Patent classifications
B05D3/0466
Implementing the post-porosity plasma protection (P4) process using I-CVD
Provided is a pore-filling method for protecting the pores of a porous material. The method, which is performed using a modified i-CVD technique, involves filling the pores of a porous material with a gas phase monomer within a pressure chamber and subsequently polymerizing the monomer, both within the pores and on the surface of the material as an overburden. The method is solvent-free and can fill and protect pores of any size of any material.
Layer-by-layer coating apparatus and method
Apparatus and method useful for, among other things, providing a layer by layer coating of materials on a substrate.
Reactor for coating particles in stationary chamber with rotating paddles
A reactor for coating particles includes a stationary vacuum chamber to hold a bed of particles to be coated, a vacuum port in an upper portion of the chamber, a chemical delivery system configured to inject a reactant or precursor gas into a lower portion of the chamber, a paddle assembly, and a motor to rotate a drive shaft of the paddle assembly. The lower portion of the chamber forms a half-cylinder. The paddle assembly includes a rotatable drive shaft extending through the chamber along the axial axis of the half cylinder, and a plurality of paddles extending radially from the drive shaft such that rotation of the drive shaft by the motor orbits the plurality of paddles about the drive shaft.
Apparatus and method for the drying/curing of chemical products
An apparatus for matting a coating applied on mainly flat panels includes a cleaning workstation and an excimer treatment workstation where the panels are conveyed by a belt conveyor having an upper outward section and a lower return section. In the cleaning workstation, the upper outward section of the belt conveyor has a V-shaped path, which is formed by two rollers in contact with the plane of advancement of the panel, and a roller in lower position, and which is bridged by advancing rollers, among which gaseous nitrogen is supplied that brushes all sides of the panel. In the treatment workstation, the upper outward section of the belt has a V-shaped path, where the panel is irradiated by an excimer emitter, and which is formed by two rollers in contact with the plane of advancement of the panel, and a roller in lower position, and is bridged by advancing rollers.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes a processing bath, a first lid member, an outer bath, a processing liquid introduction unit, a first gas supply unit, and a second gas supply unit. The processing bath stores a processing liquid in which a substrate is immersed. The first lid member covers an upper opening of the processing bath. The outer bath is provided outside of the processing bath and a processing liquid overflowing out of the processing liquid from the processing bath flows into the outer bath. The processing liquid introduction unit is able to introduce the processing liquid stored in the outer bath into the processing bath. The first gas supply unit supplies a first inert gas to the processing liquid stored in the processing bath. The second gas supply unit supplies a second inert gas into the outer bath.
POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME
To provide a new silicon-containing polymer making it possible to form a cured film has features that its residual stress is small and crack resistance is high. A polycarbosilazane having particular cyclic structures.
Methods for preparing nano-protective coating
Methods and associated systems for preparing a nano-protective coating are disclosed. The method includes (1) placing a substrate in a reaction chamber of a nano-coating preparation equipment; (2) introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar); (3) turning on a movement mechanism so that the substrate is moved in the reaction chamber; (4) introducing a monomer vapor into the reaction chamber to achieve a vacuum degree of 30-300 mTorr; and (5) turning on a plasma discharge for chemical vapor deposition to form an organosilicon nano-coating on a surface of the substrate.
Device and method for producing a textured coating
The present invention relates in particular to a method and a device for a spatially resolved production of a location dependent textured coating. The method includes the steps of provisioning a two-dimensional representation, evaluating a data record of the two-dimensional representation, determining local structures of the two-dimensional representation, determining the type and location of at least one texture that is produced on at least one region of the two-dimensional representation, provisioning a fluid coating material, and applying the fluid coating material to at least one region of the two-dimensional representation.
Active energy radiation unit and active energy radiation device
An active energy radiation unit includes a light source which radiates ultraviolet rays onto a target object, and a main gas supply mechanism which is disposed to be adjacent to the light source and ejects an inert gas. The main gas supply mechanism includes a receiving part which receives nitrogen gas, a first ejection port which is provided at a position between the receiving part and the light source in a transfer direction and closer to the target object than the receiving part and a second ejection port which is provided between the receiving part and the first ejection port in the transfer direction.
Apparatus and method for the drying/curing of chemical products
An apparatus for matting a coating applied on mainly flat panels includes a cleaning workstation and an excimer treatment workstation where the panels are conveyed by a belt conveyor having an upper outward section and a lower return section. In the cleaning workstation, the upper outward section of the belt conveyor has a V-shaped path, which is formed by two rollers in contact with the plane of advancement of the panel, and a roller in lower position, and which is bridged by advancing rollers, among which gaseous nitrogen is supplied that brushes all sides of the panel. In the treatment workstation, the upper outward section of the belt has a V-shaped path, where the panel is irradiated by an excimer emitter, and which is formed by two rollers in contact with the plane of advancement of the panel, and a roller in lower position, and is bridged by advancing rollers.