Cleaning systems proposed in the art have technical construct limitations in the cleaning mechanisms used, which leads to a lower ratio of power consumed to area cleaned, directly affecting the cleaning efficiency. Thus, an Unmanned Aerial Vehicle (UAV) Propelled Autonomous Multiplane Cleaning System (UPAMCS) is disclosed. An UAV and Mopping Interface Mechanism (UAV-MIM) connects a UAV to one or more mopping systems comprising an epicyclic gear driven moppers with no additional power devices used. A maneuvering mechanism disclosed enables the UAV to propel the mopping systems to reach any geometric shape or inclination. The UPAMCS provides cost, time, and power efficient surface cleaning. The UPAMCS is also equipped with vision cameras and LiDAR for guidance during landing and crawling over surfaces along with additional surface defect detection by processing the captured images.

A wiping device includes a web, multiple pressing mechanisms, and circuitry. The web is windable in a winding direction and a rewinding direction, to wipe nozzle faces of multiple liquid discharge heads arranged in a width direction. The multiple pressing mechanisms are arranged in the width direction corresponding to the multiple liquid discharge heads. Each of the multiple pressing mechanisms is movable between a wiping position and a retracted position. The circuitry stores unused portion of the web at which a part of the multiple pressing mechanisms is at the retracted position during wiping, rewinds the web in the rewinding direction to cause the unused portion to face a part of the nozzle faces unwiped, and causes the part of the multiple pressing mechanisms corresponding to the unused portion to move to the wiping position to bring the unused portion into contact with the part of the nozzle faces unwiped.

A wiping device includes a web, multiple pressing mechanisms, and circuitry. The web is windable in a winding direction and a rewinding direction, to wipe nozzle faces of multiple liquid discharge heads arranged in a width direction. The multiple pressing mechanisms are arranged in the width direction corresponding to the multiple liquid discharge heads. Each of the multiple pressing mechanisms is movable between a wiping position and a retracted position. The circuitry stores unused portion of the web at which a part of the multiple pressing mechanisms is at the retracted position during wiping, rewinds the web in the rewinding direction to cause the unused portion to face a part of the nozzle faces unwiped, and causes the part of the multiple pressing mechanisms corresponding to the unused portion to move to the wiping position to bring the unused portion into contact with the part of the nozzle faces unwiped.

A medium heating apparatus includes a heating unit configured to heat a medium on which liquid was ejected, a winding unit configured to wind the medium heated by the heating unit, and a guide bar around which the medium is wound between the heating unit and the winding unit, the guide bar being configured to guide the medium to the winding unit. The heating unit includes a heat source facing a surface of the medium on which liquid was ejected, and a jetting unit configured to jet air to the surface of the medium on which liquid was ejected, and the guide bar is configured to make contact with the surface of the medium on which liquid was ejected, and configured to be rotatable.

A medium heating apparatus includes a heating unit configured to heat a medium on which liquid was ejected, a winding unit configured to wind the medium heated by the heating unit, and a guide bar around which the medium is wound between the heating unit and the winding unit, the guide bar being configured to guide the medium to the winding unit. The heating unit includes a heat source facing a surface of the medium on which liquid was ejected, and a jetting unit configured to jet air to the surface of the medium on which liquid was ejected, and the guide bar is configured to make contact with the surface of the medium on which liquid was ejected, and configured to be rotatable.

A substrate cleaning apparatus has: a substrate rotating part that rotates a substrate; an edge cleaning member for cleaning an edge part of the substrate; an edge rotating part that rotates the edge cleaning member around an edge rotary shaft that extends in a direction orthogonal to a substrate rotary shaft; a moving part that moves a position of the edge cleaning member with respect to the edge part of the substrate; and a control part that controls the moving part to move the position of the edge cleaning member with respect to the edge part of the substrate, and causes the edge cleaning member to clean a one-side edge area including a face on one side, a side face area including a side face, and an another-side edge area including a face on another side in the edge part of the substrate.

Example automatic emitter point cleaning systems include: an emitter point configured to produce at least one of positive ions or negative ions within or proximate to an ionization delivery path; an emitter frame configured to hold the emitter point in or proximate to the ionization delivery path; a brush; a motor coupled to the brush to actuate the brush to move past the emitter point; a detection surface coupled to the brush; a sensor configured to detect when the brush is in a predetermined position with respect to a reference position by detecting the detection surface; and a detection surface cleaner configured to clean the detection surface while the brush moves with respect to the emitter frame.

A pre-saturated wiper for use in a cleanroom environment, or other similarly controlled environment, that includes a woven fabric comprised of two separate and distinct microfiber materials which incorporates a unique weave pattern with sealed edges that is saturated with only Ultrapure water (UPW).

A device for cleaning a handle, including a handle including a gripping surface to be disinfected, an application member for applying a cleaning liquid to the gripping surface, and cleaning liquid supply element including at least one reservoir for receiving cleaning liquid and distributing it to the application member. The application member includes at least one buffer reserve arranged in contact with the gripping surface. The device includes a unit for actuating the application member, including drive element configured to move the buffer reserve and/or the gripping surface relatively with respect to one another so as to apply cleaning liquid to substantially the entire gripping surface during this movement.

A method of cleaning controlled and regulated equipment. A tool handle is pivotably connected to a tool head frame that includes a leading edge opposite a trailing edge between parallel first side and second side edges, where the leading edge and the trailing edge are non-parallel. The tool head frame is disposed in proximity to a tray having a compartment with a pad assembly and a cleaning solution disposed therein. The pad assembly is movable within the compartment between first and second positions. The tool head frame is hands-free attached to the pad assembly in the first or second position and hands-free detached from the pad assembly in the second position.