A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing nail polish are also provided.

A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing nail polish are also provided.

A photopolymerizable composition for forming a photopolymerized nail top coating of a substantially uniform mixture of ethyl cellulose and crosslinked (meth)acrylate polymer is disclosed.

A photopolymerizable composition for forming a photopolymerized nail top coating of a substantially uniform mixture of ethyl cellulose and crosslinked (meth)acrylate polymer is disclosed.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

A nail coating remover cream mask comprises a film forming agent from about 5% to about 70% by weight to the total weight, water from about 2% to about 45% by weigh to the total weight, a first solvent from about 2% to about 45% by weight, a second solvent from about 2% to about 80% by weight to the total weight, a third solvent from about 2% to about 80% by weight to the total weight, and a moisture agent from about 0.1% to about 5% by weight to the total weight, sodium polyacrylate from about 0.1% to about 30% by weight to the total weight, sodium hydroxide from about 0.1% to about 30% by weight to the total weight of the nail coating remover cream mask, and a method to use the nail coating remover cream mask to remove nail coating.

A nail coating remover cream mask comprises a film forming agent from about 5% to about 70% by weight to the total weight, water from about 2% to about 45% by weigh to the total weight, a first solvent from about 2% to about 45% by weight, a second solvent from about 2% to about 80% by weight to the total weight, a third solvent from about 2% to about 80% by weight to the total weight, and a moisture agent from about 0.1% to about 5% by weight to the total weight, sodium polyacrylate from about 0.1% to about 30% by weight to the total weight, sodium hydroxide from about 0.1% to about 30% by weight to the total weight of the nail coating remover cream mask, and a method to use the nail coating remover cream mask to remove nail coating.

A nail coating remover cream mask comprises a film forming agent from about 5% to about 70% by weight, relative to the total weight of the nail coating remover cream mask, water from about 2% to about 45% by weight, relative to the total weight of the nail coating remover cream mask, a first solvent from about 2% to about 45% by weight, relative to the total weight of the nail coating remover cream mask, a second solvent from about 2% to about 80% by weight, relative to the total weight of the nail coating remover cream mask, a third solvent from about 2% to about 80% by weight, relative to the total weight of the nail coating remover cream mask, and a moisture agent from about 0.1% to about 5% by weight, relative to the total weight of the nail coating remover cream mask, and a method to use the nail coating remover cream mask to remove nail coating.

A nail coating remover cream mask comprises a film forming agent from about 5% to about 70% by weight, relative to the total weight of the nail coating remover cream mask, water from about 2% to about 45% by weight, relative to the total weight of the nail coating remover cream mask, a first solvent from about 2% to about 45% by weight, relative to the total weight of the nail coating remover cream mask, a second solvent from about 2% to about 80% by weight, relative to the total weight of the nail coating remover cream mask, a third solvent from about 2% to about 80% by weight, relative to the total weight of the nail coating remover cream mask, and a moisture agent from about 0.1% to about 5% by weight, relative to the total weight of the nail coating remover cream mask, and a method to use the nail coating remover cream mask to remove nail coating.