An embodiment includes a tie-off circuit includes multiple field effect transistors (FETs), and a node isolation circuit that is connected to a first output node and a second output node of the tie-off circuit. The node isolation circuit consists of a first FET with a third output node and a second FET with a fourth output node. The second output node includes a logical LO node and is coupled to a gate of the first FET and generates a TIE HI output.

A device includes a plurality of STI regions, a plurality of semiconductor strips between the STI regions and parallel to each other, and a plurality of semiconductor fins over the semiconductor strips. A gate stack is disposed over and crossing the plurality of semiconductor fins. A drain epitaxy semiconductor region is disposed on a side of the gate stack and connected to the plurality of semiconductor fins. The drain epitaxy semiconductor region includes a first portion adjoining the semiconductor fins, wherein the first portion forms a continuous region over and aligned to the plurality of semiconductor strips. The drain epitaxy semiconductor region further includes second portions farther away from the gate stack than the first portion. Each of the second portions is over and aligned to one of the semiconductor strips. The second portions are parallel to each other, and are separated from each other by a dielectric material.

Diffusion regions having the same conductivity type are arranged on a side of a second wiring and a side of a third wiring, respectively under a first wiring connected to a signal terminal. Diffusion regions are separated in a whole part or one part of a range in a Y direction. That is, under first wiring, diffusion regions are only formed in parts opposed to diffusion regions formed under the second wiring and third wiring connected to a power supply terminal or a ground terminal, and a diffusion region is not formed in a central part in an X direction. Therefore, terminal capacity of the signal terminal can be reduced without causing ESD resistance to be reduced, in an ESD protection circuit with the signal terminal.

Components can be damaged if they are exposed to excess voltages. A device is disclosed herein which can be placed in series with a component and a node that may be exposed to high voltages. If the voltage becomes too high, the device can autonomously switch into a relatively high impedance state, thereby protecting the other components.

An electro-static discharge (ESD) protection unit, an array substrate, a liquid crystal display panel and a display device. The ESD protection unit includes: a thin-film transistor (TFT); a first trace; and a second trace. A gate electrode of the TFT is exposed in a region that is formed by the first trace and the second trace and corresponds to a pixel unit, and the gate electrode of the TFT is configured to collect electric charges generated between the first trace and the second trace. A source electrode of the TFT is connected to the first trace and a drain electrode of the TFT is connected to the second trace.

A transistor switch device is provided that exhibits relatively good voltage capability and relatively easy drive requirements to turn the device on and off. This can reduce transient drive current flows that may perturb other components.

In some embodiments, a method includes providing an input voltage to a level-shifting circuit, where the input voltage is in a first power domain, shifting the input voltage to an output voltage using the level-shifting circuit, where the output voltage is in a second power domain different from the first power domain, and where the level-shifting circuit is coupled to power supply voltages in the second power domain. The method further includes in response to an electrostatic discharge (ESD) event, turning off a first transistor coupled between a first node of the level-shifting circuit and a reference low voltage level of the second power domain.

A power MOSFET includes an insulating layer, a first conductivity type doping layer situated on a bottom of the insulating layer, a second conductivity type body situated on a bottom of the first conductivity type doping layer, a gate electrode adjacent to the bottom of the insulating layer and covered with an insulating film in other regions and projected to penetrate the second conductivity type body, and a source electrode including a first region situated on a top of the insulating layer and a second region in contact with the first conductivity type doping layer by penetrating the insulating layer.

Disclosed is an integrated protecting circuit, which detects ESD and EOS pulses to prevent an over-voltage from being applied to a semiconductor device. The integrated protecting circuit includes a first detector configured to detect an occurrence of an electrical over-stress between a first node to which a first voltage is applied and a second node to which a second voltage is applied, a second detector configured to detect an occurrence of an electrostatic discharge between the first and second nodes, a determination circuit configured to receive separate outputs of the first and second detectors at the same time and to generate a control signal, and a clamping device configured to perform a turn on/off operation in response to the control signal such that a voltage between the first and second nodes is clamped into a constant voltage.

Provided is an ESD protection circuit including: a power MOS transistor provided between an external connection terminal and a reference voltage terminal; a clamping circuit that is provided between the external connection terminal and a gate of the power MOS transistor and clamps a voltage between the external connection terminal and the gate of the power MOS transistor at a predetermined value or less; a first resistive element provided between the gate and a source of the power MOS transistor; and a MOS transistor that is provided in series with the power MOS transistor and has a gate and a source which are commonly connected to each other.