According to one embodiment a substrate treatment apparatus removes foreign matter from a surface of a substrate by forming a frozen film at the surface of the substrate, incorporating, into the frozen film, the foreign matter adhered to the surface of the substrate, and thawing the frozen film including the foreign matter. A liquid supply part that supplies a liquid to the frozen film including the foreign matter, a vibrating part that faces the frozen film, and a controller that controls the vibrating part are included. The controller controls the vibrating part to transmit a vibration to a liquid film, which includes the liquid supplied to the frozen film and a liquid generated by the thawing of the frozen film, and to reduce an energy of the vibration transmitted to the liquid film or stop the vibration according to a position of an upper surface of the frozen film under the liquid film.

The disclosure relates to the cleaning of oilfield tools made of metal, particularly to the method of reclamation oilfield tools, already used in the mechanical deep-pumping extraction of oil, as well as to the product made with the help of the mentioned method. The method of remanufacturing of standard length rods includes cleaning the rod with at least one cryogen to eliminate environmental contamination and to assist in workplace safety.

The invention relates to a method and a system for the processing of an end-of-use pneumatic tire that is provided with an inner lining layer manufactured with a sealing agent intended to seal any punctures and at least partially applied to the surface of an inner cavity of the end-of-use pneumatic tire. The system comprises an applicator device, which is provided with at least one nozzle suitable for dispensing a cryogenic fluid, preferably liquid nitrogen, upon the inner lining layer of sealing agent in such a way that the inner lining layer of sealing agent reaches the solid state; a device for the removal of the inner lining layer of solid sealing agent that is provided with a tool for removing the inner lining layer of solid sealing agent by means of mechanical abrasion; and a circuit for suctioning the solid sealing agent removed by the tool.

Cleaning processing equipment may include generating a function characterizing a relationship between fouling formation in the processing equipment and operation of the processing equipment. A cleaning recipe may be selected based on properties of fouling material formed in the processing equipment during operation of the processing equipment. Operating costs associated with cleaning schedules may be determined based on the first function and the cleaning recipe and one of the cleaning schedules may be selected based on the respective determined operating costs. A cleaning process on the processing equipment may be executed according to the selected cleaning schedule using the selected cleaning recipe.

A vibrating body according to an embodiment is used for cleaning a substrate. A contact portion of the vibrating body with a liquid on a surface of the substrate has an inclined region inclined with respect to an end portion of the vibrating body facing the substrate. An angle between the inclined region and an extension line of the end portion of the vibrating body is , which satisfies the following condition: 20 degrees87 degrees

In a cleaning method for removing adhesive residues from surfaces, in particular after separating an adhesive connection between adhesively joined partners, liquid carbon dioxide from a reservoir enters a jet apparatus and is guided there through a first dosing unit into an expansion chamber, wherein a cold-resistant liquid is then supplied to a mixture created in the expansion chamber from gaseous carbon dioxide and carbon dioxide particles and wherein the mixture, to which the cold-resistant liquid has been added, exits the jet apparatus via an outlet opening thereof. Furthermore, a jet apparatus removes adhesive residues from surfaces.

According to one embodiment, a substrate processing apparatus includes: a stage rotatable around a central axis; a plurality of holders provided on the stage to hold a substrate; a cooler capable of supplying a cooling gas to a space between the stage and the substrate; and a liquid supply capable of supplying a liquid to a surface of the substrate on an opposite side to the stage. When holding the substrate, each of the plurality of holders moves toward the central axis along a surface of the stage so as to surround a peripheral edge of the substrate and the space between the stage and the substrate.

A cleaning apparatus for a vacuum exhaust system capable of preventing redeposition of deposits on a downstream side of a vacuum pump is provided. A cold trap capable of causing deposits to be formed by cooling gas containing a sublimation component, at least one first vacuum pump disposed upstream of the cold trap, at least one first piping connecting the first vacuum pump to the cold trap, at least one second vacuum pump disposed downstream of the cold trap, and at least one second piping connecting the second vacuum pump to the cold trap are provided. At least a part of the first vacuum pump or the first piping is configured to be heated to higher than or equal to a sublimation temperature of the sublimation component. The cold trap is configured to be cooled to less than or equal to the sublimation temperature of the sublimation component.

The invention relates to a device for generating a CO.sub.2 snow jet, comprising an expansion channel (6) which extends in a flow direction (14) for generating a CO.sub.2 gas/CO.sub.2 snow mixture based on liquid CO.sub.2, said expansion channel having an inlet opening (18) for supplying liquid CO.sub.2 and an outlet opening (22) for discharging the CO.sub.2 gas/CO.sub.2 snow mixture. The device also comprises a nozzle for generating an outer jet which surrounds and accelerates the CO.sub.2 gas/CO.sub.2 snow mixture discharged from the outlet opening of the expansion channel. The expansion channel has multiple channel sections (36a, 36b, 36c, 36d, 36e) arranged one behind the other in the flow direction, wherein the expansion channel cross section (40) that lies on a plane orthogonal to the flow direction changes locally in a particular transition or transition region (38a, 38b, 38c, 38d, 38e, 38f) between the channel sections, and the expansion channel (6) cross section (46d) at the upstream end (48d) of a particular channel section (36d) is larger than the expansion channel (6) cross section (46c) at the upstream end (48c) of the channel section (36c) arranged upstream of said channel section (36d) in the flow direction (14).

Provided is a substrate processing apparatus comprising a processing chamber, a rotatable substrate support configured to hold a substrate in the processing chamber, a freezing device that is in contact with or separated from the substrate support and is configured to cool the substrate support, a mechanism configured to rotate the substrate support and raise and lower the freezing device, a power supply part configured to supply a radio frequency (RF) power, and a power supply line that penetrates through the freezing device, has a contact portion, and is configured to switch supply and stop of supply of the RF power by connecting the contact portion to a specific position of the substrate support or disconnecting the contact portion from the specific position of the substrate support.