A semiconductor device manufacturing system and a method for manufacturing semiconductor device are provided. The semiconductor device manufacturing system includes a substrate processing device and a processor. The substrate processing device includes a processing chamber, a gas supply module and a gas source. The processor is configured to monitor and control the gas supplied into the substrate processing device.

Provided is an apparatus for processing a substrate. The apparatus for processing a substrate includes a base portion configured to provide a rotational force in a circumferential direction; a holding module located on the base portion and configured to hold the substrate; a nozzle module located above the base portion and configured to jet a chemical liquid onto the substrate on the holding module; and a scattering prevention module located on the base portion at a peripheral portion of the holding module and configured to, when the chemical liquid is scattered after being jetted onto the substrate, guide the scattered chemical liquid to be discharged, wherein the scattering prevention module guides the scattered chemical liquid with a variable movement caused by the rotational force.

There is provided a substrate processing apparatus, including: a substrate holder configured to hold a substrate with a surface of the substrate on which a concavo-convex pattern is formed oriented upward; a liquid supply unit configured to supply a processing liquid to the substrate held by the substrate holder to form a liquid film at least in a concave portion of the concavo-convex pattern; a heating unit configured to irradiate the substrate held by the substrate holder or the liquid film with a laser beam for heating the liquid film; and a heating controller configured to control the heating unit, wherein the heating controller controls the heating unit to expose the entire concave portion in a depth direction from the processing liquid by irradiating the laser beam onto the substrate or the liquid film from the heating unit.

A substrate processing apparatus processes a substrate having an upper side and a rear side. The substrate processing apparatus includes a substrate holder, a filler feeder, and a first cleaning liquid feeder. The substrate holder rotates the substrate while holding a central portion of the rear side of the substrate. The filler feeder feeds filler to the upper side of the substrate held by the substrate holder. The first cleaning liquid feeder feeds a cleaning liquid to the rear side of the substrate held by the substrate holder. The first cleaning liquid feeder feeds the cleaning liquid to an area, held by the substrate holder, of the rear side of the substrate.

An apparatus includes a substrate stage configured to secure a substrate thereon and a motion mechanism configured to rotate the substrate stage. The substrate stage includes a plurality of holding pins for holding an edge of the substrate. Rotating the substrate stage causes a chemical solution dispensed on an upper surface of the substrate to spread outwardly toward the edge of the substrate. At least one of the plurality of holding pins includes at least one opening or at least one tapered side surface, or both, for guiding the chemical solution to flow off the substrate.

A sensor lens assembly includes a cylindrical sensor body including a lower surface, a sensor lens surface, and a side surface extending between the lower surface and an outer edge of the sensor lens surface, a sensor enclosed within the cylindrical sensor body and adjacent to the sensor lens surface, and a nozzle configured to deliver a fluid near a center point of the sensor lens surface. The sensor lens surface is concave and rotates relative to the side surface of the cylindrical sensor body such that centrifugal force causes the fluid to form a film on the sensor lens surface that acts as a barrier, cushion, and particle collecting medium on the sensor lens surface.

An ultrasonic cleaning apparatus capable of cleaning large-sized objects includes: a casing having a bottom surface that forms a tilted surface to oppose the object to be cleaned and having an ultrasonic transducer provided at an inner lower surface; a cleaning liquid supply device configured to supply cleaning liquid to a casing bottom surface; and a flow-speed accelerator that ejects the cleaning liquid by accelerating the flow speed of the cleaning liquid from the cleaning liquid supply device. The casing is formed by a main body including an upper plate, a projected part attached to a lower part of the upper plate, an outer lateral face extended from the projected part in a downward direction, and the bottom surface connected integrally at a lower end part of the outer lateral face. The bottom surface is formed to be tilted at a prescribed angle with respect to a horizontal plane.

A cleaning wiper blade for a moving grocery conveyor belt in the form of a thin sheet of paperboard, cardboard or plastic material having a length which is essentially the same as said width of the belt. The underside of the sheet includes first, second and third areas all having a width and a length wherein the lengths are substantially equal to the length of the sheet. The first area includes an adhesive thereon adapted to be temporarily secured to the frame of the conveyor and is covered by a release paper. The second area includes a porous member having a quantity of a liquid cleaning agent and a protective covering for the member to prevent the liquid agent from being released. The third area includes material capable of wiping liquid from the belt. The cleaning wiper blade is capable of being attached to the conveyor by removing the release paper and the protective covering and securing the first area of the sheet of to the conveyor frame with the second and third areas contacting the upper surface of the belt as it moves.

According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

A system for treating wash waste liquid is described, configured for coupling to a wash module of a continuous Tunnel washing machine for the field of Preclinical Pharmaceutical Research, said wash module (12) comprising a wash chamber (25), characterized in that it comprises: a wash tub (22) with a side wall (31) substantially cylindrical in shape, with a tangential liquid suction outlet (33) and a substantially conical bottom, with a wash waste drain point (35) at the vertex of the cone, said tangential suction being adapted to generate a rotational motion of the liquid in said tub, said tub being positioned under said wash chamber (25), so as to receive said wash liquid by gravity; a centrifugal wash pump (21) with an open impeller, adapted to take in liquid from said tangential liquid suction outlet (33); an in-line filter (26) with an internal filter cartridge of the “wedge-wire” type, adapted to filter the liquid coming from said centrifugal pump (21) and deliver it back, filtered, into said wash chamber (25), and comprising a flush valve (27) for discharging the filtering waste.