Methods for forming packaged semiconductor devices including backside power rails and packaged semiconductor devices formed by the same are disclosed. In an embodiment, a device includes a first integrated circuit device including a first transistor structure in a first device layer; a front-side interconnect structure on a front-side of the first device layer; and a backside interconnect structure on a backside of the first device layer, the backside interconnect structure including a first dielectric layer on the backside of the first device layer; and a first contact extending through the first dielectric layer to a source/drain region of the first transistor structure; and a second integrated circuit device including a second transistor structure in a second device layer; and a first interconnect structure on the second device layer, the first interconnect structure being bonded to the front-side interconnect structure by dielectric-to-dielectric and metal-to-metal bonds.

A semiconductor device and methods of fabricating the same are disclosed. The method includes forming a fin structure on a substrate, forming a superlattice structure with first and second nanostructured layers on the fin structure, forming a polysilicon structure around the superlattice structure, forming a source/drain opening within the superlattice structure, forming a first conductivity type S/D region within a first portion of the S/D opening, forming an isolation layer on the first conductivity type S/D region and within a second portion of the S/D opening, forming a second conductivity type S/D region on the isolation layer and within a third portion the S/D opening, and replacing the polysilicon structure and the second nanostructured layers with a gate structure that surrounds the first nanostructured layers. Materials of the first and second nanostructured layers are different from each other and the second conductivity type is different from the first conductivity type.

A non-active gate structure is formed over a shallow trench isolation (STI) region that is adjacent to at least one fin structure of a semiconductor device that includes a fin-based transistor. The non-active gate structure includes at least one support structure that extends from the gate in a direction that is approximately orthogonal to the direction in which the main body of the non-active gate structure extends. The support structure provides structural support for the non-active gate structure, which increases the stability of the non-active gate structure relative to a gate structure that does not include the support structure.

A device includes first nanostructures over a substrate; second nanostructures over the substrate, wherein the first nanostructures are laterally separated from the second nanostructures by an isolation structure between the first nanostructures and the second nanostructures; a first gate structure around each first nanostructure and around each second nanostructure, wherein the first gate structure extends over the isolation structure; third nanostructures over the substrate; and a second gate structure around each third nanostructure, wherein the second gate structure is separated from the first gate structure by a dielectric wall.

A 3D semiconductor device including: a first level including a first single crystal layer and first transistors, which each include a single crystal channel; a first metal layer with an overlaying second metal layer; a second level including second transistors, overlaying the first level; a third level including third transistors, overlaying the second level; a fourth level including fourth transistors, overlaying the third level, where the second level includes first memory cells, where each of the first memory cells includes at least one of the second transistors, where the fourth level includes second memory cells, where each of the second memory cells includes at least one of the fourth transistors, where the first level includes memory control circuits, where second memory cells include at least four memory arrays, each of the four memory arrays are independently controlled, and at least one of the second transistors includes a metal gate.

A field-effect transistor includes a substrate, a channel on the substrate including a stem including silicon extending in a vertical direction from the substrate and a number of prongs including silicon extending in a horizontal direction from the stem and spaced apart from each other along the vertical direction, an interfacial layer surrounding the stem and the prongs of the channel, a dielectric layer on the interfacial layer and surrounding the stem and the prongs of the channel, and a metal gate on the dielectric layer and surrounding the stem and the prongs of the channel.

In an embodiment, a method includes: patterning a lower semiconductor nanostructure, an upper semiconductor nanostructure, and a dummy nanostructure, the dummy nanostructure disposed between the lower semiconductor nanostructure and the upper semiconductor nanostructure, the dummy nanostructure including doped silicon; forming an opening between the lower semiconductor nanostructure and the upper semiconductor nanostructure by etching the doped silicon of the dummy nanostructure; forming an isolation structure in the opening; and depositing a gate dielectric around the isolation structure, the upper semiconductor nanostructure, and the lower semiconductor nanostructure.

Provided is a semiconductor structure with shared gated devices. The semiconductor structure comprises a substrate and a bottom dielectric isolation (BDI) layer on top of the substrate. The structure further comprises a pFET region that includes a p-doped Source-Drain epitaxy material and a first nanowire matrix above the BDI layer. The structure further comprises an nFET region that includes a n-doped Source-Drain epitaxy material and a second nanowire matrix above the BDI layer. The structure further comprises a conductive gate material on top of a portion of the first nanowire matrix and the second nanowire matrix. The structure further comprises a vertical dielectric pillar separating the pFET region and the nFET region. The vertical dielectric pillar extends downward through the BDI layer into the substrate. The vertical dielectric pillar further extends upward through the conductive gate material to a dielectric located above the gate region.

A method for forming a semiconductor device includes patterning a substrate to form a strip including a first semiconductor material, forming an isolation region along a sidewall of the strip, an upper portion of the strip extending above the isolation region, forming a dummy structure along sidewalls and a top surface of the upper portion of the strip, performing a first etching process on an exposed portion of the upper portion of the strip to form a first recess, the exposed portion of the strip being exposed by the dummy structure, after performing the first etching process, reshaping the first recess to have a V-shaped bottom surface using a second etching process, wherein the second etching process is selective to first crystalline planes having a first orientation relative to second crystalline planes having a second orientation, and epitaxially growing a source/drain region in the reshaped first recess.

A semiconductor structure includes a first field effect transistor including a first gate spacer having first laterally-straight bottom edges that coincide with top edges of first laterally-straight sidewalls of the first gate dielectric. The semiconductor structure further includes a second field effect transistor including a second gate dielectric that includes at least one discrete gate-dielectric opening that overlies a respective second active region, and a second gate spacer including a contoured portion that overlies and laterally surrounds a second gate electrode, and at least one horizontally-extending portion that overlies the second active region and including at least one discrete gate-spacer openings. The second field effect transistor may have a symmetric or non-symmetric configuration.