Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

The present invention relates to a process for producing a nail varnish composition, characterized in that at least one polyurethane urea which has no ionically hydrophilizing groups and has been dissolved in a solvent or solvent mixture is used, the solvent comprising one or more monohydroxy-functional alcohols or being a solvent mixture comprising organic solvents and containing ≧50% by weight, based on the total mass of the solvent mixture, of at least one monohydroxy-functional alcohol. The present invention further relates to a nail varnish composition obtainable by the process according to the invention and to a process for producing a cosmetic coating on nails using the nail varnish compositions according to the invention.

The present invention relates to a process for producing a nail varnish composition, characterized in that at least one polyurethane urea which has no ionically hydrophilizing groups and has been dissolved in a solvent or solvent mixture is used, the solvent comprising one or more monohydroxy-functional alcohols or being a solvent mixture comprising organic solvents and containing ≧50% by weight, based on the total mass of the solvent mixture, of at least one monohydroxy-functional alcohol. The present invention further relates to a nail varnish composition obtainable by the process according to the invention and to a process for producing a cosmetic coating on nails using the nail varnish compositions according to the invention.

An aqueous composition for removing nail polish from a wearer's nail(s) is disclosed. This nail polish remover is essentially free of organic solvents, such as acetone, ethyl acetate, butyl acetate, and the like. The aqueous nail polish remover includes at least one amide of an aminoalcohol at a concentration of about 0.1% or greater in water.

An aqueous composition for removing nail polish from a wearer's nail(s) is disclosed. This nail polish remover is essentially free of organic solvents, such as acetone, ethyl acetate, butyl acetate, and the like. The aqueous nail polish remover includes at least one amide of an aminoalcohol at a concentration of about 0.1% or greater in water.

The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.

The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.

A water-soluble and/or water-swellable hybrid polymer comprising: (i) from 5 wt.-% to 95 wt.-% water-soluble and/or water-swellable polysaccharide polymer; (ii) from 5 wt.-% to 95 wt.-% synthetic polymer comprising: (a) from 90 mol-% to 99.9 mol-%, preferably 95 mol-% to 99.5 mol-% of repeating units according to Formula (1) ##STR00001## (b) from 0.01 mol-% to 10 mol-%, preferably to 5 mol-%, more preferably to 3 mol-% of crosslinking or branching units, wherein the crosslinking or branching units result from the incorporation of a monomer comprising at least two olefinically unsaturated double bonds;
wherein components (i) and (ii) are polymerized by radical precipitation polymerization in a polar solvent.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.