Patent classifications
B23K2103/56
METHOD FOR SEPARATING A WORKPIECE
A method for separating a workpiece along a separation line by using laser pulses of a laser beam includes splitting the laser beam into a plurality of partial laser beams using a beam splitter optical unit, focusing the plurality of partial laser beams onto a surface of the workpiece and/or into a volume of the workpiece using a focusing optical unit, so that the plurality of partial laser beams are arranged next to one another and spaced apart from one another along the separation line, and ablating material of the workpiece along the separation line by introducing the laser pulses of the plurality of partial laser beams into the workpiece. The laser power per partial laser beam is adjusted depending on an ablation depth obtained in the workpiece.
Manufacturing process of element chip using laser grooving and plasma-etching
A manufacturing process of an element chip comprises a preparing step for preparing a substrate having first and second sides opposed to each other, the substrate containing a semiconductor layer, a wiring layer and a resin layer formed on the first side, and the substrate including a plurality of dicing regions and element regions defined by the dicing regions. Also, the manufacturing process comprises a laser grooving step for irradiating a laser beam onto the dicing regions to form grooves so as to expose the semiconductor layer along the dicing regions. Further, the manufacturing process comprises a dicing step for plasma-etching the semiconductor layer along the dicing regions through the second side to divide the substrate into a plurality of the element chips. The laser grooving step includes a melting step for melting a surface of the semiconductor layer exposed along the dicing regions.
Configurable fixture for cutting shapes
A fixture used in the manufacture of an eyepiece, to cut the eyepiece to a particular shape, and a method of using the fixture to cut the eyepiece to have a desired shape. Embodiments are directed to a configurable fixture to align, hold, and protect a plastic sheet (e.g., a wafer) while a laser cutting apparatus is cutting one or more eyepieces out of the wafer. During the cutting, the fixture protects the eyepieces from reflected laser light by providing voids around the laser cutting lines, and by supporting each eyepiece near its perimeter. The fixture can be quickly rearranged for different eyepieces, different eyepiece shapes, and/or different plastic sheet sizes.
Singulation of optical waveguide materials
Methods for singulating an optical waveguide material at a contour include directing a first laser beam onto a first side of the optical waveguide material to generate a first group of perforations in the optical waveguide material. A second laser beam is directed onto a second side of the optical waveguide material to generate a second group of perforations in the optical waveguide material. The second side is opposite the first side. The first group of perforations and the second group of perforations define a perforation zone at the contour. A third laser beam is directed at the perforation zone to singulate the optical waveguide material at the perforation zone.
SUBSTRATE AND METHOD FOR CUTTING THE SAME, AND ELECTRONIC DEVICE AND ELECTRONIC APPARATUS
A substrate includes at least two edges; and at least one end portion, each end portion is connected to two adjacent edges. The end portion includes a cutting section and two breaking sections; an end of the cutting section is connected to one of the two adjacent edges through a breaking section, and another end of the cutting section is connected to another one of the two adjacent edges through another breaking section. The cutting section is configured to be formed through cutting of a tool, and the breaking sections are configured to be formed under an action of a physical force.
FACET REGION DETECTION METHOD AND WAFER GENERATION METHOD
A facet region detection method includes a first irradiation step and a second irradiation step in which a first surface and a second surface, respectively, of an ingot are irradiated with light, and a first fluorescence detection step and a second fluorescence detection step in which distribution of the number of photons of fluorescence in the first surface and the second surface, respectively, is obtained. The facet region detection method further includes a first determination step and a second determination step in which a facet region and a non-facet region are determined in the first surface and the second surface on a basis of the number of photons of the fluorescence, and a calculation step in which an estimated position of a facet region inside the ingot is calculated based on the facet region in the first surface and the facet region in the second surface.
MARKING MACHINE AND WAFER PRODUCTION SYSTEM
Provided that is a marking machine for applying markings to an ingot having separating layers formed at a depth corresponding to a thickness of a wafer to be produced. The marking machine includes a reading unit configured to read the ingot information formed on the ingot, a control unit having a storage section configured to store the ingot information read by the reading unit, and a marking unit configured to mark, based on the ingot information stored in the storage section, information that includes the ingot information, to the wafer to be produced.
PEELING APPARATUS
There is provided a peeling apparatus including an ingot holding unit that has a holding surface for holding an ingot, a wafer holding unit that is capable of approaching and separating from the ingot holding unit and has a holding surface for holding under suction a wafer to be produced, and a cleaning brush that cleans peel-off surfaces at which the wafer to be produced has been peeled off from the ingot and thereby removes peeling swarf.
Laser processing apparatus
A laser processing apparatus includes two chuck tables for holding workpieces on their holding surfaces, an X-axis feed unit for moving the chuck tables which are being arrayed in an X-axis direction, a laser beam applying unit for applying a laser beam to the workpiece on one at a time of the chuck tables to process the workpiece, and a pair of delivery areas arrayed in the X-axis direction on both sides of the laser beam applying unit, for delivering workpieces to and from the chuck tables. The laser beam applying unit includes a laser oscillator, a beam condenser, and a laser beam scanning unit for displacing a position where the laser beam is applied to the holding surface of the one of the chuck tables.
Processing method of workpiece with laser power adjustment based on thickness measurement and processing apparatus thereof
A processing method of a workpiece used when the workpiece is processed is provided. The processing method of a workpiece includes a disposing step of disposing the workpiece in a gas containing a substance that generates an active species that reacts with the workpiece, a measurement step of measuring the distribution of the thickness of the workpiece disposed in the gas, and a laser beam irradiation step of irradiating the workpiece in the gas with a laser beam of which the power is adjusted based on the distribution of the thickness measured in the measurement step. In the laser beam irradiation step, the removal amount by which a region irradiated with the laser beam in the workpiece is removed by the active species is controlled by irradiating the workpiece with the laser beam of which the power is adjusted.