Provided is a method for cleaning a rolling bearing and a rolling bearing cleaning device capable of cleaning a rolling bearing easily in a short time. The method for cleaning a rolling bearing including a plurality of rolling elements and a race provided with a race groove along which the rolling elements roll involves arranging a cleaning liquid in a pressurized state on one side in an axial direction of the rolling bearing across a whole circumference thereof with respect to a gap between the rolling elements and the race groove, and cleaning the rolling bearing by passing the cleaning liquid through the gap from one side in the axial direction toward the gap on the other side thereof.

A substrate processing method includes forming, by supplying a chemical liquid onto a central portion of a substrate while rotating a rotary table at a first speed, a liquid film of the chemical liquid having a first thickness; forming, by supplying the chemical liquid onto the central portion while rotating the rotary table at a second speed lower than the first speed after the forming of the liquid film having the first thickness, a liquid film of the chemical liquid having a second thickness larger than the first thickness; and heating, by heating the rotary table in a state that the rotary table is rotated at a third speed lower than the second speed or in a state that the rotating of the rotary table is stopped after the forming of the liquid film having the second thickness, the substrate and the liquid film of the chemical liquid.

Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated with the spin chuck; a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is rotated by the spin chuck.

Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a rotation driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated together with the spin chuck; a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position at which the chuck pin is spaced apart from the side portion of the substrate, and the chuck pin moving unit moves the chuck pin while the substrate is being rotated by the spin chuck.

An apparatus for protecting a sensor includes: a housing accommodating the sensor to allow a sensing plane of the sensor to be exposed, and mounted on an installation object, a protective film disposed to face a sensing plane of the sensor, and a moving unit installed in the housing and moving the protective film while the protective film is maintained with respect to the sensing plane of the sensor.

The present invention relates to a substrate treatment apparatus including: a substrate support assembly having a spin head onto which a substrate is seated; a fluid supply unit for supplying a fluid to the substrate; a bowl assembly having a plurality of bowls overlaid one another outwardly in a radial direction thereof to surround the substrate support assembly; and an ascending and descending unit for moving up and down the bowl assembly, wherein the bowls constituting the bowl assembly move up and down independently of one another.

A cleaning system for a meat-packing plant includes a tank with a potassium-based cleaner disposed in the tank. A track has a gambrel disposed on the track. The track includes a dip over the tank to dip the gambrel into the potassium-based cleaner as the gambrel moves along the track. A processed animal carcass is removed from the gambrel prior to the gambrel being dipped into the potassium-based cleaner. A fresh animal carcass is disposed on the gambrel after the gambrel is dipped into the potassium-based cleaner.

The present invention relates to a substrate treatment apparatus including: a substrate support assembly having a chuck base installed rotatably with a rotating shaft; a fluid supply unit for supplying treatment fluid to top of a substrate; and a back nozzle assembly disposed in a hollow portion formed on a central portion of the chuck base to dispense the treatment fluid to the underside of the substrate.

A quality control system for controlling quality of a paint target includes: an individual identification section associating a step control value and a quality control value with identification information for the paint target on the basis of the amount of movement; a state value computing section calculating a state value indicative of a paint state of the paint target on the basis of a history of a temporal change of the step control value; a learning section learning a correlation between the step control value, the state value, and the quality control value using sets of the step control value, the state value, and the quality control value; an input device receiving information on the amount of movement, the step control value, and the quality control value; and a storage device storing a set of the identification information, the step control value, the state value, and the quality control value.

A cleaner includes a body, a left spin-mop module and a right spin-mop module configured to perform mopping, and a water supply module configured to supply water to the left spin-mop module and the right spin-mop module. The water supply module includes a water tank to store water therein, a pump to pressurize the water in the water tank to move the water to the left spin-mop module and the right spin-mop module, a first supply pipe connecting the water tank and the pump, a common pipe connected to the pump, the common pump configured to guide movement of the pressurized water from the pump, a first branch pipe configured to guide a first portion of the water in the common pipe to the left spin-mop module, and a second branch pipe configured to guide a second portion of the water in the common pipe to the right spin-mop module.