An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.

An extreme ultraviolet light generation apparatus includes a chamber in which a target substance supplied to a plasma generation region is irradiated with laser light to generate extreme ultraviolet light, a laser device generating the laser light, a target supply unit supplying a droplet of the target substance toward the plasma generation region, a target collection unit collecting the target substance which has not been irradiated with the laser light, a first gas supply unit supplying a buffer gas into the chamber, and a processor controlling the first gas supply unit so that, in a period of the droplet being output, a first flow rate of the buffer gas to be supplied from the first gas supply unit in at least a part of a first period is smaller than a second flow rate of the buffer gas to be supplied from the first gas supply unit in a second period.

A method for generating secondary radiation includes providing a target material in a target region, and applying a pulse sequence of laser pulses to the target material in the target region. Secondary radiation is generated as a result of interaction of the target material with the pulse sequence. The pulse sequence has a pulse train of at least two pre-pulses and a main pulse following the pulse train. A total energy of the pre-pulses of the pulse train is between 0.2 mJ and 10 mJ. A temporal pulse interval between successive pre-pulses of the pulse train is between 50 ps and 500 ns. A pulse energy of the main pulse is between 2 mJ and 50 mJ. A pulse duration of the main pulse is between 15 fs and 300 fs. A temporal pulse interval between the pulse train and the main pulse is between 1 ns and 1 s.

An extreme ultraviolet (EUV) light source, including a first laser source for emitting a first laser beam, a second laser source for emitting a second laser beam, a combiner configured to combine the first laser beam and the second laser beam, and a beam-guide configured to jointly guide the first laser beam and the second laser beam into a target region for generating EUV radiation. The combiner is configured to supply the first laser beam and the second laser beam to the beam-guide for joint beam guidance via common optical units in a spatially separated manner and with a lateral offset.

The present disclosure provides a lithography system including a radiation source and a control system. The control system includes a laser beam monitor configured to monitor laser beam generated from the radiation source and collect laser beam data, an analysis module configured to analyze the laser beam data and generate an analysis result, and a control module configured to adjust the radiation source according to the analysis result from the analysis module.

A target generation device includes nozzle including a nozzle hole through which a liquid target substance for generating extreme ultraviolet light is discharged; a first piezoelectric element arranged at a different position in a first direction with respect to the nozzle, and configured to vibrate the nozzle by expanding and contracting in the first direction; and a second piezoelectric element arranged at a different position in the first direction with respect to the first piezoelectric element, and configured to vibrate the nozzle via the first piezoelectric element by expanding and contracting in the first direction.

Embodiments described herein cover systems and methods to generate a high-powered laser beam, direct the high-powered laser beam to be incident upon a source material, wherein the source material generates X-ray radiation upon being energized by the high-powered laser, and provide one or more components of a test system positioned to receive the X-ray radiation generated from the source material.

The present disclosure provides an extreme ultraviolet (EUV) lithography system including a radiation source and an EUV control system integrated with the radiation source. The EUV control system includes a 3-dimensional diagnostic module (3DDM) designed to collect a laser beam profile of a laser beam from the radiation source in a 3-dimensional (3D) mode, an analysis module designed to analyze the laser beam profile, a database designed to store the laser beam profile, and an EUV control module designed to adjust the radiation source. The analysis module is coupled with the database and the EUV control module. The database is coupled with the 3DDM and the analysis module. The EUV control module is coupled with the analysis module and the radiation source.

A laser system for providing working laser pulses for interaction with targets, which pass periodically one after another through a destination area, includes a laser pulse emitting device for emitting the working laser pulses. At least one working laser pulse of the working laser pulses is assigned to each respective target of the targets. The laser system further includes a control device for controlling the laser pulse emitting device. The control device is configured to set a respective emission time of each respective working laser pulse such that, as an ON working laser pulse, the respective working laser pulse strikes a respective target in the destination area in order to interact with the respective target, or as an OFF working laser pulse, temporally misses the respective target in the destination area in order not to interact with the respective target.

An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.