A manufacturing method of an ultra-matte board, which includes a semi-curing step, an irradiating step with an ultraviolet excimer lamp and a full curing step. The semi-curing step includes: coating a UV paint on a substrate, and irradiating the coated substrate with an ultraviolet lamp with a wavelength ranging from 350 nm to 450 nm to semi-cure the UV paint; the irradiating step with the ultraviolet excimer lamp includes: placing the semi-cured substrate in an inert gas atmosphere and irradiating the substrate with an ultraviolet excimer lamp for 2 s to 20 s; and the full curing step includes: irradiating with an ultraviolet lamp with a wavelength ranging from 350 nm to 450 nm to fully cure the UV paint to obtain the ultra-matte board.

Described herein are articles and methods of making articles, for example glass articles, including a sheet and a carrier, wherein the sheet and carrier are bonded together using a coating layer, which is, for example, a fluorocarbon polymer coating layer, and associated deposition methods and inert gas treatments that may be applied on the sheet, the carrier, or both, to control the fluorine content of the coating layer and van der Waals, hydrogen and covalent bonding between the sheet and the carrier. The coating layer bonds the sheet and carrier together with sufficient bond strength to prevent delamination of the sheet and the carrier during high temperature processing to while preventing a permanent bond at during high temperature processing while at the same time maintaining a sufficient bond to prevent delamination during high temperature processing.

The present disclosure provides a hydrophobic low-dielectric-constant film and a preparation method therefor. The low-dielectric-constant film is formed from one or more fluorine-containing compounds A by means of a plasma enhanced chemical vapor deposition method, and the one or more fluorine-containing compounds comprise a compound having the general formula C.sub.xSi.sub.yO.sub.mH.sub.nF.sub.2x+2y−n+2 or C.sub.xSi.sub.yO.sub.mH.sub.nF.sub.2x+2y−n, x being an integer from 1 to 20, y being an integer from 0 to 8, m being an integer from 0 to 6, and n being 0, 3, 6, 7, 9, 10, 12, 13, 15, 16, 17 and 19. Thus, a nano-film having a low dielectric constant and good hydrophobicity is formed on the surface of a substrate.

A system and/or method for coating a substrate. The system may include a chuck for holding and rotating the substrate, a dispensing subsystem for dispensing a coating material onto the substrate, and a shield member. The shield member may be movable towards and away from the substrate during the coating procedure. The shield member may have an inverted funnel shape. The shield member may include a central chamber through which a solvent vapor flows and a peripheral chamber that is fluidly separated from the central chamber through which a gas flows. During a coating procedure, the shield member may be moved very close to the substrate and the solvent vapor and gas may flow onto the substrate to create a solvent rich ambient around the substrate and prevent aerosols of the coating material from redepositing onto the substrate after being flung off due to spinning of the substrate.

Provided here are compositions and methods for preparing porous omniphobic surfaces with desirable chemical and structural properties. The methods include sequential initiated chemical vapor deposition (iCVD) of low surface-energy materials onto a variety of substrates.

A water barrier laminate including inorganic barrier and water-trapping layers alternately arranged in order from the side facing the device to the outer side: a first inorganic barrier layer, a first water-trapping layer, a second inorganic barrier layer, a second water-trapping layer and a third inorganic barrier layer. A water-permeable underlying plastic layer is provided on one side of these inorganic barrier layers; a distance L1a between the first water-trapping layer and the first inorganic barrier layer and a distance L2a between the second water-trapping layer and the second barrier satisfy formulas (1) and (2):

L1a<3 μm  (1)

L2a<3 μm  (2)

and a distance L1b between the second inorganic barrier layer and the first water-trapping layer satisfies formula (3):

L1b≤3 μm  (3)

by interposing a water-permeable organic layer therebetween.

The inventions relates to a method for producing a decorative workpiece with a structured surface comprising the following steps: (B) applying a first liquid lacquer having a coarse structuring over the entire surface, wherein a difference in thickness between thicker regions and thinner regions is at least 50 μm, in particular at least 100 μm; (E) applying a second liquid, at least partially transparent lacquer for producing a fine structuring in some regions. Furthermore, an apparatus for performing the method and a workpiece produced by the method are claimed.

An apparatus for matting a coating applied on mainly flat panels includes a cleaning workstation and an excimer treatment workstation where the panels are conveyed by a belt conveyor having an upper outward section and a lower return section. In the cleaning workstation, the upper outward section of the belt conveyor has a V-shaped path, which is formed by two rollers in contact with the plane of advancement of the panel, and a roller in lower position, and which is bridged by advancing rollers, among which gaseous nitrogen is supplied that brushes all sides of the panel. In the treatment workstation, the upper outward section of the belt has a V-shaped path, where the panel is irradiated by an excimer emitter, and which is formed by two rollers in contact with the plane of advancement of the panel, and a roller in lower position, and is bridged by advancing rollers.

Methods and associated systems for preparing a nano-protective coating are disclosed. The method includes (1) placing a substrate in a reaction chamber of a nano-coating preparation equipment; (2) introducing an inert gas, wherein the inert gas includes helium (He) and/or argon (Ar); (3) turning on a movement mechanism so that the substrate is moved in the reaction chamber; (4) introducing a monomer vapor into the reaction chamber to achieve a vacuum degree of 30-300 mTorr; and (5) turning on a plasma discharge for chemical vapor deposition to form an organosilicon nano-coating on a surface of the substrate.

The disclosure encompasses systems and methods for performing high temperature and high humidity curing of tablets using air flow delivered from a recirculating air handler to a pan coater of a tablet coating device. The recirculating air handler may be integrated into a preexisting tablet coating device so that the air flow may be delivered by the preexisting air handler or by the recirculating air handler as desired.