The invention relates to an apparatus (1) for the applying of and removal by suction of operating fluids onto rolling stock (2) and off rolling stock (2) in the inlet (4) of cold rolling systems (6) and comprises at least one spray device (7) arranged above or below a rolling stock transport line (8), wherein at least one operating fluid can be placed by the spray device (7) onto a surface of the rolling stock (2) or onto a surface of a working roll (9) which makes contact with the rolling stock (2), and to at least one suction removal device (10) which can be arranged above or below the rolling stock transport line (8) and on the same side of the rolling stock transport line (8) as the spray device (7), wherein the suction removal device (10) acts in the vicinity of the surface of the rolling stock (2) or of the working roll (9). The spray device (7) and the suction removal device (10) are attached onto a common component frame (12) and therefore form a compact unit (14.1; 14.2).

There is provided a cleaning nozzle that cleans a cleaning target face that is one of a holding face that holds a workpiece and/or a surface of the workpiece held on the holding face. The cleaning nozzle includes an air nozzle having an jet port for jetting air toward the cleaning target face and extending in a direction parallel to the cleaning target face, and a suction nozzle having a suction port for sucking air on the cleaning target face and arranged adjacent to and in parallel to the air nozzle.

According to one aspect, there is provided a method of cleaning a 3D object on a platform. The method comprises generating with a cleaning module a cleaning airflow to remove powder particles from a 3D object and an extraction airflow to extract any removed powder particles, determining a quantity of powder particles in the extraction airflow, and moving the cleaning module relative to the platform based on the determined quantity of powder particles.

A system for maintaining a device in a semiconductor manufacturing environment that includes a controller configured to determine a distance travelled by the device within the semiconductor manufacturing environment, where the device has a feature that selectively engages a carrier configured to carry a semiconductor wafer such that the device moves the semiconductor wafer to different processing stations within the semiconductor manufacturing environment. The system also includes an inspection component configured to inspect the device responsive to the distance travelled by the device exceeding a distance threshold, a repair component configured to repair the device responsive to a repair indication from at least one of the controller or the inspection component, and a cleaning component configured to clean the device responsive to a clean indication from at least one of the controller or the inspection component.

Air rinsing apparatus and systems for rinsing containers are disclosed. An example air rinsing apparatus includes: a first enclosure having a first inlet port and a first output port; a second enclosure within the first enclosure, the second enclosure comprising a second inlet port and a second output port, the second output port disposed on a same face of the first enclosure as the first inlet port; and one or more air movers configured to: urge first air into the second inlet port, the second enclosure configured to direct the first air from the second inlet port to the second output port; and pull second air from the first output port, the first enclosure configured to direct the second air from the first inlet port to the first output port.

A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

Air rinsing apparatus and systems for rinsing containers are disclosed. An example air rinsing apparatus includes: a first enclosure having a first inlet port and a first output port; a second enclosure within the first enclosure, the second enclosure comprising a second inlet port and a second output port, the second output port disposed on a same face of the first enclosure as the first inlet port; and one or more air movers configured to: urge first air into the second inlet port, the second enclosure configured to direct the first air from the second inlet port to the second output port; and pull second air from the first output port, the first enclosure configured to direct the second air from the first inlet port to the first output port.

Proposed is a mat cleaning device. The mat cleaning device includes a casing which constitutes an exterior of the mat cleaning device, a washing water spray nozzle which is disposed on one side of the casing and sprays washing water on the mat, a drive motor which is disposed inside the casing and provides power, a plurality of rollers which is rotated by the power supplied from the drive motor and transfers and washes the mat, a vacuum pump which forms vacuum pressure, a vacuum suction means which sucks moisture and foreign matter on a surface of a washed mat by using the vacuum pressure formed by the vacuum pump, and a centrifugation chamber which provides the vacuum pressure formed by the vacuum pump to the vacuum suction means.

Proposed is a mat cleaning device. The mat cleaning device includes a casing which constitutes an exterior of the mat cleaning device, a washing water spray nozzle which is disposed on one side of the casing and sprays washing water on the mat, a drive motor which is disposed inside the casing and provides power, a plurality of rollers which is rotated by the power supplied from the drive motor and transfers and washes the mat, a vacuum pump which forms vacuum pressure, a vacuum suction means which sucks moisture and foreign matter on a surface of a washed mat by using the vacuum pressure formed by the vacuum pump, and a centrifugation chamber which provides the vacuum pressure formed by the vacuum pump to the vacuum suction means.

An apparatus for washing a mat, which enables a user to introduce the mat into the apparatus pile side up so, that it can be inspected and pretreated before cleaning by the apparatus. The mat is inclined in the wash and/or rinse module of the apparatus, while a plurality of high pressure nozzles spray water onto the pile side of the mat. Water flowing down the inclined mat pre-wets regions of the mat to pre-treat these regions before they are treated by the high pressure nozzles. The apparatus may include a trough at the bottom of the incline to further soak the mat before treatment by the high pressure nozzles. The apparatus may include means for holding the mat flat on the incline, means for extracting water from the cleaned mat, and means for cleaning and reusing water.