A liquid storage tank may include a body with an inner cavity, wherein a first liquid storage area and a second liquid storage area are provided in the body, and a partition is provided between the first liquid storage area and the second liquid storage area. A heater for heating solution is provided in the first liquid storage area. A liquid outlet is provided in the second liquid storage area.

Example systems and methods for treating workpieces are disclosed. In some examples, the system includes a treatment station positioned in a process chamber for treating the workpiece with fluid. The example system includes a handling device positioned in the process chamber. The example handling device includes a base positioned in the process chamber, a supporting arm coupled to the base and pivotable relative to the base about a first pivot axis, a pivoting arm coupled to the supporting arm and pivotable relative to the supporting arm about a second pivot axis, and a receptacle coupled to the pivoting arm and including a workpiece holder capable of picking up the workpiece from a workpiece feeder positioned outside of the process chamber. The example handling device is capable of moving the workpiece through an opening of the process chamber and into a treatment position at the treatment station.

In certain embodiments the metal liftoff tool comprises an immersion tank for receiving a wafer cassette with wafers therein, the immersion tank including an inner weir, a lifting and lowering mechanism capable of raising and lowering the wafer cassette while submerged in fluid in the immersion tank, low pressure high velocity primary spray jets for stripping the metal, the primary spray jets positioned at opposing sides of the immersion tank parallel to the wafer surfaces planes, and secondary spray jets for pressure equalization force, positioned at the bottom of the immersion tank. A wafer lift insert is positioned at the bottom of the immersion tank to receive and periodically lift the wafers within the cassette.

An apparatus for washing an article includes a container defining an internal chamber configured to receive the article, an inflow connector connectable to a source of pressurized fluid, a filter member disposed within the internal chamber between a base of the container and the inflow connector, and a lid sealingly engagable with an open upper end of the container and defining at least one opening. Pressurized fluid supplied to the internal chamber is urged upwardly through the internal chamber, through and around an article disposed therein, and out the at least one opening of the lid. As a result, salt retained within or on the article is expelled through the at least one opening of the lid and particulate on or within the article is collected or passed through the filter member. Systems incorporating the apparatus and methods of using the same are also provided.

Embodiments of the present disclosure are directed to additive manufacturing apparatuses, cleaning stations incorporated therein, and methods of cleaning using the cleaning stations.

In certain embodiments the metal liftoff tool comprises an immersion tank for receiving a wafer cassette with wafers therein, the immersion tank including an inner weir, a lifting and lowering mechanism capable of raising and lowering the wafer cassette while submerged in fluid in the immersion tank, low pressure high velocity primary spray jets for stripping the metal, the primary spray jets positioned at opposing sides of the immersion tank parallel to the wafer surfaces planes, and secondary spray jets for pressure equalization force, positioned at the bottom of the immersion tank. A wafer lift insert is positioned at the bottom of the immersion tank to receive and periodically lift the wafers within the cassette.

A substrate processing apparatus collectively processes a plurality of substrates with the plurality of substrates immersing in a processing liquid. The substrate processing apparatus includes a processing tank, a camera, and a controller. The processing tank stores the processing liquid. The camera is provided vertically higher above the processing tank and captures the inside of the processing tank to generate a plurality of items of captured image data. The controller generates smoothed image data obtained by smoothing a brightness distribution of waving caused on a liquid surface of the processing liquid based on integration of the plurality of items of captured image data, and monitors the inside of the processing tank based on the smoothed image data.

Embodiments of the present disclosure are directed to additive manufacturing apparatuses, cleaning stations incorporated therein, and methods of cleaning using the cleaning stations.

A system and method for deglazing or defrosting items, for cleaning wares, and/or for thermalizing/rethermalizing food items. The system includes a tank for holding fluid and a wash pump for creating a rolling washing action within the wash tank. The method includes placing items into the fluid so that as the fluid rolls within the wash tank, the items become deglazed or defrosted. The system further includes a discharge manifold with a plurality of discharge jets, a flow balancer for equalizing flow to multiple sections of the tank, and a diffuser plate for equalizing flow within a section of the tank. The various components of the system can be removed for cleaning, inspection, and/or replacement. The discharge manifold is accessible for removal and is configured to be easily cleaned.

A substrate processing apparatus collectively processes a plurality of substrates with the plurality of substrates immersing in a processing liquid. The substrate processing apparatus includes a processing tank, a camera, and a controller. The processing tank stores the processing liquid. The camera is provided vertically higher above the processing tank and captures the inside of the processing tank to generate a plurality of items of captured image data. The controller generates smoothed image data obtained by smoothing a brightness distribution of waving caused on a liquid surface of the processing liquid based on integration of the plurality of items of captured image data, and monitors the inside of the processing tank based on the smoothed image data.