Described herein is a coating system comprising an applicator head that is configured to apply a coating to a surface of a workpiece, a shroud comprising a housing and an internal cavity located inside of the housing, and a humidifying apparatus comprising an output that is fluidly coupled to the shroud, wherein the humidifying apparatus configured to introduce a quantity of humid air to the internal cavity of the shroud.

The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising: a generator configured to generate ionized gas by ionizing a first gas; a supplier configured to supply a second gas including the ionized gas generated by the generator to a space under the mold; and a controller configured to control a flow rate of the second gas supplied by the supplier to the space, wherein the controller increases the flow rate of the second gas supplied from the supplier to the space so as to reduce a decrease in an ion concentration in the space caused by moving the substrate from the space after the mold is separated from the cured imprint material.

A film forming method of forming a film by accelerating powder of a material with gas and spraying and depositing the powder onto a surface of a substrate with the powder being kept in a solid state includes: a substrate film forming step of forming a film. The film forming step includes jetting out the powder and inert gas from a nozzle towards the substrate, causing inside of the chamber to be under positive pressure by the inert gas, and depositing the powder on the surface of the substrate.

A substrate processing apparatus that forms a friction reducing film on a rear surface of a substrate includes a processing container configured to accommodate the substrate and to define a hermetically-sealed processing space, a heating element configured to heat the rear surface of the substrate inside the processing container, a supplier configured to supply a material forming the friction reducing film toward the rear surface of the substrate inside the processing container, a first gas supplier configured to supply an inert gas to a peripheral edge of the substrate from a space above the substrate, a second gas supplier configured to supply the inert gas closer to a center of the substrate than the first gas supplier from a space above the substrate inside the processing, and an exhauster configured to exhaust an atmosphere of the processing space from a periphery or a space below the substrate.

The disclosure relates to a method for coating a substrate with a lacquer. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarising a lacquer layer.

A method for coating a substrate with a lacquer is disclosed. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarizing a lacquer layer.

Provided in a particular embodiment of the present invention is a batter with a coating. In the coating, a plasma coating of a siloxane monomer and an ester monomer of acrylic acid and homologues thereof is used as a base layer; a plasma coating of a multifunctional epoxide of an epoxide monomer with a carbon-carbon double bond structure, an epoxide monomer with a carbon-carbon triple bond structure or an epoxide monomer with two or more epoxy structures and an ester monomer of acrylic acid and the homologues thereof is used as an anti-corrosive layer; a plasma coating of a cyclosiloxane monomer is used as a hydrophobic layer; and all the layers are closely combined with each other to form, on the surface of the battery, an excellent protective coating free of halogens such as fluorine.

The present invention relates to a method for coating light alloy rims, to coating materials for use in this method, and to the coated light alloy rims obtained in this way. A primer layer, a base coat layer, and a clear coat layer are applied to a machined light alloy rim blank. The primer layer includes a radiation-curable coating material having an acid number of 10 to 120 mg KOH/g. The clear coat layer has a double-bond density of free-radically polymerizable reactive groups per unit mass of coating material of at least 1 mol/kg. The coating materials can be cured by radiation.

A method and a device for coating a metal strip with a coating material that is still liquid at first. During the coating, the coated metal strip runs through a roller pair. One of the rollers of the roller pair can be adjusted toward the other as a correction roller in order to eliminate a possible curvature of the metal strip. Then the metal strip runs through a blow-off apparatus for blowing off surplus coating. In order to prevent an uneven thickness distribution of the coating on the metal strip even when the correction roller of the roller pair has been adjusted, the actual position of the metal strip is controlled to a specified setpoint center position in the slot of the blow-off apparatus by an appropriate movement of the blow-off apparatus.

A film production method and system are provided. The film production method includes: forming an ink layer on the base substrate covering the surface of the base substrate, the ink layer including a solvent and a film-forming material dissolved in the solvent; blowing gas to the ink layer so that the solvent in the ink layer spreads towards the periphery of the base substrate; removing the solvent in the ink layer so that the film-forming material in the ink layer forms a film covering the surface of the base substrate. The film production system applies to the film production method described above.