Patent classifications
B08B3/10
Systems and methods to clean a continuous substrate
An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; transporting the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having an agitation bath; vacuuming moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; directing energy at the continuous substrate in the agitation bath using at least one of a megasonic transducer or an ultrasonic transducer; and drying the continuous substrate.
SYSTEM AND METHOD FOR SUPERVISED POST-PROCESSING
A system and method for cleaning and/or post-exposure of a body manufactured by using an additive manufacturing method from a substance curable by radiation, the system including a cleaning tank for cleaning the body and/or an exposure chamber for post-exposure of the body, the system further including a transport device having a drive for moving a build platform relative to the cleaning tank and/or to the exposure chamber. The transport device includes a force sensor, the force sensor captures a force acting on the build platform and provides a force signal, and is connected to a processing unit for controlling the drive and/or for outputting process parameters based on the force signal.
WAFER BATH IMAGING
An exemplary method of monitoring a bath process includes processing a first wafer by submerging the first wafer within a bath solution; capturing a video of the bath solution containing the first wafer during a first time interval; analyzing the video based on intensity of light captured in a frame of the video; and based on analyzing the video, determining a first metric of the bath solution during the first time interval.
Nozzle, substrate processing apparatus including the same, and substrate processing method
The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.
CLEANING ROLLER DEVICE
A cleaning roller device is provided. The cleaning roller device comprises a transversely-arranged cleaning roller, a roller bearing device, and a roller driving device capable of driving the cleaning roller to rotate around the central axis of the cleaning roller on the roller bearing device, wherein a front-end central pipe and a rear-end central pipe are respectively arranged along the front-end central axis and the rear-end central axis of the cleaning roller and are respectively connected to rotary joints. The rotary joints are used for respectively connecting external pipelines communicated with a water source and a steam source; the front end of the cleaning roller is provided with a solid barrel fragment outlet and a barrel fragment outlet sealing cover, and the rear end of the cleaning roller is provided with a liquid outlet; a feed port is formed in the wall of the cleaning roller.
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
A substrate processing method for removing an organic film on a substrate includes a) carrying out introduction of ozone-containing gas into a substrate processing chamber to fill at least a space above the substrate in the substrate processing chamber with ozone-containing gas, b) starting spraying through the space a heated chemical liquid containing sulfuric acid onto the substrate after the a), c) continuing the spraying started in the b), and d) stopping the spraying continued in the c).
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
A substrate processing method for removing an organic film on a substrate includes a) carrying out introduction of ozone-containing gas into a substrate processing chamber to fill at least a space above the substrate in the substrate processing chamber with ozone-containing gas, b) starting spraying through the space a heated chemical liquid containing sulfuric acid onto the substrate after the a), c) continuing the spraying started in the b), and d) stopping the spraying continued in the c).
Aquaculture net cleaning system
An apparatus for cleaning aquaculture nets underwater. The appartus employs a propeller housing with a centrally disposed axis with a plurality of propeller blades extending therefrom. An outer perimeter ring secured to an outer tip of each propeller blade with a plurality of knuckles secured to the outer perimeter ring. Each knuckle including a curved surface constructed and arranged to strike the aquaculture net upon rotation of the blades for removal of growth by impact and shaking of the aquaculture net.
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
A substrate processing method includes a processing liquid supplying step of supplying a processing liquid having a solute and a solvent to a surface of a substrate, a processing film forming step of solidifying or curing the processing liquid supplied to the surface of the substrate to form, on the surface of the substrate, a processing film that holds a removal object present on the surface of the substrate, a peeling step of supplying a peeling liquid forming liquid to the surface of the substrate to put the peeling liquid forming liquid in contact with the processing film and form a peeling liquid, and peeling the processing film, in the state of holding the removal object, from the surface of the substrate by the peeling liquid, and a removing step of continuing the supply of the peeling liquid forming liquid, after the peeling of the processing film, to wash away and remove the processing film from the surface of the substrate in the state where the removal object is held by the processing film.
Bath Systems and Methods Thereof
A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.