A semiconductor device includes: insulating patterns spaced apart from each other in a first direction and in a second direction that intersects the first direction; a substrate insulating layer on first side surfaces of the insulating patterns; a device isolation layer on second side surfaces of the insulating patterns; channel layers on the insulating patterns and spaced apart from each other in a vertical direction that is perpendicular to an upper surface of the device isolation layer; gate structures vertically overlapping the insulating patterns, surrounding each of the channel layers, and extending in the second direction; source/drain regions provided outside the gate structures; and backside contact structures electrically connected to the source/drain regions and provided below the source/drain regions, wherein the insulating patterns include protrusions protruding in the vertical direction from an upper surface of the device isolation layer, and, in a region in which the insulating patterns vertically overlap the gate structures, a vertical distance between a lower surface of a lowermost channel layer among the channel layers and an upper surface of the protrusions is greater than a vertical distance between the channel layers.

A semiconductor structure includes a stacked device structure having a first field-effect transistor having a first source/drain region, and a second field-effect transistor vertically stacked above the first field-effect transistor, the second field-effect transistor having a second source/drain region and a gate region having first sidewall spacers. The stacked device structure further includes a frontside source/drain contact disposed on a first portion of a sidewall and a top surface of the second source/drain region, a first metal via connected to the frontside source/drain contact and to a first backside power line, and second sidewall spacers disposed on a first portion of the first metal via. The first sidewall spacers comprise a first dielectric material and the second sidewall spacers comprise a second dielectric material different than the first dielectric material.

A method includes forming a lower transistor in a lower wafer, wherein the lower transistor includes a lower source/drain region, forming a contact plug electrically connecting to the lower source/drain region, and forming a metal line over the lower transistor. A first portion of the metal line is vertically aligned to the lower source/drain region. The method further includes bonding an upper wafer to the lower wafer, and forming an upper transistor in the upper wafer. The upper transistor includes an upper source/drain region, and is vertically aligned to a second portion of the metal line. A first interconnect structure is formed on the lower wafer and electrically connecting to the lower transistor. A second interconnect structure is formed on the upper wafer and electrically connecting to the upper transistor.

A method includes forming a first transistor in a first wafer, wherein the first transistor includes a first source/drain region, forming a first bond pad electrically coupling to the first source/drain region, forming an second transistor in a second wafer, wherein the second transistor includes a second source/drain region, forming a second bond pad electrically coupling to the second source/drain region, and bonding the second wafer to the first wafer, with the second bond pad being bonded to the first bond pad.

An IC device includes a first and second stacked transistor structures including respective first and second and third and fourth transistors in a semiconductor substrate, first and second bit lines and a word line on one of a front or back side of the semiconductor substrate, and a power supply line on the other of the front or back side. The first transistor includes a source/drain (S/D) terminal electrically connected to the first bit line, a S/D terminal electrically connected to a S/D terminal of the second transistor, and a gate electrically connected to the word line, the third transistor includes a S/D terminal electrically connected to the second bit line, a S/D terminal electrically connected to a S/D terminal of the fourth transistor, and a gate electrically connected to the word line, and the second and fourth transistors include S/D terminals electrically connected to the power supply line.

A semiconductor structure is provided that includes a first stacked FET cell including a second FET stacked over a first FET, and a second stacked FET cell located adjacent to the first stacked FET cell and including a fourth FET stacked over a third FET. The structure further includes a first backside source/drain contact structure located beneath the first stacked FET cell and contacting a source/drain region of the first FET, a second backside source/drain contact structure located beneath the second stacked FET cell and contacting a source/drain region of the third FET, and an angled cut region laterally separating the first backside source/drain contact structure from the second backside source/drain contact structure.

A semiconductor device includes active regions extending on a substrate in a first direction, gate structures intersecting the active regions and extending on the substrate in a second direction, source/drain regions in recess regions in which the active regions are recessed, on both sides of each of the gate structures, and contact plugs connected to the source/drain regions, wherein each of the source/drain regions include first and second epitaxial layers sequentially stacked on the active regions in the recess regions in a third direction perpendicular to an upper surface of the substrate, respectively, and wherein ratios of the first epitaxial layer thickness in the third direction to the second epitaxial layer thickness in the third direction are different in different ones of the source/drain regions.

A region containing a high proportion of crystal components and a region containing a high proportion of amorphous components are formed separately in one oxide semiconductor film. The region containing a high proportion of crystal components is formed so as to serve as a channel formation region and the other region is formed so as to contain a high proportion of amorphous components. It is preferable that an oxide semiconductor film in which a region containing a high proportion of crystal components and a region containing a high proportion of amorphous components are mixed in a self-aligned manner be formed. To separately form the regions which differ in crystallinity in the oxide semiconductor film, first, an oxide semiconductor film containing a high proportion of crystal components is formed and then process for performing amorphization on part of the oxide semiconductor film is conducted.

A method includes forming a gate stack, growing a source/drain region on a side of the gate stack through epitaxy, depositing a contact etch stop layer (CESL) over the source/drain region, depositing an inter-layer dielectric over the CESL, etching the inter-layer dielectric and the CESL to form a contact opening, and etching the source/drain region so that the contact opening extends into the source/drain region. The method further includes depositing a metal layer extending into the contact opening. Horizontal portions, vertical portions, and corner portions of the metal layer have a substantially uniform thickness. An annealing process is performed to react the metal layer with the source/drain region to form a source/drain silicide region. The contact opening is filled to form a source/drain contact plug.

The present disclosure provides a shift register, a gate driving circuit and a display panel. The shift register includes a transistor, which includes a gate electrode, a gate insulating layer, an active layer, a first electrode and a second electrode; the first and second electrode are of comb-shaped structures; the first electrode includes first and second comb tooth portions arranged at intervals, and a first comb handle portion connecting the first and second comb tooth portions; and comb tooth electrodes of the first comb tooth portions have a different length from those of the second comb tooth portions; the second electrode includes third and fourth comb tooth portions arranged at intervals, and a second comb handle portion connecting the third and fourth comb tooth portions; the first and third comb tooth portions form an inter-digital structure, the second and fourth comb tooth portions form an inter-digital structure.