The invention relates to a cleaning device for detecting and removing contaminants on a mould for encapsulating electronic components, especially semiconductors, including a light source for irradiating a mould surface; an optical detector for detecting irradiated contaminants on the mould surface; a moveable cleaner for removing the contaminants; and a controller for the cleaner. The invention also relates to a cleaning method for such a mould.

A magnetic adsorption of the apparatus includes multiple magnetic adsorption barrels each including a barrel body, a magnetic roller arranged in an interior of the barrel body, and a scrape ring. The magnetic roller is reciprocally slidable relative to the scrape ring. The magnetic roller includes a roller body, a permanent magnet, a directing end-wing connected to a free end of the roller body, and a permanent magnet driving and moving mechanism. The roller body is reciprocally slidable relative to the scrape ring. The permanent magnet is arranged in the interior of the roller body. The permanent magnet driving and moving mechanism can drive the permanent magnet to move in a direction approaching or away from the directing end-wing. The slurry magnetic filter apparatus adopts a permanent magnet as a magnetic adsorption system with a relatively large effective magnetic adsorption surface area for better resolving the cleaning issues.

Provided is a tool that includes a handle assembly including a top portion and a bottom portion. The tool also includes a lock plate disposed between the top and bottom portions and having a deflectable arm having a free end biased towards the top portion, a fixed end opposite the free end, an inner edge, an outer edge, and a detent near the free end and the inner edge. The tool additionally includes a blade having first and second ends, an indent in a bottom surface of the blade near the first end for engaging the detent in a closed position, and a ramp on the bottom surface near the indent defining a reduced thickness portion of the blade that reduces in thickness from the indent towards an edge of the blade to reduce contact between the detent and the blade during rotation of the blade.

A cleaning arrangement (200) for a coating apparatus (100). The coating apparatus has a base (123) for carrying loose material. The base is rotatable to coat the loose material. The cleaning arrangement includes a base-scraping arrangement (127) and further includes a mounting arrangement (131) by which the base-scraping arrangement is mounted to be reversibly lowered, from a coating position, to a scraping position at which the base-scraping arrangement is positioned to scrape buildup from the base.

An apparatus for protecting a sensor includes: a housing accommodating the sensor to allow a sensing plane of the sensor to be exposed, and mounted on an installation object, a protective film disposed to face a sensing plane of the sensor, and a moving unit installed in the housing and moving the protective film while the protective film is maintained with respect to the sensing plane of the sensor.

A spline cleaning device for cleaning splines formed within a component of a gas turbine engine. The spline cleaning device comprises: a central support; a central support sleeve that surrounds and is movable with respect to the central support; a scraper having protrusions that substantially correspond to the splines, the scraper being attachable to the central support sleeve, and configured to remove surface contaminants from the surface of the splines; and a collector sump that is attachable to the central support and configured to collect the surface contaminants that have been removed from the surface of the splines.

Provided are automatic cleaning devices for a monocrystalline silicon bar, which include a base frame, a sprayer, a scrubber, and an air-jetter. Bottom of an inner side of the base frame is configured to place a monocrystalline silicon bar. A plurality of groups of the sprayers, a plurality of groups of the scrubbers, and a plurality of groups of the air-jetters are all disposed on side walls and a top surface of the base frame whose bottom of an inner side is removed. The sprayer is configured to spray the monocrystalline silicon bar. The scrubber is configured to scrub the monocrystalline silicon bar. The air-jetter is configured to purge the monocrystalline silicon bar.

Systems, devices, and methods for washing robotic cleaners are disclosed. An example robotic cleaning system may include a robotic cleaner, which may include a housing and at least one wet cleaning element including at least one cleaning surface on an underside of the housing. A docking station may include a base. A support may extend laterally from the base. The support may be configured to receive at least a portion of the robotic cleaner on top of the support. The support may define a cavity. At least one cleaning shuttle may be within the cavity and may include at least one spray nozzle and at least one mechanical contacting element. The spray nozzle(s) may be configured to spray cleaning fluid onto at least a first portion of the cleaning surface(s). The mechanical contacting element(s) may be configured to contact at least a second portion of the cleaning surface(s).

Disclosed are a cleaning system and method for a solar cell. The cleaning system includes a cleaning device including a soaking tank configured to accommodate cleaner; and a filtering device configured to filter a first substance being a mixture of the cleaner and mask residue in the soaking tank. The filtering device including: a sucking apparatus including an sucking port for sucking the first substance; a spraying apparatus, including a spraying port oriented a region that the sucking port is capable of sucking in a bottom of the soaking tank, and the spraying port being configured to spry liquid or gas to flush the bottom of the soaking tank; and a filtering apparatus, connected to the sucking apparatus to receive and filter the first substance sucked by the sucking port.

Disclosed are a cleaning system and method for a solar cell. The cleaning system includes a cleaning device including a soaking tank configured to accommodate cleaner; and a filtering device configured to filter a first substance being a mixture of the cleaner and mask residue in the soaking tank. The filtering device including: a sucking apparatus including an sucking port for sucking the first substance; a spraying apparatus, including a spraying port oriented a region that the sucking port is capable of sucking in a bottom of the soaking tank, and the spraying port being configured to spry liquid or gas to flush the bottom of the soaking tank; and a filtering apparatus, connected to the sucking apparatus to receive and filter the first substance sucked by the sucking port.