A semiconductor device having a high cutoff resistance capable of suppressing local current/electric field concentration and current concentration at a chip termination portion due to an electric field variation between IGBT cells due to a shape variation and impurity variation during manufacturing. The semiconductor device is characterized by including an emitter electrode formed on a front surface of a semiconductor substrate via an interlayer insulating film, a collector electrode formed on a back surface of the semiconductor substrate, a first semiconductor layer of a first conductivity type in contact with the collector electrode, a second semiconductor layer of a second conductivity type, a central area cell, and an outer peripheral area cell located outside the central area cell.

In some embodiments, the present disclosure relates to an integrated chip structure. The integrated chip structure includes a first doped region and a second doped region disposed within a substrate. A data storage structure is arranged over the substrate and laterally between the first doped region and the second doped region. An isolation structure is arranged within the substrate along a first side of the data storage structure. The first doped region is laterally between the isolation structure and the data storage structure. A remnant is arranged over and along a sidewall of the isolation structure. The remnant includes a first material having a vertically extending segment and a horizontally extending segment protruding outward from a sidewall of the vertically extending segment.

Arrays of memory cells including an isolation region between first and second access lines, a first memory cell having a control gate in contact with the first access line and a charge storage node having a curved cross-section having a first end in contact with a first portion of the isolation region on a first side of the isolation region and a second end in contact with a second portion of the isolation region on the isolation region's first side, and a second memory cell having a control gate in contact with the second access line and a charge storage node having a curved cross-section having a first end in contact with the first portion of the isolation region on a second side of the isolation region and a second end in contact with the second portion of the isolation region on the isolation region's first side.

A semiconductor device includes a first power supply line, a second power supply line, a first ground line, a switch circuit connected to the first and the second power supply line, and a switch control circuit connected to the first ground line and the first power supply line. The switch circuit includes a first and a second transistor of a first conductive type. A first gate electrode of the first transistor is connected to a second gate electrode of the second transistor. The switch control circuit includes a third transistor of a second conductive type, and a fourth transistor of a third conductive type. A third gate electrode of the third transistor is connected to a fourth gate electrode of the fourth transistor. A semiconductor device includes a signal line that electrically connects a connection point between the third and fourth transistor to the first and second gate electrode.

A semiconductor device includes a chip having a first main surface which serves as a device surface and a second main surface which serves as a non-device surface, and a first conductivity type drift gradient region formed in the chip, and having a concentration profile in which an impurity concentration of an end portion on the first main surface side is lower than an impurity concentration of an end portion on the second main surface side.

A semiconductor device includes a semiconductor layer including a first surface and a second surface opposite to the first surface; a source trench formed in the semiconductor layer and including a side wall that is continuous with the second surface; an insulation layer formed on the second surface of the semiconductor layer; an embedded electrode arranged in the source trench and insulated from the side wall of the source trench by the insulation layer; a source interconnection formed on the insulation layer; and a source contact plug electrically connecting the source interconnection to the semiconductor layer. The source contact plug contacts the embedded electrode, and the source contact plug contacts the semiconductor layer via a part of the side wall of the source trench.

A power semiconductor device includes: a semiconductor body with a drift region of a first conductivity type; a first load terminal at a first side of the semiconductor body; a second load terminal at a second side of the semiconductor body opposite the first side, the power semiconductor device configured to conduct a load current between the load terminals; a control terminal at the first side configured to receive a control signal for controlling the load current; within an active region at least partially surrounded by an edge termination region, first trenches laterally confining mesas for conducting the load current, having control trenches electrically connected to the control terminal, and arranged in accordance with a first average pitch; and in a region laterally overlapping the control terminal, second trenches arranged in accordance with a second average pitch different from the first average pitch and electrically connected to the control terminal.

The disclosure relates to a semiconductor die with a semiconductor device in a semiconductor body, the semiconductor body comprising a silicon carbide substrate; an epitaxial silicon carbide layer system on a first side of the silicon carbide substrate; an interruption layer; wherein the interruption layer is embedded either into the silicon carbide substrate or into the epitaxial silicon carbide layer system, in each case at a vertical distance from the first side of the silicon carbide substrate.

A component carrier which includes a laminated stack having at least one electrically insulating layer structure and/or at least one electrically conductive layer structure, and a component having at least one electrically conductive connection structure and embedded in the stack, wherein the at least one electrically conductive connection structure of the component is exposed with respect to the stack so that a free exposed end of the at least one electrically conductive connection structure of the component is flush with or extends beyond an exterior main surface of the stack.

In some examples, a transistor comprises a gallium nitride (GaN) layer; a GaN-based alloy layer having a top side and disposed on the GaN layer, wherein source, drain, and gate contact structures are supported by the GaN layer; and a first doped region positioned in a drain access region and extending from the top side into the GaN layer.