Patent classifications
A61Q3/04
PHOTOPOLYMERIZABLE COATING FOR NAILS
A photopolymerizable composition for forming a photopolymerized nail top coating of a substantially uniform mixture of ethyl cellulose and crosslinked (meth)acrylate polymer is disclosed.
PHOTOPOLYMERIZABLE COATING FOR NAILS
A photopolymerizable composition for forming a photopolymerized nail top coating of a substantially uniform mixture of ethyl cellulose and crosslinked (meth)acrylate polymer is disclosed.
Compositions For Removing Surface Coatings
A low VOC composition for removing coatings from a wide variety of surfaces that is biodegradable, made from renewable resources, and environmentally friendly. The composition further pertains to products which can remove a surface coating with little mechanical action.
Compositions For Removing Surface Coatings
A low VOC composition for removing coatings from a wide variety of surfaces that is biodegradable, made from renewable resources, and environmentally friendly. The composition further pertains to products which can remove a surface coating with little mechanical action.
COMPOSITIONS COMPRISING SOLVENT, A MONOALCOHOL AND GLYCERIN
The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.
COMPOSITIONS COMPRISING SOLVENT, A MONOALCOHOL AND GLYCERIN
The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.
NAIL POLISH REMOVING COMPOSITION
The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.
NAIL POLISH REMOVING COMPOSITION
The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.
COMPOSITIONS FOR REMOVING NAIL POLISH
The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.
COMPOSITIONS FOR REMOVING NAIL POLISH
The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.