A handheld washing apparatus features a first member, a second member, and a washing material configured to pass through the first member and couple to the second member, the first member being slidable along the length of the washing material to function as a wringer, among other things. The handheld washing apparatus may be bunched or wrapped to function as a traditional loofah or scrubber, or may be unwound and extended to aid in cleaning hard-to-reach areas. The wringer effectively cleans and speeds the drying of the washing material, in addition to the washing material air drying faster when extended.

Some embodiments of the present disclosure relate to a cleaning device including a first material having at least a first function; and a second material having at least a second function, wherein, when a probe card contacts the body, the cleaning device performs at least the first function and at least the second function.

Some embodiments of the present disclosure relate to a cleaning device including a first material having at least a first function; and a second material having at least a second function, wherein, when a probe card contacts the body, the cleaning device performs at least the first function and at least the second function.

A cleaning system can be used for cleaning the emitting and receiving units in a measurement section of a spectrometer probe. The cleaning system includes a cleaning instrument including a blade, cleaning lamellas extend outward from the blade, a cleaning instrument actuator including a piston imparting linear motion to the cleaning instrument during a cleaning operation and an attachment adapter configured to attach the cleaning instrument actuator to the spectrometer probe at a flow cell window aperture. The adapter includes an adapter body to receive and allow through passage of the cleaning instrument when it is attached to cleaning instrument actuator and to position the cleaning instrument relative to a measurement section between emitting and receiving units of the spectrometer probe.

Provided is a substrate cleaning apparatus including: a substrate holding and rotating mechanism that holds and rotates a substrate; a cleaning tool that cleans a bevel of the substrate; a contact detection means that detects contact between the cleaning tool and the bevel of the substrate; and a cleaning tool moving mechanism that moves the cleaning tool toward the bevel of the substrate until the contact is detected in a state where the substrate is being rotated.

Provided is a substrate cleaning apparatus including: a substrate holding and rotating mechanism that holds and rotates a substrate; a cleaning tool that cleans a bevel of the substrate; a contact detection means that detects contact between the cleaning tool and the bevel of the substrate; and a cleaning tool moving mechanism that moves the cleaning tool toward the bevel of the substrate until the contact is detected in a state where the substrate is being rotated.

A wafer cleaning device includes: a first brush assembly on a first side of a wafer and comprising a plurality of brushes configured to clean a first surface of the wafer; a first brush cleaner configured to clean the plurality of brushes of the first brush assembly; a brush mover including at least one actuator, the brush mover connected to the plurality of brushes of the first brush assembly and configured to move positions of the plurality of brushes; and a brush rotator including at least one actuator, the brush rotator connected to the plurality of brushes of the first brush assembly and configured to rotate each of the plurality of brushes.

A wafer cleaning device includes: a first brush assembly on a first side of a wafer and comprising a plurality of brushes configured to clean a first surface of the wafer; a first brush cleaner configured to clean the plurality of brushes of the first brush assembly; a brush mover including at least one actuator, the brush mover connected to the plurality of brushes of the first brush assembly and configured to move positions of the plurality of brushes; and a brush rotator including at least one actuator, the brush rotator connected to the plurality of brushes of the first brush assembly and configured to rotate each of the plurality of brushes.

A home cooking appliance includes a housing having a cooking cavity and a door movable between a closed state and an open state for providing access to an opening of the cooking cavity. The door has a glass surface facing an interior of the cooking cavity when the door is in the closed state, and at least a portion of the door is configured to be retractable into a position adjacent to a wall of the cooking cavity upon moving the door into the open state. The appliance includes a surface cleaning mechanism on the housing and configured to remove debris from at least a portion of the glass surface during at least one of a retraction of the door into the position adjacent to the wall of the cooking cavity and an extraction of the door from the position adjacent to the wall of the cooking cavity.

A home cooking appliance includes a housing having a cooking cavity and a door movable between a closed state and an open state for providing access to an opening of the cooking cavity. The door has a glass surface facing an interior of the cooking cavity when the door is in the closed state, and at least a portion of the door is configured to be retractable into a position adjacent to a wall of the cooking cavity upon moving the door into the open state. The appliance includes a surface cleaning mechanism on the housing and configured to remove debris from at least a portion of the glass surface during at least one of a retraction of the door into the position adjacent to the wall of the cooking cavity and an extraction of the door from the position adjacent to the wall of the cooking cavity.