A substrate processing system includes a protective film forming liquid supplying unit which supplies a protective film forming liquid to one surface of a substrate, a protective film forming unit which solidifies or hardens the protective film forming liquid and forms a protective film on the one surface of the substrate, a suction unit which suctions the one surface of the substrate, a processing unit which executes predetermined processing with respect to the other surface of the substrate in a state that the one surface of the substrate is suctioned by the suction unit, and a removing liquid supplying unit which has a removing liquid discharge port that discharges a removing liquid being capable of removing the protective film and supplies the removing liquid toward the one surface of the substrate from the removing liquid discharge port.

A system and method for reducing the spread of contamination via tactile interaction with a touch screen display device for a medical imaging system in a clinical environment which includes a series of display device protection procedures each involving unfurling a rolled disposable cover which was stored adjacent to said display device and after removal of liner tape from two opposing ends of the unfurled disposable cover, attaching the same to the display device.

A system and method for reducing the spread of contamination via tactile interaction with a touch screen display device for a medical imaging system in a clinical environment which includes a series of display device protection procedures each involving unfurling a rolled disposable cover which was stored adjacent to said display device and after removal of liner tape from two opposing ends of the unfurled disposable cover, attaching the same to the display device.

The present invention discloses a liner made to fit and have direct contact within the warming dish of a wax warmer to serve the purpose of receiving, melting, cooling, remolding, removing, storing, re-using and safely discarding scented wax. The wax may be removed from the liner by method of flexibly release the cooled wax from its edges and base. The emptied liner may then be reused, disposed or recycled. The present invention is shaped to fill a variety of wax warmer designs, as well as for structural stability for multiple uses or branding purposes. Such contours on the sides and bottom of the liner help prevent the formation of condensation or vacuum forming, which can hinder both the removal and release of the liner from the receiving portion of a wax warmer or warming platform and aid in the removal of the solidly formed wax from within the liner itself.

Some implementations described herein provide a shutter disc for use during a conditioning process within a processing chamber of a deposition tool. The shutter disc described herein includes a material having a wave-shaped section to reduce heat transfer to the shutter disc and to provide relief from thermal stresses. Furthermore, the shutter disc includes a deposition of a thin-film material on a backside of the shutter disc, where a diameter of the shutter disc causes a spacing between an inner edge of the thin-film material and an outer edge of a substrate support component. The spacing prevents an accumulation of material between the thin film material and the substrate support component, reduces tilting of the shutter disc due to a placement error, and reduces heat transfer to the shutter disc.

Some implementations described herein provide a shutter disc for use during a conditioning process within a processing chamber of a deposition tool. The shutter disc described herein includes a material having a wave-shaped section to reduce heat transfer to the shutter disc and to provide relief from thermal stresses. Furthermore, the shutter disc includes a deposition of a thin-film material on a backside of the shutter disc, where a diameter of the shutter disc causes a spacing between an inner edge of the thin-film material and an outer edge of a substrate support component. The spacing prevents an accumulation of material between the thin film material and the substrate support component, reduces tilting of the shutter disc due to a placement error, and reduces heat transfer to the shutter disc.

Some implementations described herein provide a shutter disc for use during a conditioning process within a processing chamber of a deposition tool. The shutter disc described herein includes a material having a wave-shaped section to reduce heat transfer to the shutter disc and to provide relief from thermal stresses. Furthermore, the shutter disc includes a deposition of a thin-film material on a backside of the shutter disc, where a diameter of the shutter disc causes a spacing between an inner edge of the thin-film material and an outer edge of a substrate support component. The spacing prevents an accumulation of material between the thin film material and the substrate support component, reduces tilting of the shutter disc due to a placement error, and reduces heat transfer to the shutter disc.

Some implementations described herein provide a shutter disc for use during a conditioning process within a processing chamber of a deposition tool. The shutter disc described herein includes a material having a wave-shaped section to reduce heat transfer to the shutter disc and to provide relief from thermal stresses. Furthermore, the shutter disc includes a deposition of a thin-film material on a backside of the shutter disc, where a diameter of the shutter disc causes a spacing between an inner edge of the thin-film material and an outer edge of a substrate support component. The spacing prevents an accumulation of material between the thin film material and the substrate support component, reduces tilting of the shutter disc due to a placement error, and reduces heat transfer to the shutter disc.

A sleeve apparatus for protecting a robotic kitchen arm from contamination. The sleeve includes a proximal end, a distal end, a passageway extending from the proximal end to the distal end, and an exterior surface. The passageway has an effective diameter less than the effective diameter of the robotic kitchen arm such that the exterior surface of the sleeve apparatus is substantially fold-free when the robotic arm is in the extended configuration. Methods of cleaning a robotic kitchen arm are also described.

A sleeve apparatus for protecting a robotic kitchen arm from contamination. The sleeve includes a proximal end, a distal end, a passageway extending from the proximal end to the distal end, and an exterior surface. The passageway has an effective diameter less than the effective diameter of the robotic kitchen arm such that the exterior surface of the sleeve apparatus is substantially fold-free when the robotic arm is in the extended configuration. Methods of cleaning a robotic kitchen arm are also described.