The invention concerns a storage device for cleaning and charging portable X-ray detectors, and an X-ray system comprising such storage device. The storage device comprises a receiving unit for receiving at least one portable X-ray detector, a cleaning unit for cleaning the portable X-ray detector when being received by the receiving unit, and a charging unit for charging the portable X-ray detector, wherein the cleaning unit is configured for mechanically and/or chemically cleaning the portable X-ray detector. Further, the invention concerns a method of cleaning and charging a portable X-ray detector in a storage device.

A method of removing polyvinyl alcohol (PVA)-based scaffold from a 3D printed part formed by a 3D printing process that renders a finished product for immediate use. The method principally involves preparing an acidic-aqueous cleansing solution comprising a mixture of carboxylic acid and water; immersing the 3D printed part conventionally bonded with PVA-based scaffold into the acidic-aqueous cleansing solution for a select amount of time to break down and remove the PVA-based scaffold from the 3D printed part; and adding to the acidic-aqueous cleansing solution a select quantity of polymeric carbohydrate to crosslink and bond with the PVA-based scaffold to effect dissolution thereof into the acidic-aqueous cleansing solution.

A method of removing polyvinyl alcohol (PVA)-based scaffold from a 3D printed part formed by a 3D printing process that renders a finished product for immediate use. The method principally involves preparing an acidic-aqueous cleansing solution comprising a mixture of carboxylic acid and water; immersing the 3D printed part conventionally bonded with PVA-based scaffold into the acidic-aqueous cleansing solution for a select amount of time to break down and remove the PVA-based scaffold from the 3D printed part; and adding to the acidic-aqueous cleansing solution a select quantity of polymeric carbohydrate to crosslink and bond with the PVA-based scaffold to effect dissolution thereof into the acidic-aqueous cleansing solution.

The present invention relates to a substrate cleaning system and a substrate cleaning method for cleaning a substrate. The substrate cleaning system (50) includes a heater (51), a chemical-liquid diluting module (52), and a cleaning module. A temperature of the diluted-chemical-liquid mixed by the chemical-liquid diluting module (52) is determined to be higher than normal a temperature and lower than a glass transition point of a cleaning member. The cleaning member scrubs the substrate (W) with the diluted chemical liquid having the determined temperature supplied to the substrate (W).

The present invention relates to a substrate cleaning system and a substrate cleaning method for cleaning a substrate. The substrate cleaning system (50) includes a heater (51), a chemical-liquid diluting module (52), and a cleaning module. A temperature of the diluted-chemical-liquid mixed by the chemical-liquid diluting module (52) is determined to be higher than normal a temperature and lower than a glass transition point of a cleaning member. The cleaning member scrubs the substrate (W) with the diluted chemical liquid having the determined temperature supplied to the substrate (W).

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

A containment device for cleaning agents or other liquids to attach to a showerhead, faucet, or other plumbing fixture outlet that may serve as an effective means of solvent containment and promote a more effective delivery system for a cleaning agent, the containment device comprising a housing, wherein the housing comprises a top, an opening disposed on the top, a bottom, a hollow interior, an interior surface, and an exterior surface, wherein the housing is shaped to fit around a showerhead, and wherein the housing is configured to contain a solvent cleaning agent.

A containment device for cleaning agents or other liquids to attach to a showerhead, faucet, or other plumbing fixture outlet that may serve as an effective means of solvent containment and promote a more effective delivery system for a cleaning agent, the containment device comprising a housing, wherein the housing comprises a top, an opening disposed on the top, a bottom, a hollow interior, an interior surface, and an exterior surface, wherein the housing is shaped to fit around a showerhead, and wherein the housing is configured to contain a solvent cleaning agent.

The invention relates to a module for chemically processing a substrate, a method for chemically processing a substrate and a use of a module for chemically processing a substrate and in particular a large substrate. The module for chemically processing a substrate comprises: an immersion chamber, a spray unit, and a motion unit (14). The immersion chamber is configured to receive a first liquid and the substrate, so that the substrate is immersed in the liquid. The spray unit comprises a plurality of spray nozzles, which are configured to spray a second liquid within the immersion chamber. The motion unit is configured to provide a relative motion between the substrate and the spray unit.