A silicon carbide semiconductor device includes a silicon carbide layer 32 of a first conductivity type, a silicon carbide layer 36 of a second conductivity type, a gate trench 20, a gate electrode 79 provided in the gate trench 20, and a protection trench 10 formed to a depth greater than the gate trench 20. A region in the horizontal direction that includes both the gate trench 20 and a protection trench 10 that surrounds the gate trench 20 with at least a part of the gate trench 20 left unenclosed is a cell region, and a region in the horizontal direction that includes a protection trench 10 and in which a gate pad 89 or a lead electrode connected to the gate pad is disposed is a gate region.

A trench DMOS transistor with a very low on-state drain-to-source resistance and a high gate-to-drain charge includes one or more floating islands that lie between the gate and drain to reduce the charge coupling between the gate and drain, and effectively lower the gate-to-drain capacitance.

A laterally diffused metal oxide semiconductor (LDMOS) transistor structure with improved unclamped inductive switching immunity. The LDMOS includes a substrate and an adjacent epitaxial layer both of a first conductivity type. A gate structure is above the epitaxial layer. A drain region and a source region, both of a second conductivity type, are within the epitaxial layer. A channel is formed between the source and drain region and arranged below the gate structure. A body structure of the first conductivity type is at least partially formed under the gate structure and extends laterally under the source region, wherein the epitaxial layer is less doped than the body structure. A conductive trench-like feed-through element passes through the epitaxial layer and contacts the substrate and the source region. The LDMOS includes a tub region of the first conductivity type formed under the source region, and adjacent laterally to and in contact with said body structure and said trench-like feed-through element.

A semiconductor device includes: a semiconductor chip having a main surface; an output region formed over the main surface with output elements being arranged in the output region; an inner element region surrounded by the output region and insulated and isolated from the output region with a first element different from the output elements being arranged in the inner element region; a first wiring layer formed over the main surface so as to cover the output region, and including a first output wiring electrically connected to the output elements; and a second wiring layer formed over the first wiring layer, and including second output wirings electrically connected to the first output wiring and a connection wiring insulated and isolated from the second output wirings, the connection wiring extending across the output region from the inner element region to an outer region outside the output region.

An electronic device is integrated on a chip of semiconductor material having a main surface and a substrate region with a first type of conductivity. The electronic device has a vertical MOS transistor, formed in an active area having a body region with a second conductivity type. A set of one or more cells each one having a source region of the first conductivity, a gate region of electrically conductive material in a gate trench extending from the main surface in the body region and in the substrate region, and an insulating gate layer, and a termination structure with a plurality of termination rings surrounding at least part of the active area on the main surface, each termination ring having a floating element of electrically insulating material in the termination trench extending from the main surface in the chip and at least one bottom region of said semiconductor material of the second conductivity type extending from at least one deepest portion of a surface of the termination trench in the chip; the termination trenches have a depth from the main surface decreasing moving away from the active area.

A method for manufacturing a semiconductor structure includes at least following steps. A device layer is formed on a first semiconductor substrate. The device layer is separated from the first semiconductor substrate. A dielectric layer is formed on a second semiconductor substrate. The device layer is bonded onto the dielectric layer.

A silicon carbide semiconductor device includes a silicon carbide substrate, a gate insulating film, a gate electrode, an interlayer insulating film, and a gate interconnection. The silicon carbide substrate includes: a first impurity region; a second impurity region provided on the first impurity region; and a third impurity region provided on the second impurity region so as to be separated from the first impurity region. A trench has a side portion and a bottom portion, the side portion extending to the first impurity region through the third impurity region and the second impurity region, the bottom portion being located in the first impurity region. When viewed in a cross section, the interlayer insulating film extends from above the third impurity region to above the gate electrode so as to cover the corner portion.

A diode includes: a p-type semiconductor substrate; an n-type semiconductor layer; a p-type isolation region formed to surround a predetermined region of the n-type semiconductor layer on the p-type semiconductor substrate; an n-type buried layer formed across the p-type semiconductor layer and the n-type semiconductor layer within the predetermined region; an n-type collector wall formed in the n-type semiconductor layer; a p-type anode region and a plurality of n-type cathode regions formed in a diode formation region; and a p-type guard ring formed to surround the diode formation region in a region between the diode formation region of the surface layer of the n-type semiconductor layer and the p-type isolation region. A transistor for reducing a leakage current is formed by the p-type anode region, the p-type guard ring, and an n-type semiconductor between the p-type anode region and the p-type guard ring.

A low dynamic resistance, low capacitance diode of a semiconductor device includes a heavily-doped n-type substrate. A lightly-doped n-type layer 1 micron to 5 microns thick is disposed on the n-type substrate. A lightly-doped p-type layer 3 microns to 8 microns thick is disposed on the n-type layer. The low dynamic resistance, low capacitance diode, of the semiconductor device includes a p-type buried layer, with a peak dopant density above 110.sup.17 cm.sup.3, extending from the p-type layer through the n-type layer to the n-type substrate. The low dynamic resistance, low capacitance diode also includes an n-type region disposed in the p-type layer, extending to a top surface of the p-type layer.

III-nitride materials are generally described herein, including material structures comprising III-nitride material regions and silicon-containing substrates. Certain embodiments are related to gallium nitride materials and material structures comprising gallium nitride material regions and silicon-containing substrates.