An imprint apparatus executes an imprint process for shaping an imprint material by using a mold. The apparatus includes a controller which obtains first height distribution information indicating a height distribution of a surface of a first substrate, and a measuring device which obtains second height distribution information indicating a height distribution of a surface of a second substrate. The controller controls the imprint process based on corrected height distribution information which is obtained by removing a first component that is an approximation function, of an order not more than a first predetermined order, for approximating the first height distribution information, from the first height distribution information, and a second component which is an approximation function, of an order not more than a second predetermined order, for approximating the second height distribution information.

A method of manufacturing a template, includes: covering a part of a first region of a substrate; processing another part of the first region to form a first pattern including a protrusion; covering the first region; and processing at least part of a second region of the substrate to form a second pattern including a depression.

Provided is a method for manufacturing a Fresnel lens mold by performing cutting process on a workpiece with a cutting tool, the Fresnel lens mold having a lens surface and an upright surface alternately arranged. The cutting tool has a first cutting edge having an arc shape with a radius r and a second cutting edge continuous to the first cutting edge. A machining apparatus repeatedly performs a first process of forming, with the first cutting edge, a lens mold surface serving as a mold of a lens surface of a Fresnel lens, and a second process of forming, with the second cutting edge, an upright mold surface serving as a mold of an upright surface of the Fresnel lens to manufacture the Fresnel lens mold.

Described herein are methods and systems for forming metal interconnect layers (MILs) on engineered templates and transferring these MILs to device substrates. This “off-device” approach of forming MILs reduces the complexity and costs of the overall process, allows using semiconductor processes, and reduces the risk of damaging the device substrates. An engineered template is specially configured to release a MIL when the MIL is transferred to a device substrate. In some examples, the engineered template does not include barrier layers and/or adhesion layers. In some examples, the engineered template comprises a conductive portion to assist with selective electroplating. Furthermore, the same engineered template may be reused to form multiple MILs, having the same design. During the transfer, the engineered template and device substrate are stacked together and then separated while the MIL is transitioned from the engineered template to the device substrate.

According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

Medical implants comprising biocompatible materials and having surface features that may assist in biocompatibility upon implantation in the body are described. Methods for manufacturing such implants are also described. The manufacturing process may include applying a biocompatible material to a texturized surface of a mold. The implants may include various features to assist their positioning, fixation, and/or identification during and/or after implantation.

An elastic microcell surface structure for an elastomer body with an outer film adhered and to a method for manufacturing the same, wherein the elastomer body includes a solid uneven structure formed of protruding portions and recess portions formed in its surface, and the outer film includes a zigzag uneven structure in a manner of being tightly wrapped around the protruding portions and recess portions of the solid uneven structure of the elastomer body.

The present invention relates to a method for preparing a plurality of imprints on an inner surface of a polymeric substrate comprising the steps of: a) contacting a liquid polymeric mixture with a mold having an imprint forming surface thereon; b) curing the liquid polymeric mixture of step a) to form said polymeric substrate having said plurality imprints on said inner surface, when cured; and c) removing said mold from said polymeric substrate. There is also provided a method of forming the mold having the imprint forming surface thereon.

An imprint lithography method of configuring an optical layer includes imprinting first features of a first order of magnitude in size on a side of a substrate with a patterning template, while imprinting second features of a second order of magnitude in size on the side of the substrate with the patterning template, the second features being sized and arranged to define a gap between the substrate and an adjacent surface.

A method includes applying a polymer to a mold, the mold having microstructures with the polymer flowing into the microstructures when applied to the mold. The method includes pressing an inorganic substrate onto the polymer. The method includes curing the polymer to fix the polymer to the inorganic substrate to form an optical element from the polymer and the inorganic substrate, the optical element having microstructures formed by the microstructures in the mold. The method includes releasing the optical element from the mold.