The present invention provides a new filter cleaning method that has cleaning performance superior to that of ultrasonic cleaning. The method for cleaning a filter of the present invention includes the steps of: generating a shock wave; and bringing the shock wave into contact with a filter to which a filler adhered, wherein in the shock wave contacting step, a pressure applied to the filter by the shock wave is 0.07 MPa or more.

A grinding apparatus includes an ultrasonic cleaning unit. The ultrasonic cleaning unit includes a pair of side walls that surround the inside and the outside of a base and grindstones, a bottom surface that connects the pair of side walls, a jet port that is formed in at least either of the side walls or the bottom surface and that jets a cleaning liquid toward at least either of the base or the grindstones, a cleaning liquid supply section that supplies the cleaning liquid to the jet port; an ultrasonic vibrator that applies an ultrasonic wave to the cleaning liquid supplied from the cleaning liquid supply section, and an electric power supply section that applies electric power to the ultrasonic vibrator.

A method for cleaning an object having a surface, the method including steps of (1) delivering acoustic waves to the object to dislodge debris from the surface; (2) delivering a cleaning medium to the surface to collect dislodged debris; (3) delivering the acoustic waves to the object to acoustically treat and atomize the cleaning medium and the dislodged debris; (4) applying a vacuum airflow to collect atomized cleaning medium and dislodged debris; (5) delivering a rinsing medium to the surface; (6) delivering the acoustic waves to the object to acoustically treat and atomize the rinsing medium; and (7) applying the vacuum airflow to collect atomized rinsing medium.

Disclosed herein is a sonic cleaning insert. In one example, the sonic cleaning insert includes a carousel configured to rotate about a central axis. The carousel further includes a platform having an outer perimeter. The platform is radially disposed about the central axis. The carousel has an inner ring and an outer ring circumscribing the inner ring. A plurality of partitions couple the inner ring and the outer ring to the platform. The plurality of partitions are arranged at a predetermined angle about the central axis. The carousel further includes a plurality of holders. Each holder is formed from a portion of the platform, a portion of each of the inner ring and outer ring, and a first sidewall and a second sidewall formed from the plurality of partitions. The carousel is configured for immersion in an ultrasonic vibrating fluid.

A support device for a substrate and a substrate cleaning apparatus, the support device including a support on which the substrate is loadable; a rotor that rotates the support; and an oscillator that oscillates the substrate in a direction perpendicular to a surface of the substrate, wherein the substrate oscillates according to a natural frequency of the substrate or a natural frequency of particles on the substrate.

A cleaning module for cleaning a wafer comprises a wafer gripping device configured to support a wafer in a vertical orientation and comprises a catch cup and a gripper assembly. The catch cup comprises a wall that has an annular inner surface that defines a processing region and has an angled portion that is symmetric about a central axis of the wafer gripping device. The gripper assembly comprises a first plate assembly, a second plate assembly, a plurality of gripping pin, and a plurality of loading pin. The gripping pins are configured to grip a wafer during a cleaning process and the loading pins are configured to grip the wafer during a loading and unloading process. The cleaning module further comprises a sweep arm coupled to a nozzle mechanism configured to deliver liquids to the front and back side of the wafer.

A process of using a chemical gel cleaning formulation to clean a cooling tower fill, comprising the steps of applying a pre-rinse fluid to the fill; applying the chemical gel cleaning formulation to the fill, wherein the chemical gel cleaning formulation includes glycerin, at least one polysaccharide, at least one corrosion inhibitor, at least one surfactant, and at least one acid; applying a descaling fluid to the fill; applying a neutralizer solution to the fill to neutralize the pH of residual fluid on the fill surface; and rinsing the fill with a rinsing fluid to remove residual chemical gel cleaning formulation and descaling fluid, residual neutralizer solution, and dissolved deposits from the fill.

An apparatus for processing a substrate includes a housing, a support unit that supports the substrate in the housing, a nozzle that dispenses a processing liquid onto the substrate, and a liquid supply unit that supplies the processing liquid to the nozzle. The liquid supply unit includes a container having a storage space in which the processing liquid is stored, a liquid supply tube through which the processing liquid flows from the container to the nozzle, and an ultrasonic-wave application member that applies ultrasonic waves to the processing liquid before the processing liquid is supplied to the nozzle. The ultrasonic-wave application member includes a liquid reservoir having an interior space in which a liquid is received and an ultrasonic generator that applies ultrasonic waves to the liquid received in the liquid reservoir. Part of the liquid supply tube is immersed in the liquid received in the liquid reservoir.

An apparatus and method for prevention and treatment of marine biofouling on a surface to be treated by the apparatus includes a body defining a cavity, the body terminating in a distal open end that is adapted, in use, to be in the vicinity of a surface to be treated such that the surface forms a first end wall of a chamber within the cavity; an acoustic transducer mounted within the cavity to form an opposite second end wall of the chamber, the acoustic transducer being adapted to cause acoustic pressure fluctuations; and a reservoir for a liquid, the reservoir including an inlet passage and a plurality of mutually spaced outlet passages for liquid flow from the reservoir into the chamber, the outlet passages at least partially surrounding the chamber in the vicinity of the distal open end.

Providing a substrate cleaning device and a substrate cleaning method having high detergency. Provided is a substrate cleaning device including: a substrate rotating mechanism that rotates a substrate; and a first nozzle and a second nozzle that eject an ultrasonic cleaning solution toward a predetermined surface of the substrate that is rotated, wherein the first nozzle and the second nozzle are held in one casing.