Embodiments of an enclosed coating system according to the present teachings can be useful for patterned area coating of substrates in the manufacture of a variety of apparatuses and devices in a wide range of technology areas, for example, but not limited by, OLED displays, OLED lighting, organic photovoltaics, Perovskite solar cells, and organic semiconductor circuits. Enclosed and environmentally controlled coating systems of the present teachings can provide several advantages, such as: 1) Elimination of a range of vacuum processing operations such coating-based fabrication can be performed at atmospheric pressure. 2) Controlled patterned coating eliminates material waste, as well as eliminating additional processing typically required to achieve patterning of an organic layer. 3) Various formulations used for patterned coating with various embodiments of an enclosed coating apparatus of the present teachings can have a wide range of physical properties, such as viscosity and surface tension. Various embodiments of an enclosed coating system can be integrated with various components that provide a gas circulation and filtration system, a particle control system, a gas purification system, and a thermal regulation system and the like to form various embodiments of an enclosed coating system that can sustain an inert gas environment that is substantially low-particle for various coating processes of the present teachings that require such an environment.

The disclosure relates to a method for coating a substrate with a lacquer. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarising a lacquer layer.

The present invention provides a water-based coating and/or coating system used to form sag resistant wet layers or coatings on a wide range of substrates. The coating system is effective for protecting metal-containing substrates, such as intermodal cargo containers, against corrosion. As an overview, the present invention provides water-based compositions as primer coats on substrates, and methods for applying the same to substrates. The method includes steps of applying a water-based paint to the interior surfaces of a substrate and drying the substrate by continuously forcing heated air onto the substrate as it moves through a drying chamber. Desirably, the primer incorporates a high level of one or more CAS agents for excellent sag resistance while drying in a broad range of relative humidity environments. Alternatively, modifications can be made to control temperature and humidity during spray application and drying as a way to increase sag resistance of the coating.

Provided are methods for surface-modifying a thermoplastic resin which produce surfaces that show not only low adsorption of proteins and cells but also selective adsorption or adhesion of specific cells such as cancer cells, and further have excellent durability. A method for surface-modifying an object made of a thermoplastic resin, the method including: step 1 of forming polymerization initiation points on the surface of the object; and step 2 of radically polymerizing at least a hydrophilic monomer starting from the polymerization initiation points by irradiation with UV light having a wavelength of 300 to 400 nm to form a graft layer having a thickness of 2 to 100 nm on the surface of the object.

Methods for treating cellulosic materials comprising introducing a liquid treating composition into the cellulosic material, the treating composition comprising a solution prepared from at least: (i) one or more of a copper amine complex or copper ammine complex, such as copper tetraamine carbonate, (ii) one or more of ammonia or a water-soluble amine and (iii) water; and exposing the cellulosic material provided thereby to carbon dioxide and/or carbonic acid to provide treated cellulosic material, and treated cellulosic materials prepared thereby.

The present invention relates to a device, the use thereof and a method for producing highly porous, crystalline surface coatings comprising at least two spraying devices operating in sequential sequence for applying coating agents from the storage vessels (3, 4) to a material arranged on a sample holder (1) and at least one rinsing device (5, 13, 16) for removing unbound molecules from the coated surface.

A method of modifying substrate surface includes: performing an O.sub.2 plasma treatment on a substrate including polydimethylsiloxane (PDMS); coating hydrophilic UV curing coating uniformly on the substrate; disposing the substrate into an oxygen-free environment; and exposing to an UV light to cure the hydrophilic UV curing coating. The method of modifying substrate surface may greatly enhance the hydrophilicity and the stability of the PDMS substrate.

A method for producing a decorative surface having different gloss levels preferably comprising the following steps: (C) feeding of a workpiece (1.0), which is coated with at least a first lacquer layer (1.4) to a digital printing station; (D) provision of digital control data for the digital printing station; (E) digital spraying of droplets on partial areas of the first lacquer layer (1.4) on the workpiece (1.0) with an at least partially transparent lacquer in order to apply a second lacquer layer (1.5) on the first lacquer layer (1.4), wherein after curing the second lacquer layer (1.5) has a different gloss level than the first lacquer layer (1.4).

Further disclosed is an apparatus for carrying out this method.

Apparatus and methods of heating metallic containers in an oven which includes electric heating elements are provided. The electric heating elements include one or more of an electric induction element and an electric infrared heating element. The electric heating elements heat the metallic containers to a predetermined temperature to dry moisture on the metallic containers or to cure inks and coatings. Air within the oven may be at a temperature that is less than the predetermined temperature.

A substrate processing apparatus includes a substrate processing unit, a partition wall, a first gas supply, and a second gas supply. The substrate processing unit performs a liquid processing on a substrate. The partition wall separates a first space defined from a carry-in/out port through which the substrate is loaded to the substrate processing unit, and a second space other than the first space. The first gas supply is connected to the partition wall, and supplies an atmosphere adjusting gas to the first space. The second gas supply is connected to a place different from the first gas supply in the partition wall, and supplies an atmosphere adjusting gas to the first space.