B05D3/0466

PANELS COMPRISING A STRUCTURED LACQUER SURFACE

The present disclosure relates to a panel comprising a structured lacquer surface, having a base panel, a melamine resin layer, an adhesion promoter layer and a lacquer-containing top coat, the melamine resin layer being provided on a surface of the base layer, the adhesion promoter layer being provided on the melamine resin layer and the lacquer-containing top coat being provided on the adhesion promoter layer, the lacquer-containing top coat being structured. The disclosure also relates to a method for producing a panel of this type with a structured lacquer surface.

HYDROPHOBIC SURFACE COATING AND PREPARATION METHOD THEREFOR

The present invention provides a hydrophobic surface coating and a preparation method therefor. The hydrophobic surface coating uses one or more fluorinated alcohol compounds as a reaction gas material, and is formed on a surface of a base body by a plasma-enhanced chemical vapor deposition method, to improve the hydrophobicity, the chemical resistance, and the weatherability of the surface of the base body.

Substrate processing apparatus and substrate processing method
11282718 · 2022-03-22 · ·

A substrate processing apparatus includes a chamber body having an upper opening, a chamber lid part having a lower opening, and a shield plate arranged in a lid internal space of the chamber lid part. The radial dimension of the shield plate is greater than that of the lower opening. Covering the upper opening of the chamber body with the chamber lid part forms a chamber that internally houses a substrate. In the substrate processing apparatus, before the substrate is conveyed and the chamber is formed, the lid internal space of the chamber lid part is filled with the gas supplied from a gas supply part, in a state in which the shield plate overlaps with the lower opening. This allows the chamber to be quickly filled with the gas to achieve a desired low oxygen atmosphere after the formation of the chamber.

Active energy radiation unit and active energy radiation device

An active energy radiation unit includes a light source which radiates ultraviolet rays onto a target object, and a main gas supply mechanism which is disposed to be adjacent to the light source and ejects an inert gas. The main gas supply mechanism includes a receiving part which receives the inert gas, and a main ejection port which is provided at a position between the receiving part and the light source and closer to the target object than the receiving part. A flow path area from the receiving part to the main ejection port is constant.

ULTRAVIOLET DEVICE
20210308298 · 2021-10-07 ·

An ultraviolet device is provided, which includes a gas jetting module, a flow rate adjustment module, an ultraviolet module and a first gas channel. The gas jetting module includes an upper panel, a lower panel and a frame. The upper panel is disposed on the upper side of the frame. The lower panel is disposed on the lower side of the frame and includes one or more gas outlets. A gas chamber is formed between the upper panel, lower panel and frame. The first gas channel is connected to the gas jetting module. The flow rate adjustment module is connected to the first gas channel and adjusts the flow rate of the gas inputted into the gas chamber via the first gas channel. The ultraviolet module includes an ultraviolet light source and is connected to the gas jetting module.

Paint hardening device and paint hardening method
11097310 · 2021-08-24 · ·

A paint hardening device is a device for hardening paint applied to a workpiece and includes an electron beam emission portion configured to emit an electron beam to harden the paint, and a storage chamber in which the electron beam emission portion is accommodated. The paint hardening device is configured to move the workpiece and the electron beam emission portion relative to each other while the electron beam is being applied to the paint from the electron beam emission portion in a state where an inert gas atmosphere is formed at least in an electron-beam passing region where the electron beam passes in the storage chamber, the electron beam being applied to the paint from the electron beam emission portion.

COMPOSITION, POLYMER, AND METHOD OF PRODUCING SUBSTRATE

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A.sup.1 and A.sup.2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L.sup.2 represents —S—, —NR—, or —NA.sup.22-, wherein A.sup.22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.

##STR00001##

CUREABLE FORMULATIONS FOR FORMING LOW-k DIELECTRIC SILICON-CONTAINING FILMS USING POLYCARBOSILAZANE

Disclosed are silicon and carbon containing film forming compositions comprising a polycarbosilazane polymer or oligomer formulation that consists of silazane-bridged carbosilane monomers, the carbosilane containing at least two —SiH.sub.2— moieties, either as terminal groups (—SiH.sub.3R) or embedded in a carbosilane cyclic compound, wherein R is H, a C.sub.1-C.sub.6 linear, branched, or cyclic alkyl- group, a C.sub.1-C.sub.6 linear, branched, or cyclic alkenyl- group, or combination thereof. Also disclosed are methods of forming a silicon and carbon containing film comprising forming a solution comprising a polycarbosilazane polymer or oligomer formulation and contacting the solution with the substrate via a spin-on coating, spray coating, dip coating, or slit coating technique to form the silicon and carbon containing film.

REACTORS FOR COATING DEVICES AND RELATED SYSTEMS AND METHODS

A reactor for coating a device is provided. The reactor comprises a hollow body and a port. The hollow body is for supporting the device. The port is in fluid communication with the hollow body for exchanging a coating fluid. In use, the device is moveable within the hollow body from a stacked orientation to an unstacked orientation. Processes for coating devices and systems thereof are also provided.

LAYER-BY-LAYER COATING APPARATUS AND METHOD

Apparatus and method useful for, among other things, providing a layer by layer coating of materials on a substrate.