A change in switching time due to temperature change is suppressed. A switching circuitry is provided with a resistance component having opposite characteristics to temperature dependence of a gate current of a power transistor which is switching-controlled by the switching circuitry, and a change in a gate current due to the temperature change is suppressed by a change in the above-described resistance component due to the temperature change.

Solid-state imaging devices and electronic devices with reduced noise are disclosed. In one example, a solid-state imaging device includes a first substrate including a photodiode and a transfer transistor, and a second substrate including an active load circuit and a differential pair circuit for a comparator, in which the active load circuit includes a first transistor, the differential pair circuit includes a second transistor, and transconductance of the first transistor is smaller than transconductance of the second transistor.

A semiconductor device includes a first structure component comprising a first transistor, a first dummy pattern, a second structure component comprising a second transistor and a second dummy pattern. The first structure component and the first dummy pattern have a first height, and the second structure component and the second dummy pattern have a second height lower than the first height.

To improve a tradeoff between ON voltage and ON/OFF loss while maintaining short-circuit tolerance, provided is a semiconductor device including an IGBT element; a super junction transistor element connected in parallel with the IGBT element; and a limiting section that limits a voltage applied to a gate terminal of the IGBT element more than a voltage applied to a gate terminal of the super junction transistor element.

An SJ-MOSFET and IGBT are provided in a single semiconductor chip. Furthermore, a balance is made between a carrier amount of n-type columns and a carrier amount of p-type columns, to encourage formation of a depletion layer in when a reverse voltage is applied in the SJ-MOSFET section. Provided is a includes a semiconductor substrate, a super junction structure formed on a front surface side of the semiconductor substrate, and a field stop layer formed at a position overlapping with the super junction structure on a back surface side of the semiconductor substrate, in a manner to not contact an end of the super junction structure on the back surface side.

A transistor that may include a substrate, a drain layer formed within the substrate at a first side of the substrate. A first well implant having a first implant depth, a second well implant having a second implant depth and a third well implant having a third implant depth. The first well implant, the second well implant and the third well implant formed within the substrate at the second side of the substrate. The second implant depth is greater than the first implant depth and the third implant depth is greater than the second implant depth. A gate formed at the second side of the substrate. The gate overlaps the first well implant by a first distance, the gate overlaps the second well implant by a second distance and the gate overlaps the third well implant by a third distance.

To achieve a reduced number of components mounted on a printed wiring board, and a reduced mounting area of components. A MOSFET semiconductor device according to the present invention includes a transistor as a plurality of semiconductor layers formed in a semiconductor substrate, and includes a source electrode, a gate electrode, a drain electrode, and a gate insulating film. The MOSFET semiconductor device further includes an insulating film formed on a first principal surface of the semiconductor substrate, a resistance film formed on the insulating film and electrically connected with the drain electrode, and a resistance electrode formed on the resistance film and serving as a surface mount terminal. With this configuration, reduction can be achieved in the number of components mounted on the printed wiring board, and hence in the mounting area of the components, and heat generating in the resistance film can be transferred to the printed wiring board to prevent malfunction of a MOSFET due to heat.

Systems and methods are provided for fabricating a static random access memory (SRAM) cell in a multi-layer semiconductor device structure. An example SRAM device includes a first array of SRAM cells, a second array of SRAM cells, a processing component, and one or more inter-layer connection structures. The first array of SRAM cells are formed in a first device layer of a multi-layer semiconductor device structure. The second array of SRAM cells are formed in a second device layer of the multi-layer semiconductor device structure, the second device layer being formed on the first device layer. The processing component is configured to process one or more input signals and generate one or more access signals. One or more inter-layer connection structures are configured to transmit the one or more access signals to activate the first device layer or the second device layer for allowing access to a target SRAM cell.

A semiconductor device and method of forming the same including, in one embodiment, a semiconductor die formed with a plurality of laterally diffused metal oxide semiconductor (LDMOS) cells. The semiconductor device also includes a redistribution layer electrically coupled to the plurality of LDMOS cells and a plurality of metallic pillars distributed over and electrically coupled to the redistribution layer.

Multiple gate stack portions are formed in a gate cavity by direct metal gate patterning to provide FinFETs having different threshold voltages. The different threshold voltages are obtained by selectively incorporating metal layers with different work functions in different gate stack portions.