A reusable apparatus, such as a medical instrument or tool, is decontaminated by applying pressure waves with direct contact of the pressure wave applicator to the reusable apparatus in an open bath in a sufficient dosage to remove contamination but without adversely affecting the ability to reuse the apparatus.

A reusable apparatus, such as a medical instrument or tool, is decontaminated by applying pressure waves with direct contact of the pressure wave applicator to the reusable apparatus in an open bath in a sufficient dosage to remove contamination but without adversely affecting the ability to reuse the apparatus.

A pipe cleaning assembly has a connection fixture having a body defining a cavity. A first aperture, opposing first auxiliary aperture coaxially aligned with the first aperture, second aperture, and opposing second auxiliary aperture coaxially aligned with the second aperture are in fluid communication with the cavity. A first connection flange extends from and surrounds the first aperture, a second connection flange extends from and surrounds the second aperture, a third connection flange extends from and surrounds the first auxiliary aperture, and a fourth connection flange extends from and surrounds the second auxiliary aperture. A bonnet is inserted through the second auxiliary aperture and is positioned within the cavity of the body and includes a generally cylindrical wall and a plurality of openings formed through the cylindrical wall to direct fluid flowing through the connection fixture.

A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.

A cleaning apparatus for cleaning of medical machine components of machines such as CPAP machines, nebulizers, PEEP machines, and the like is disclosed herein. The cleaning apparatus comprises a container body. A carousel is configured for placement within the container body. The carousel comprises a support structure. The carousel further comprises a helical ramp attached to the support structure and extending helically from an operative top end of the support structure to an operative bottom end of the support structure along a periphery of the support structure.

A cleaning apparatus for cleaning of medical machine components of machines such as CPAP machines, nebulizers, PEEP machines, and the like is disclosed herein. The cleaning apparatus comprises a container body. A carousel is configured for placement within the container body. The carousel comprises a support structure. The carousel further comprises a helical ramp attached to the support structure and extending helically from an operative top end of the support structure to an operative bottom end of the support structure along a periphery of the support structure.

A method is provided for cleaning of a processing system comprising a wafer processing chamber and a pumping line in fluid connection with the wafer processing chamber. The method includes initiating cleaning of the wafer processing chamber by activating a chamber cleaning source and initiating cleaning of at least a portion of the pumping line by activating a foreline cleaning source coupled to the pumping line. The method also includes monitoring, at a downstream endpoint detector coupled to the pumping line, a level of a signature substance. The method further includes determining, by the downstream endpoint detector, at least one of a first endpoint of the cleaning of the wafer processing chamber or a second endpoint of the cleaning of the pumping line based on the monitoring.

A method is provided for cleaning of a processing system comprising a wafer processing chamber and a pumping line in fluid connection with the wafer processing chamber. The method includes initiating cleaning of the wafer processing chamber by activating a chamber cleaning source and initiating cleaning of at least a portion of the pumping line by activating a foreline cleaning source coupled to the pumping line. The method also includes monitoring, at a downstream endpoint detector coupled to the pumping line, a level of a signature substance. The method further includes determining, by the downstream endpoint detector, at least one of a first endpoint of the cleaning of the wafer processing chamber or a second endpoint of the cleaning of the pumping line based on the monitoring.

A deposit removing device disclosed herein removes a deposit that adheres to an exhaust pipe through which gas is exhausted from a chamber that manufactures a semiconductor crystal. The deposit removing device includes: a valve that opens and closes an exhaust outlet that communicates with the exhaust pipe; a sealing cover and a fixed table configured to store the valve, into which an inert gas is introduceable, and configured to isolate the exhaust outlet from the outside; and an exhaust outlet opening/closing portion that includes a cylinder for driving the valve and a cylinder for driving the sealing cover or the fixed table. The cylinder drives the valve to open and close the exhaust outlet, and the cylinder drives the sealing cover or the fixed table to introduce the atmosphere into the sealing cover.

A handle for use with a firearm cleaning rod may include an ergonomic handle. The ergonomic handle comprises a core having a top end, a grip, and a base; a bolster disposed on the top end provides an additional point for a user to apply force to the cleaning rod when cleaning a firearm. Below the bolster is the grip, which consists of a palm-engaging section and a finger-engaging section, where an inward curvature exists on the palm-engaging surface below the bolster; both sections may be covered with a textured overall for improved gripping by a user. Within the base is a housing that contains a connector for the purpose of securely connecting a cleaning rod to the ergonomic handle. The cleaning rod may include an accessory end for connecting firearm barrel cleaning accessories.