A backside illuminated (BSI) image sensor device includes a device layer, a doped isolation region and a doped radiation sensing region. The device layer has a front side and a backside, in which the device layer has a thickness greater than or equal to 4 m. The doped isolation region having a first dopant of a first conductivity is through the device layer to define a plurality of pixel regions of the device layer, in which the doped isolation region includes a first upper region adjacent to the front side and a first lower region between the first upper region and the backside, and the first upper region has a width less than a width of the first lower region. The doped radiation sensing region having a second dopant of a second conductivity opposite to the first conductivity is in one of the pixel regions of the device layer.

The present disclosure relates to a solid-state image pickup device, a manufacturing method, and an electronic apparatus, which can obtain high charge transfer efficiency from a photoelectric conversion unit to a floating diffusion layer. The floating diffusion layer is arranged in a rectangular shape so as to surround a gate electrode of a vertical transistor whose groove portion is rectangular. A reset drain is formed so as to be adjacent to the floating diffusion layer through a reset gate. A potential of the floating diffusion layer is reset to the same potential as that of the reset drain by applying a predetermined voltage to the reset gate. It is possible to apply the present disclosure to, for example, a CMOS solid-state image pickup device used in an image pickup device such as a camera.

A pixel array of an image sensor includes a substrate, a chromatic pixel including a first photodiode formed in the substrate and a color filter formed over the first photodiode, and an achromatic pixel including a second photodiode formed in the substrate, the second photodiode having a nano pillar pattern at a surface region of the substrate.

An image sensor includes a control circuit and pixels. Each pixel includes: a photosensitive area, a substantially rectangular storage area adjacent to the photosensitive area, and a read area. First and second insulated vertical electrodes electrically connected to each other are positioned opposite each other and delimit the storage area. The first electrode extends between the storage area and the photosensitive area. The second electrode includes a bent extension opposite a first end of the first electrode, with the storage area emerging onto the photosensitive area on the side of the first end. The control circuit operates to apply a first voltage to the first and second electrodes to perform a charge transfer, and a second voltage to block said transfer.

A system and method for forming pixels in an image sensor is provided. In an embodiment, a semiconductor device includes an image sensor including a first pixel region and a second pixel region in a substrate, the first pixel region being adjacent to the second pixel region. A first anti-reflection coating is over the first pixel region, the first anti-reflection coating reducing reflection for a first wavelength range of incident light. A second anti-reflection coating is over the second pixel region, the second anti-reflection coating reducing reflection for a second wavelength range of incident light that is different from the first wavelength range.

The present technology relates to an image sensor and an electronic apparatus which can make the image sensor a smaller without degrading performance of the image sensor. The image sensor includes a pixel array unit in which pixels including photoelectric conversion elements are arranged in a two dimensional manner, a row circuit configured to control row scanning of the pixel array unit, and a column processing unit configured to convert an analog signal read out from the pixel array unit into a digital signal. The pixel array unit is disposed on a first-layer substrate, and the row circuit and the column processing unit are disposed on different substrates which are underlying layers of the first-layer substrate and which are laminated on the first-layer substrate. The present technology is applicable to the image sensor.

A solid-state imaging device includes a pixel array section and a signal processing section. The pixel array section is configured to include a plurality of arranged rectangular pixels, each of which has different sizes in the vertical and horizontal directions, and a plurality of adjacent ones of which are combined to form a square pixel having the same size in the vertical and horizontal directions. The signal processing section is configured to perform a process of outputting, as a single signal, a plurality of signals read out from the combined plurality of rectangular pixels.

A light detection device comprises a pixel array including a plurality of pixel units. At least one pixel unit of the plurality of pixel units includes a photoelectric conversion region and a light guide region that guides light to the photoelectric conversion region. For each pixel unit of the at least one pixel unit, the light guide region includes nanostructures that direct light to the photoelectric conversion region, and the nanostructures have at least one characteristic that varies based on a position of the pixel unit in the pixel array.

A photodetection device according to one embodiment of the present disclosure includes: a semiconductor substrate having a first surface and a second surface that are opposed to each other and including a plurality of pixels arranged in an array in an in-plane direction; a first trench extending between the first surface and the second surface in an approximate middle of each of the plurality of pixels; a first semiconductor layer of a first conductivity type, the first semiconductor layer being provided in each of the plurality of pixels and extending between the first surface and the second surface; and a second semiconductor layer of a second conductivity type that is opposite to the first conductivity type, the second semiconductor layer being provided in each of the plurality of pixels and extending between the first surface and the second surface. When a reverse bias voltage is applied, a high electric field region is formed between the first semiconductor layer and the second semiconductor layer throughout between the first surface and the second surface.

The present disclosure relates to a method of manufacturing a light sensor comprising a matrix of pixels each associated to a micro-lens having a shift with respect to the pixel. For each axis of a plurality of axes passing by the optical center of the matric, for each pixel on the axis, and for each of a plurality light incident angles, a response value of the pixel is obtained. Based on the response values, for each axis and each pixel on the axis, a first function providing the light incident angle for which the pixel has the best response value is determined. For each axis and each pixel on the axis, a second value of the shift for bringing closer the first function to a target function is determined. The sensor is manufactured using the second values of shift.