The present invention relates to a method for removing a foreign material from the surface of an article comprising the following steps: i) providing an article having a surface covered at least partly with a foreign material; ii) contacting the article provided in step i) with a cleaning medium being an acid having a pKa in the range from −10 to 7 having a minimum concentration of 1 wt.-% and with a carrier medium having a density different from the density of the cleaning medium to obtain a mixture comprising the foreign material solved and/or dispersed in the cleaning medium, the carrier medium and the article free from the foreign material; iii) allowing the mixture obtained in step ii) to separate to obtain a heterophasic emulsion comprising at least a first phase comprising the carrier medium and the article free from the foreign material and a second phase comprising the cleaning medium and the foreign material solved and/or dispersed therein; iv) separating the phases obtained in step iii); and v) separating the article free from the foreign material from the carrier medium. Furthermore, the present invention relates to an installation for carrying out the inventive process.

The present invention relates to a method for removing a foreign material from the surface of an article comprising the following steps: i) providing an article having a surface covered at least partly with a foreign material; ii) contacting the article provided in step i) with a cleaning medium being an acid having a pKa in the range from −10 to 7 having a minimum concentration of 1 wt.-% and with a carrier medium having a density different from the density of the cleaning medium to obtain a mixture comprising the foreign material solved and/or dispersed in the cleaning medium, the carrier medium and the article free from the foreign material; iii) allowing the mixture obtained in step ii) to separate to obtain a heterophasic emulsion comprising at least a first phase comprising the carrier medium and the article free from the foreign material and a second phase comprising the cleaning medium and the foreign material solved and/or dispersed therein; iv) separating the phases obtained in step iii); and v) separating the article free from the foreign material from the carrier medium. Furthermore, the present invention relates to an installation for carrying out the inventive process.

The present disclosure relates to a workpiece cleaning device and a cleaning method. The workpiece cleaning device comprises: a frame (1); and a plurality of cleaning tanks disposed on the frame (1) side by side, comprising a molten salt cleaning tank (2) for cleaning a workpiece with molten salt, a first rinsing tank (5) for rinsing the workpiece cleaned with the molten salt, a de-rusting cleaning tank (6) for cleaning the workpiece rinsed in the first rinsing tank (5) with a de-rusting agent, a second rinsing tank (7) for rinsing the workpiece cleaned with the de-rusting agent, and an anti-rust cleaning tank (8) for cleaning the workpiece rinsed in the second rinsing tank (7) with anti-rust liquid, which are sequentially disposed from upstream to downstream in terms of procedure.

The present disclosure relates to a workpiece cleaning device and a cleaning method. The workpiece cleaning device comprises: a frame (1); and a plurality of cleaning tanks disposed on the frame (1) side by side, comprising a molten salt cleaning tank (2) for cleaning a workpiece with molten salt, a first rinsing tank (5) for rinsing the workpiece cleaned with the molten salt, a de-rusting cleaning tank (6) for cleaning the workpiece rinsed in the first rinsing tank (5) with a de-rusting agent, a second rinsing tank (7) for rinsing the workpiece cleaned with the de-rusting agent, and an anti-rust cleaning tank (8) for cleaning the workpiece rinsed in the second rinsing tank (7) with anti-rust liquid, which are sequentially disposed from upstream to downstream in terms of procedure.

A coating removal process includes providing a coating removal vessel having a sealable processing volume therein, providing a coating removal fluid, which reacts with the coating, at an elevated temperature above the ambient temperature surrounding the removal vessel, in the sealable processing volume, locating a component having a coating thereon to be removed in the processing volume, sealing the sealable process volume from the ambient surrounding the processing volume, heating the coating removal fluid to a temperature greater than the boiling point thereof at the pressure of the surrounding ambient, removing the coating from the component using the coating removal fluid at the temperature greater than the boiling point thereof at the pressure of the surrounding ambient, reducing the temperature of the coating removal fluid to a temperature less than the boiling point thereof at the pressure of the surrounding ambient, venting the sealable volume to the surrounding ambient, and removing the component from the processing volume.

The natural oxidation film of polysilicon, which is exposed at a side surface of a recess portion 83 provided in a substrate W, is removed and a thin film 84 of polysilicon is exposed at the side surface of the recess portion 83. Liquid IPA is brought into contact with the thin film 84 of polysilicon after the natural oxidation film of polysilicon is removed. Diluted ammonia water is supplied to the substrate W and the thin film 84 of polysilicon is etched after IPA comes into contact with the thin film 84 of polysilicon.

The natural oxidation film of polysilicon, which is exposed at a side surface of a recess portion 83 provided in a substrate W, is removed and a thin film 84 of polysilicon is exposed at the side surface of the recess portion 83. Liquid IPA is brought into contact with the thin film 84 of polysilicon after the natural oxidation film of polysilicon is removed. Diluted ammonia water is supplied to the substrate W and the thin film 84 of polysilicon is etched after IPA comes into contact with the thin film 84 of polysilicon.

A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.

A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.

The invention concerns a storage device for cleaning and charging portable X-ray detectors, and an X-ray system comprising such storage device. The storage device comprises a receiving unit for receiving at least one portable X-ray detector, a cleaning unit for cleaning the portable X-ray detector when being received by the receiving unit, and a charging unit for charging the portable X-ray detector, wherein the cleaning unit is configured for mechanically and/or chemically cleaning the portable X-ray detector. Further, the invention concerns a method of cleaning and charging a portable X-ray detector in a storage device.