Patent classifications
B23K26/359
EXPOSURE SYSTEM, LASER CONTROL PARAMETER PRODUCTION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
An exposure system that performs scanning exposure of a semiconductor substrate by irradiating a reticle with a pulse laser beam includes a laser apparatus configured to emit a pulse laser beam, an illumination optical system through which the pulse laser beam is guided to the reticle, a reticle stage, and a processor configured to control emission of the pulse laser beam from the laser apparatus and movement of the reticle by the reticle stage. The reticle includes a region in which multiple kinds of patterns are arranged in a mixed manner in a scanning width direction orthogonal to a scanning direction of the scanning exposure. The processor instructs the laser apparatus about a target wavelength such that the laser apparatus emits the pulse laser beam of a wavelength with which dispersion of best focus positions corresponding to respective patterns of the multiple kinds of patterns is minimum.
EXPOSURE SYSTEM, LASER CONTROL PARAMETER PRODUCTION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
An exposure system that performs scanning exposure of a semiconductor substrate by irradiating a reticle with a pulse laser beam includes a laser apparatus configured to emit a pulse laser beam, an illumination optical system through which the pulse laser beam is guided to the reticle, a reticle stage, and a processor configured to control emission of the pulse laser beam from the laser apparatus and movement of the reticle by the reticle stage. The reticle includes a region in which multiple kinds of patterns are arranged in a mixed manner in a scanning width direction orthogonal to a scanning direction of the scanning exposure. The processor instructs the laser apparatus about a target wavelength such that the laser apparatus emits the pulse laser beam of a wavelength with which dispersion of best focus positions corresponding to respective patterns of the multiple kinds of patterns is minimum.
Method for machining a workpiece surface by means of a laser
A method for machining at least one workpiece surface to apply a texture pattern to at least one section of the workpiece surface using a laser, based on image data specifying an image of the texture pattern applied to the at least one section of the workpiece surface and model data specifying a three-dimensional geometry of a surface form corresponding to the at least one section of the workpiece surface. Control data and segment data are generated based on the image and model data. The control data specify one or more segment sequences for each track line. Each segment sequence has track segments where the laser guides the texture pattern application to the at least one section of the workpiece surface; wherein the track segments of a segment sequence include one or more laser track segments where the laser travels in the switched-on state at a constant machining setpoint speed.
Method for machining a workpiece surface by means of a laser
A method for machining at least one workpiece surface to apply a texture pattern to at least one section of the workpiece surface using a laser, based on image data specifying an image of the texture pattern applied to the at least one section of the workpiece surface and model data specifying a three-dimensional geometry of a surface form corresponding to the at least one section of the workpiece surface. Control data and segment data are generated based on the image and model data. The control data specify one or more segment sequences for each track line. Each segment sequence has track segments where the laser guides the texture pattern application to the at least one section of the workpiece surface; wherein the track segments of a segment sequence include one or more laser track segments where the laser travels in the switched-on state at a constant machining setpoint speed.
PROCESSING DEVICE AND PROCESSING METHOD FOR SOLID STRUCTURE
A processing device and a processing method for a solid structure are used to perform a processing procedure on the solid structure. The processing device for the solid structure of the invention provides energy to the solid structure by various electromagnetic radiation sources to cause the solid structure to generate qualitative changes or defects, that is, to form a modified layer. Stress and/or hardness of the modified layer are/is different from that of other non-processed areas.
METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD
A process of forming a non-optically detectable authentication marking (210,320, 410,535) in a diamond (200,300). Authentication marking (210,320,410,535) is formed adjacent the outer surface of an article formed from a diamond material having intrinsic optical centers. Method includes the step of applying an image of predesigned authentication marking(210,320,410,535) to a region (201,310,530) of a diamond (200,300) at or adjacent the surface of the diamond (200,300) by way of a direct laser writing; wherein the fluorescence background of the diamond material from intrinsic optical center is suppressed by authentication marking(210,320, 410, 535) under fluorescent imaging, such that the non-optically detectable identifiable authentication marking (210,320,410,535) is viewable against the fluorescence background at the region (201,310,530) of the diamond (200,300) where the authentication marking (210,320,410,535) is applied.
METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD
A process of forming a non-optically detectable authentication marking (210,320, 410,535) in a diamond (200,300). Authentication marking (210,320,410,535) is formed adjacent the outer surface of an article formed from a diamond material having intrinsic optical centers. Method includes the step of applying an image of predesigned authentication marking(210,320,410,535) to a region (201,310,530) of a diamond (200,300) at or adjacent the surface of the diamond (200,300) by way of a direct laser writing; wherein the fluorescence background of the diamond material from intrinsic optical center is suppressed by authentication marking(210,320, 410, 535) under fluorescent imaging, such that the non-optically detectable identifiable authentication marking (210,320,410,535) is viewable against the fluorescence background at the region (201,310,530) of the diamond (200,300) where the authentication marking (210,320,410,535) is applied.
SYSTEM AND PROCESS FOR MANUFACTURING LASER MARKED ELASTOMER COMPONENTS
A system for manufacturing elastomeric components is provided. The system may include a molding station having a mold configured to receive an elastomeric material, form a pad that includes a plurality of untrimmed elastomeric components, and cure the pad. The system may further include an automated marking station comprising a laser and a camera. The automated marking station may be configured to remove the cured pad from the molding station, present the cured pad to the laser to form a mark on each of the untrimmed elastomeric components, and present the cured pad to the camera to capture an image of each mark. A process for manufacturing the elastomeric components is also provided.
Method for controlling a fibre drawing facility
The present invention concerns a method of determination of specific points of a rotary fibre forming spinner wheel (10) used in a fibre forming device (1), said method comprising the following steps: obtaining measurements of temperatures of the fibre forming spinner wheel obtained by means of a temperature measuring device (40) adapted to take measurements of temperatures of the spinner wheel at a plurality of angular positions of said measuring device in order to supply data to at least one calculation unit (30, 45) that constructs a curve representing the temperature as a function of the angular position of a temperature measuring device; processing said measurements by effecting a calculation of the second derivative of the curve of the temperature as a function of the angular position by means of a calculation unit (30); searching for at least one specific point for which the second derivative satisfies a predefined condition.
Processing device for forming pattern on surface of material by using diffraction of laser beam, and method thereof
A processing device to form a pattern on a surface of an object to be processed using diffraction of a laser beam emitted from a laser source, the device including: a main body providing a space to process the object using the laser beam emitted from the laser source; a laser transmission unit formed at a first portion of the main body, and configured to diffract the laser beam so that a diffracted laser beam is emitted toward the object; an actuator formed at a second portion of the main body, and connected to the laser transmission unit so as to change an emission pattern of the diffracted laser beam while rotating the laser transmission unit vertically/horizontally or in a set radius; and a controller provided at a third portion of the main body, and connected to the actuator to control an operation of the actuator.