B05D3/141

Pharmaceutical packaging with lubricating film and method for producing same
11826778 · 2023-11-28 · ·

A pharmaceutical packaging including a silicone-free lubricating film of crosslinked organic molecules, and a method for producing same.

Panel having decorative layer and method for printing panels
11292182 · 2022-04-05 · ·

A printed image for the decor of a panel and a method for imprinting plates, in particular wall, ceiling or floor panels. The method includes the following steps: (i) providing a plate; (ii) applying a primer by means of a liquid curtain of coating material on/to a main surface of the plate; (iii) optionally drying and/or curing the primer; (iv) treating the surface of the primer by means of at least one of the following measures: a) corona treatment; b) plasma treatment; c) applying an oil in an aqueous dilution and (v) applying a decorative decor.

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A substrate processing apparatus includes a processing tank, a holder, an organic solvent supply, a drainage port, a gas supply, and an exhaust port. The processing tank stores an aqueous layer. The holder holds a substrate. The organic solvent supply supplies an organic solvent onto the aqueous layer to form a liquid layer of the organic solvent. The drainage port discharges the aqueous layer from a bottom wall of the processing tank and causes the liquid layer of the organic solvent to descend from above the substrate to below the substrate. The gas supply supplies a gas of a water repellent agent to the liquid layer from above the processing tank while the liquid layer descends. The exhaust port is exposed on a side wall of the processing tank by the descending of the liquid layer and discharges the gas of the water repellent gas.

BEVEL BACKSIDE DEPOSITION ELIMINATION

Exemplary semiconductor processing systems may include a chamber body comprising sidewalls and a base. The systems may include a substrate support extending through the base of the chamber body. The substrate support may include a support plate defining a plurality of channels through an interior of the support plate. Each channel of the plurality of channels may include a radial portion extending outward from a central channel through the support plate. Each channel may also include a vertical portion formed at an exterior region of the support plate fluidly coupling the radial portion with a support surface of the support plate. The substrate support may include a shaft coupled with the support plate. The central channel may extend through the shaft. The systems may include a fluid source coupled with the central channel of the substrate support.

Method of fabricating substrate for culturing stem cell

The present disclosure relates to a method of fabricating a substrate for culturing stem cells, including forming a plasma polymer layer from a precursor material on a substrate using plasma, and the precursor material contains a heteroaromatic compound or a linear compound.

Plasma polymerization apparatus and plasma polymerization method using the same

A plasma polymerization apparatus is provided for forming a polymerization coating on an inner surface of an object. The plasma polymerization apparatus comprises a chamber, a gas supply, a monomer source, a first electrode, a second electrode, a power source, and a metal foil. The gas supply is connected to the chamber for filling the chamber with a working gas. The monomer source is connected to the chamber for providing a vaporized monomer material into the chamber. The first electrode is located at a first side of the chamber. The second electrode is located at a second side of the chamber. The power source is electrically connected to the first electrode and the second electrode for generating plasma. The metal foil is wrapped around an outer surface of the object and placed between the first electrode and the second electrode. A plasma polymerization method is also provided.

PLASMA POLYMERIZATION APPARATUS AND PLASMA POLYMERIZATION METHOD USING THE SAME
20210305026 · 2021-09-30 ·

A plasma polymerization apparatus is provided for forming a polymerization coating on an inner surface of an object. The plasma polymerization apparatus comprises a chamber, a gas supply, a monomer source, a first electrode, a second electrode, a power source, and a metal foil. The gas supply is connected to the chamber for filling the chamber with a working gas. The monomer source is connected to the chamber for providing a vaporized monomer material into the chamber. The first electrode is located at a first side of the chamber. The second electrode is located at a second side of the chamber. The power source is electrically connected to the first electrode and the second electrode for generating plasma. The metal foil is wrapped around an outer surface of the object and placed between the first electrode and the second electrode. A plasma polymerization method is also provided.

DISPLAY AREA HAVING TILES WITH IMPROVED EDGE STRENGTH AND METHODS OF MAKING THE SAME
20210175219 · 2021-06-10 ·

A method of making a display area and a glass tile as well as a display area that includes the glass tile. Prior to assembling the glass tile into the array, an edge treatment is performed on the glass tile, the edge treatment increasing an edge strength of the glass tile, as measured by the four point bend test, to at least about 200 MPa. The edge treatment can, for example, include at least one of plasma jet treatment and protective material application.

Coating apparatus and coating method

Disclosed are a coating apparatus and a coating method. The coating apparatus includes a chamber, a support located in an interior space of the chamber and configured to support a substrate which is to be coated, an ejection nozzle configured to eject a coating material toward the support, and an electric field forming unit configured to form an electric field in a movement path of the coating material to provide kinetic energy for the coating material.

Metering valve

A metering valve comprises a closable media passage leading from a media supply to a nozzle opening, wherein the medium can be applied to the workpiece in a metered manner through the nozzle opening. The metering valve is provided with a plasma generator by which the workpiece can be acted on by a plasma jet.