The present disclosure provides a backside brush for cleaning a backside of a wafer. The backside of the wafer has a central region and a periphery region surrounding the central region. The backside brush includes a backside brush core and a backside brush pad covering an outer surface of the backside brush core. The backside brush pad includes a soft pad and an abrasive pad. The soft pad of the backside brush pad covers a portion of the outer surface the backside brush core and is configured to brush the central region of the backside of the wafer. The abrasive pad of the backside brush pad covers another portion of the outer surface of the backside brush core and is configured to brush the periphery region of the backside of the wafer.

The present disclosure provides a roller for cleaning a backside of a wafer. The backside of the wafer has a central region and a periphery region surrounding the central region. The roller includes an upper element, a bottom element, and an axis element for connecting the upper element and the bottom element. The upper element of the roller is configured to contact with a frontside of the wafer. The bottom element is configured to contact with the backside of the wafer and remove particles from the periphery region of the backside of the wafer. The bottom element is made of materials selected from a group comprising abrasive pads, sand papers, and asbestos.

The embodied invention is an enhanced rotary brush tool that provides important cleaning on porcelain surfaces that are stained by hard water deposits. The brush tool incorporates an outer holder that includes a motor connecting end, a tapered shaft, an outer cup and shroud. A fill epoxy bonds the outer holder together with an internal strengthening rod and an abrasive pad. The overall assembly provides significant compressive strength to allow an individual to utilize pressure when scrubbing off the water hardness buildup.

A substrate processing apparatus is provided with a polishing part that polishes a substrate, a transporting part that transports a substrate before polishing to the polishing part, and a cleaning part that cleans the polished substrate. The cleaning part has a first cleaning unit and a second cleaning unit that are vertically arranged in two stages. The first cleaning unit and the second cleaning unit each have a plurality of cleaning modules that are arranged in series. The transporting part has a slide stage that is disposed between the first cleaning unit and the second cleaning unit, and transports a substrate before polishing along an arrangement direction of the plurality of cleaning modules.

The invention discloses a traffic road fence cleaning device, comprising a U-shaped main body support frame, the U-shaped main body support frame is composed of a first main body beam, a first main body beam, and a second main body beam, and the first body A first cleaning column and a second cleaning column are provided on the lower side of the side member, a first power system is provided on the upper side of the U-shaped main body, support frame, and a second power system is provided on the upper side of the third body side member. The front side of the U-shaped main body support frame is provided with a drum cleaning system, and a water supply system is provided above the third main body longitudinal beam. The dirt on the surface comes off. The suction pipe collects and treats part of the water mist and dust to prevent secondary pollution. The cleaning roller is responsible for the final wiping and secondary cleaning functions to ensure the cleaning quality of the traffic fence. Efficient and fast cleaning of traffic fences.

A pair of cleansing handwear, including a scrubbing surface to scrub a surface of a pool to remove at least one of settlement, dirt, fungus, mildew, mold, and dirt, and at least one fingerless portion, such that at least one of a user's fingers can grasp at least one of tiles, rocks, leaves, and dirt during cleaning of the pool.

A substrate cleaning device that facilitates control of the amount of liquid supplied to a substrate and reduces adverse influences of the liquid supplied to a bearing part on the substrate is provided. The substrate cleaning device includes: a holding part that has a bearing part configured to rotatably hold a cleaning member for cleaning a substrate; a first supply part that has at least a part provided inside the holding part and supplies a first liquid into the cleaning member through the inside of the holding part; and a second supply part that supplies a second liquid to the bearing part.

The invention discloses a large-scale quick-cleaning device for a display screen, which includes a storage box fixed on a truck, and an upper end surface of the storage box is provided with a lifting cavity with an upward opening, and the lifting cavity is provided with a lifting device for lifting. The device comprises a first motor fixedly arranged at the center of the lower wall of the lifting cavity, and a lifting platform can be slid up and down above the first motor, and a support block is fixedly arranged on the rear side of the upper end surface of the lifting platform. The upper end surface is provided with a turning groove, and a turning plate is rotatably provided between the left and right walls of the turning groove.

While a substrate is being rotated, the lower surface of a brush is moved along the upper surface of the substrate. The brush and a spray nozzle are moved upward from a takeoff position to a lower non-contact position so as to separate the lower surface of the brush from the upper surface of the substrate. The spray nozzle generates the droplets in a state where the brush and the spray nozzle are located in the lower non-contact position so as to make the droplets collide with the upper surface of the substrate, and then the droplets colliding with the upper surface of the substrate are discharged from a gap between the lower surface of the brush and the upper surface of the substrate while the droplets are being supplied to the lower surface of the brush.

A dust cleaning robot includes: a climbing cleaning robot unit for climbing side surfaces of a dust collection plate to remove dust accumulated on the dust collection plate; and a transfer robot unit operating with the climbing cleaning robot unit mounted thereon to transfer the climbing cleaning robot unit to the side surfaces of the dust collection plate so that the climbing cleaning robot unit is fixed to outer walls of the dust collection plate.