A brush apparatus includes a core portion rotating around a length direction as an axis, a main body portion at least partially surrounding the core portion, a plurality of protrusion portions protruding from the main body portion, and a detection portion disposed in at least a part of the main body portion and the plurality of protrusion portions. The detection portion is formed of poly vinyl acetal (PVA) including detection components that react with ceria.

An apparatus for cleaning brushes may include a scrubbing jig and at least two scrubbing surfaces. The scrubbing jig may be configured to scrub at least two brushes used in cleaning a wafer. The at least two scrubbing surfaces may be provided to the scrubbing jig to make contact with the at least two brushes. Accordingly, a contamination of a wafer by contaminants in the brushes may be suppressed in a following cleaning process.

An apparatus for cleaning brushes may include a scrubbing jig and at least two scrubbing surfaces. The scrubbing jig may be configured to scrub at least two brushes used in cleaning a wafer. The at least two scrubbing surfaces may be provided to the scrubbing jig to make contact with the at least two brushes. Accordingly, a contamination of a wafer by contaminants in the brushes may be suppressed in a following cleaning process.

A support mechanism for a roll cleaning member includes: a nozzle body that has a pipe connection port to which a cleaning solution supply pipe is connected and a discharge port from which a cleaning solution is discharged; a cover that is engaged with the roll cleaning member and rotates together with the roll cleaning member; and a bearing that is housed between the nozzle body and the cover. A backflow prevention wall extending in a radial direction with respect to a rotation axis of the roll cleaning member is provided in at least one of the nozzle body and the cover.

A support mechanism for a roll cleaning member includes: a nozzle body that has a pipe connection port to which a cleaning solution supply pipe is connected and a discharge port from which a cleaning solution is discharged; a cover that is engaged with the roll cleaning member and rotates together with the roll cleaning member; and a bearing that is housed between the nozzle body and the cover. A backflow prevention wall extending in a radial direction with respect to a rotation axis of the roll cleaning member is provided in at least one of the nozzle body and the cover.

A cleaning system can be used for cleaning the emitting and receiving units in a measurement section of a spectrometer probe. The cleaning system includes a cleaning instrument including a blade, cleaning lamellas extend outward from the blade, a cleaning instrument actuator including a piston imparting linear motion to the cleaning instrument during a cleaning operation and an attachment adapter configured to attach the cleaning instrument actuator to the spectrometer probe at a flow cell window aperture. The adapter includes an adapter body to receive and allow through passage of the cleaning instrument when it is attached to cleaning instrument actuator and to position the cleaning instrument relative to a measurement section between emitting and receiving units of the spectrometer probe.

A cleaning apparatus includes: first and second dischargers configured to discharge a brush cleaning liquid so that the brush cleaning liquid lands linearly on contact surfaces of first and second brushes, in a state in which the first and second brushes configured to clean a substrate are located at a retracted position spaced apart from the substrate; and a support configured to support the first and second discharger, so that the brush cleaning liquid discharged from the first discharger and the brush cleaning liquid discharged from the second discharger do not interfere with each other until the brush cleaning liquid lands on the contact surfaces of the first and second brushes.

A cleaning apparatus includes: first and second dischargers configured to discharge a brush cleaning liquid so that the brush cleaning liquid lands linearly on contact surfaces of first and second brushes, in a state in which the first and second brushes configured to clean a substrate are located at a retracted position spaced apart from the substrate; and a support configured to support the first and second discharger, so that the brush cleaning liquid discharged from the first discharger and the brush cleaning liquid discharged from the second discharger do not interfere with each other until the brush cleaning liquid lands on the contact surfaces of the first and second brushes.

A brush processing apparatus includes a particle collection platform having a rectangular prism shape, at least one coil inside the particle collection platform and configured to generate a magnetic field, a spray nozzle configured to spray fluid to clean a brush, and a sensor configured to analyze particles collected on the particle collection platform.

A brush processing apparatus includes a particle collection platform having a rectangular prism shape, at least one coil inside the particle collection platform and configured to generate a magnetic field, a spray nozzle configured to spray fluid to clean a brush, and a sensor configured to analyze particles collected on the particle collection platform.