An imprint method includes bringing a mold and an uncured imprint material supplied onto a substrate into contact with each other, enhancing viscoelasticity of the imprint material, making position adjustment of the mold and the substrate, and curing the imprint material. The imprint material is supplied onto a shot region of the substrate, and time between bringing the mold brought into contact with the imprint material and starting enhancing viscoelasticity is shorter when the shot region includes an outer periphery of the substrate than when the shot region does not include the outer periphery of the substrate.

A forming apparatus forms a formable material using a mold including a contact region to be brought into contact with the formable material on a substrate. The apparatus includes a controller configured to perform processing of bringing the contact region and the formable material on the substrate into contact with each other. The controller controls the processing so as to bring the mold and the substrate close to each other at a first relative speed and then bring the mold and the substrate close to each other at a second relative speed lower than the first relative speed, and controls switching from the first relative speed to the second relative speed so as to compensate a manufacturing error of the mold.

Forming features in the surface of a bicycle component involves depositing a substance onto a substrate in a geometric pattern to form a transfer medium. Forming features may also involve positioning the transfer medium relative to an unformed bicycle component, and forming a negative of the geometric pattern in the bicycle component through the application of heat and/or pressure to the transfer medium and the unformed bicycle component. The transfer medium may be configured for use in the molding of carbon fiber reinforced plastic (“CFRP”) bicycle components and may include a substrate formed of a flexible material, and a geometric pattern formed of a hard material, the hard material different than the flexible material.

A pattern forming method including forming a curable film using a curable composition that contains metal oxide nanoparticles, on a substrate, pressing a mold having a line and space pattern against the curable film to transfer the line and space pattern to the curable film, curing the curable film to which the line and space pattern has been transferred while pressing the mold against the curable film, to form a cured film, and peeling the mold off the cured film to form a line and space pattern on the substrate, in which a line width x of the line and space pattern formed on the substrate in a base portion and a volume average primary particle diameter φ of the metal oxide nanoparticles satisfy an expression of 0.03x<φ<0.08x, and an expression of x≤500 nm.

In various embodiments, disclosed herein is a device comprising a non-planar surface, wherein nanostructures are fabricated on the non-planar surface. Also provided herein are methods of making and using a device comprising a non-planar surface, wherein nanostructures are fabricated on the non-planar surface. Further provided herein are methods of using a device comprising one or more non-planar surfaces, wherein the non-planar surfaces comprise one or more microstructures or nanostructures, comprising the steps: (a) using the device for its ordinary purpose; and (b) wherein the microstructures or nanostructures present in the device prevent proliferation of bacteria.

The present invention provides an information processing apparatus including a processing unit configured to perform a process of outputting information indicating a contact state between a mold and a composition on a substrate, wherein the processing unit obtains a plurality of points representing a contour shape of a portion where the mold and the composition on the substrate are in contact with each other while at least one process of a contact process and a mold releasing process is performed, and outputs the information indicating the contact state based on the plurality of points.

An imprint apparatus that transfers a pattern of a mold to an imprint material on a substrate, includes: a mold having a pattern region in which the pattern is formed; a substrate holding unit having a substrate mounting surface on which the substrate is mounted; a driving unit configured to drive the mold and press the mold against the substrate coated with an imprint material at three or more positions; and a control unit configured to control a pressing force of the driving unit based on a distance in an XY plane parallel to the substrate mounting surface between the driving unit and a top portion of a convex shape of at least one of the mold and the substrate deformed by the deformation mechanism.

Provided is a display apparatus for a three-dimensional (3D) head-up display (HUD), the display apparatus including a transparent substrate, a polarizing film layer provided on the transparent substrate, and a lenticular lens provided on the polarizing film layer opposite to the transparent substrate, wherein the lenticular lens includes an adhesive layer, a base substrate provided on the adhesive layer, and a pattern layer provided on the base substrate opposite to the adhesive layer.

Disclosed herein is a system for slurry coating leveling. The system includes a guide frame and a scrapper apparatus coupled to the guide frame. The scrapper apparatus includes a plurality of scrapper fingers aligned substantially parallel to each other. The system also includes a contour guide coupled to the scrapper fingers. The contour guide is configured to guide movement of the scrapper fingers across a surface of a component having a slurry coating. The scrapper fingers conform to a contour profile of the surface to level the slurry coating on the surface of the component.

An imprint apparatus includes a deforming mechanism for deforming a pattern region of a mold, and performs, after first processing for applying a first deformation amount, second processing for curing an imprint material in a state where the imprint material and the pattern region are in contact with each other and where a second deformation amount is given to the mold by the deforming mechanism to reduce an overlay error between each shot region and the pattern region. A magnitude relation between a driving force of the deforming mechanism required to set a deformation amount of the mold to the first deformation amount and a driving force of the deforming mechanism required to set the deformation amount of the mold to the second deformation amount varies depending on a magnitude of the driving force of the deforming mechanism for setting the deformation amount to the second deformation amount.