased.

Substrate processing apparatus, substrate processing method, and storage medium

Disclosed is a substrate processing apparatus including: a processing chamber that accommodates a substrate; a light source that radiates energy rays for a processing to the substrate in the processing chamber; a rotation driving unit that rotates at least one of the substrate and the light source around an axis intersecting with the substrate in the processing chamber; an opening/closing mechanism that switches between an open state and a closed state; and a controller configured to control the opening/closing mechanism to switch between the open state and the closed state, to increase a light emission amount of the light source in synchronization with the switch of the open state to the closed state by the opening/closing mechanism, and to decrease the light emission amount of the light source in synchronization with the switch of the closed state to the open state by the opening/closing mechanism.

Substrate processing apparatus, substrate processing method, and storage medium

Disclosed is a substrate processing apparatus including: a processing chamber that accommodates a substrate; a light source that radiates energy rays for a processing to the substrate in the processing chamber; a rotation driving unit that rotates at least one of the substrate and the light source around an axis intersecting with the substrate in the processing chamber; an opening/closing mechanism that switches between an open state and a closed state; and a controller configured to control the opening/closing mechanism to switch between the open state and the closed state, to increase a light emission amount of the light source in synchronization with the switch of the open state to the closed state by the opening/closing mechanism, and to decrease the light emission amount of the light source in synchronization with the switch of the closed state to the open state by the opening/closing mechanism.

METHOD FOR MANUFACTURING COATED OBJECT AND COATING SUBSTANCE SPREADING APPARATUS

A method for manufacturing a coated object and a coating substance spreading apparatus, which coat, as uniformly as possible, a coating substance on a curved coating target surface are provided. A method for manufacturing a coated object, the coated object being an object coated with a coating substance on a coating target surface Tf of the object T, the coating target surface Tf having a curved surface, includes dispensing the coating substance onto the coating target surface Tf; and revolving the object T, having the coating substance dispensed onto the coating target surface Tf, about a revolution axis 13a located remotely from the object T. A coating substance spreading apparatus 1 includes a revolution section 10 configured to revolve an object T about a revolution axis 13a located remotely from the object T. With these, a coating-substance-moving force that acts on each portion of the coating target surface Tf can be made close to an intensity proportional to a distance from the revolution axis 13a, and it is possible to suppress thickness differences or variation of the coating substance coated on the coating target surface Tf.

METHOD FOR MANUFACTURING COATED OBJECT AND COATING SUBSTANCE SPREADING APPARATUS

A method for manufacturing a coated object and a coating substance spreading apparatus, which coat, as uniformly as possible, a coating substance on a curved coating target surface are provided. A method for manufacturing a coated object, the coated object being an object coated with a coating substance on a coating target surface Tf of the object T, the coating target surface Tf having a curved surface, includes dispensing the coating substance onto the coating target surface Tf; and revolving the object T, having the coating substance dispensed onto the coating target surface Tf, about a revolution axis 13a located remotely from the object T. A coating substance spreading apparatus 1 includes a revolution section 10 configured to revolve an object T about a revolution axis 13a located remotely from the object T. With these, a coating-substance-moving force that acts on each portion of the coating target surface Tf can be made close to an intensity proportional to a distance from the revolution axis 13a, and it is possible to suppress thickness differences or variation of the coating substance coated on the coating target surface Tf.

THREE-DIMENSIONAL STRUCTURE, METHOD FOR PRODUCING SAME, AND COATING DEVICE
20200368389 · 2020-11-26 · ·

Provided is a three-dimensional structure that makes it possible to obtain a coating film having a uniform thickness and good adhesion even when a three-dimensional structure main body has a concave section and/or a convex section, and that therefore has high durability without the coating film being peeled off even after long-term use. The three-dimensional structure has a three-dimensional structure main body and a coating film having a thickness of 10 nm to 300 nm and formed on a surface of the three-dimensional structure main body, wherein the coating film is made of a metal alkoxide or non-metal alkoxide hydrolysis product; and when a portion of the coating film located on a surface of the concave section and/or convex section in the three-dimensional structure main body is observed with a scanning electron microscope at a magnification of 300, no peeling of the coating film can be recognized.

THREE-DIMENSIONAL STRUCTURE, METHOD FOR PRODUCING SAME, AND COATING DEVICE
20200368389 · 2020-11-26 · ·

Provided is a three-dimensional structure that makes it possible to obtain a coating film having a uniform thickness and good adhesion even when a three-dimensional structure main body has a concave section and/or a convex section, and that therefore has high durability without the coating film being peeled off even after long-term use. The three-dimensional structure has a three-dimensional structure main body and a coating film having a thickness of 10 nm to 300 nm and formed on a surface of the three-dimensional structure main body, wherein the coating film is made of a metal alkoxide or non-metal alkoxide hydrolysis product; and when a portion of the coating film located on a surface of the concave section and/or convex section in the three-dimensional structure main body is observed with a scanning electron microscope at a magnification of 300, no peeling of the coating film can be recognized.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.