A substrate processing apparatus includes a processing tub, a storage, a liquid recovery unit, a storage drain line and a liquid recovery unit drain line. The processing tub is allowed to accommodate therein multiple substrates, and configured to store therein a processing liquid. The storage is connected to the processing tub, and configured to store therein the processing liquid drained from the processing tub. The liquid recovery unit is configured to receive the processing liquid overflown from the processing tub. The storage drain line is configured to drain a liquid stored in the storage. The liquid recovery unit drain line is configured to drain a liquid received from the liquid recovery unit to an external drain line provided at an outside.

A substrate treatment apparatus according to the present invention is provided with a first tank that stores treatment liquid for treating a substrate and a first path that returns the treatment liquid, which has spilled over from an upper part of the first tank, to a lower part of the first tank. A second path that branches from the first path, a measurement tank that stores the treatment liquid, which has flowed in from the second path, and a pressure measurement part that measures the pressure of the treatment liquid at a predetermined depth in the measurement tank in a state in which the treatment liquid spills over from an upper part of the measurement tank are provided. Therefore, techniques for highly precisely measuring the pressure of the treatment liquid used in treatment of substrates can be provided.

A rinsing machine for cleaning a display panel, including a main tank body, a spillover slot at the periphery of upper edges of the main tank body, a stirrer in the main tank body, and a rinsing liquid storage slot for storing rinsing liquid used for supplementing the rinsing liquid in the main tank body is disclosed. The rinsing liquid storage slot is communicated with the main tank body via a rinsing liquid supplement valve. The main tank body is provided with a discharge port which is capable of being opened and closed at the bottom of the main tank body. A rinsing method by means of the rinsing machine is also disclosed.

An apparatus for cleaning game, fruit, vegetables, fish, or crustacea in a container has a pipe and a connector connected to the pipe adjacent one end of the pipe. The pipe has a plurality of apertures formed in spaced relation to each other along a length of the pipe. The pipe is adapted to extend generally vertical within the container. The plurality of apertures are adapted to direct a flow of water in a generally cyclonic path in the container. The connector is adapted to introduce water into and through the pipe from a water hose or a conduit. A fastener is affixed to the pipe or the connector so as to removably affix the pipe to the a container. A spacer is affixed to the pipe so as to position the pipe a distance away from a wall of the container.

The present disclosure relates to the technical field of glass substrate cleaning. Specifically, the present disclosure provides a glass substrate detergent tank which can solve the technical problem of wasting detergent solution. The detergent tank includes a tank body enclosed by a top face, a bottom face and side faces. There are a water inlet, a water outlet and a vent hole in tank body. There is a partition plate disposed between two facing inside faces of the tank body, which separate the tank body into two cavities communicating at the bottom. The detergent tank according to the embodiment of the present disclosure will not let froth discharge outside the tank body with gas, and thus can reduce the amount of wasted detergent solution, thereby extending the usage time of the detergent solution.

A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.

A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.

The present invention concerns a beverage preparation machine (1) for preparing a beverage from a food substance contained in a capsule (12) by injection of a fluid into said capsule (12), said machine comprising: a capsule holder (8) for holding a capsule, said holder (8) having a cup-shaped body (27), a handle portion (28), and a dispensing opening (29) through the bottom portion (30) of said body (27); a fluid conduction system comprising a fluid reservoir (2), a fluid pump, optionally a fluid heater, said reservoir, pump and heater being connected by fluid pipes; a brewing head (3) having an aperture for receiving said capsule holder (8), and an injection support (17) connected to the fluid conduction system; an injection plate (18) supported by said support (17), said injection plate (18) comprising an upper surface (23) with a fluid coupling (32) connected to the fluid conduction system through said support, said injection plate (18) further comprising a fluid conducting channel (24) connecting the fluid coupling (32) to a fluid injection element (19) located in the lower surface (22) of said injection plate (18), such that said injection element (19) is able to inject fluid into the capsule (12), characterized in that said injection plate (18) further comprises at least one cleaning channel (21) independent from the fluid conducting channel (24) connecting its upper (23) and lower (22) surfaces, said cleaning channel(s) (21) being suitable for circulating fluid at least from the lower surface (22) towards the upper surface (23) of said injection plate (18).

The invention relates to a method and a cleaning system for machine-cleaning workpieces and/or machine components received in at least one partly open cleaning chamber. A first aspect of the invention relates to a method for machine-cleaning workpieces or machine components received in at least one partly open cleaning chamber, wherein the workpieces or machine components to be cleaned are introduced into the cleaning chamber on a workpiece support and/or a rotary arrangement; at least one cleaning flow is generated by at least one lance device. The cleaning flow being supplied to at least some sections of the outer contour of the workpieces or machine components to be cleaned; and where the lance device can be moved along the outer contour of the workpiece or machine component to be cleaned in a controlled manner by a guiding and moving device dependent on a control routine which is executed in a control unit. Multiple cleaning sections are defined on the three-dimensional outer contour in an individual manner for the workpiece or machine component to be cleaned on the basis of test specifications for the residual dirt analysis of workpieces or machine components, and the control routine is generated based thereon. The lance device is guided at least to the ascertained cleaning sections in a controlled manner by means of the guiding and moving device, and each cleaning section is supplied with the cleaning flow in a controlled manner.

A substrate processing apparatus includes a guard that catches liquid scattered outward from a spin chuck, a cup defining a liquid receiving groove to catch liquid that is guided downward by the guard, a guard elevating/lowering unit that moves the guard in an up/down direction, a cleaning liquid supplying unit that supplies cleaning liquid, discharged from a cleaning liquid nozzle, to the liquid receiving groove via the spin chuck and the guard, a cleaning liquid draining unit that drains the cleaning liquid in the liquid receiving groove, and a controller that controls the cleaning liquid supplying unit and the cleaning liquid draining unit to accumulate cleaning liquid in the liquid receiving groove and controls the guard elevating/lowering unit to cause a lower end portion of the cylindrical portion to be immersed in the cleaning liquid in the liquid receiving groove.