As an example, an apparatus includes a hood portion and a body portion. The hood portion includes a distal opening adapted to be positioned around a periphery of a wall-mounted appliance. The hood portion includes a sidewall of a pliant material extending outwardly from a perimeter of the distal opening to terminate in a proximal opening having a perimeter that is spaced apart from and opposing the distal opening. The proximal opening is to provide access to an interior volume of the hood portion corresponding to the sidewall between the first and second openings. The body portion extends from the perimeter of the proximal opening in a longitudinal direction that is substantially transverse to a central axis of the distal opening. An outlet in fluid communication with the body portion is to enable discharge of fluids from an interior volume of the body portion.

A high-pressure cleaning apparatus including a high-pressure pump that includes a suction chamber, at least one pump chamber in which liquid is pressurized, and a pressure chamber arranged downstream of the pump chamber is disclosed. The high-pressure pump includes a return line via which the pressure chamber is in flow communication with the suction chamber, and a valve unit by which a free cross-sectional area of the return line is changeable. The high-pressure cleaning apparatus also includes a drive unit associated with the valve unit, a control unit coupled to the drive unit and a pressure sensor coupled to the control unit for detecting liquid pressure on the pressure side of the pump chamber. Depending on the signal of the pressure sensor, the liquid pressure can be controllable to a predetermined or predeterminable liquid pressure by changing of the free cross-sectional area of the return line.

An apparatus for removing at least one foreign substance includes a detection unit detecting the at least one foreign substance adhered to a holding surface of a suction holding unit configured to suck and hold a substrate, a removal unit removing the at least one foreign substance adhered to the holding surface using fluid, and a movement mechanism configured to move the detection unit and the removal unit.

Disclosed is a method of cleaning a substrate processing apparatus in which a substrate having a surface wet by a liquid is brought into contact with a supercritical fluid so as to perform a drying process of drying the substrate. The method includes a cleaning gas filling process and an exhausting process. The cleaning gas filling process fills a cleaning gas containing isopropyl alcohol in the substrate processing apparatus. The exhausting process exhausts the cleaning gas from an inside of the substrate processing apparatus after the cleaning gas filling process.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A substrate processing system includes multiple assemblies framed and including such that each of the assemblies includes a substrate processing apparatus which supplies a processing fluid to a substrate and processes the substrate, a fluid supply control apparatus including a fluid control device which controls flow of the processing fluid supplied to the substrate processing apparatus, and a drive equipment apparatus including a drive device which drives movement of the fluid control device in the fluid supply control apparatus.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

The disclosed invention utilizes deformable gaskets configured to form a seal which slides through the grooves and across the tops of escalator and travelator treads and using evacuation cleaning components as either a complete escalator and travelator tread cleaning machine or an accessory device configured to operate with an existing vacuum carpet evacuation apparatus. The disclosed gaskets in combination with evacuation and spray nozzle manifolds connected by escalator and travelator groove passages form a basic embodiment of the disclosed tread engagement assembly. In certain embodiments, the disclosed apparatus utilizes certain components of carpet evacuation equipment in combination with the disclosed v for cleaning escalator and travelator treads, including both the risers and treads of the escalator and travelator.

The objective of the present invention is to provide a handpiece of a skin care device that injects a solution into skin using a tip module making contact with the skin and simultaneously absorbs ambient air and a substance, such as waste products exiting from the skin, etc., thereby achieving an effect of cleaning or improving the skin using the solution without a needle causing pain, a scar, etc. In addition, the objective of the present invention is to provide a handpiece of a skin care device that rotates a tip module making contact with a skin and allows a solution to be stably injected through the rotating tip module in order to more effectively inject the solution into the skin and further increase a skin improvement effect.

Disclosed is a method for liquid-treating a substrate. In a method for treating a substrate, the substrate may be treated by supplying a treatment liquid onto the rotating substrate by using a first nozzle and a second nozzle, the first nozzle supplies the treatment liquid to an area including a central area on the substrate, and the second nozzle supplies the treatment liquid to a peripheral area of the substrate.