An integrated circuit with a shallow trench isolated, low capacitance, ESD protection diode. An integrated circuit with a gate space isolated, low capacitance, ESD protection diode. An integrated circuit with a gate space isolated, low capacitance, ESD protection diode in parallel with a shallow trench isolated, low capacitance, ESD protection diode.

According to one embodiment, a semiconductor device is provided. The semiconductor device has a first region formed of semiconductor and a second region formed of semiconductor which borders the first region. An electrode is formed to be in ohmic-connection with the first region. A third region is formed to sandwich the first region. A first potential difference is produced between the first and the second regions in a thermal equilibrium state, according to a second potential difference between the third region and the first region.

A Schottky diode is formed on a silicon support. A non-doped GaN layer overlies the silicon support. An AlGaN layer overlies the non-doped GaN layer. A first metallization forming an ohmic contact and a second metallization forming a Schottky contact are provided in and on the AlGaN layer. First vias extend from the first metallization towards the silicon support. Second vias extend from the second metallization towards an upper surface.

An example arrangement includes a semiconductor device having at least two vertical diode devices spaced from one another by isolation trenches. Each of the vertical diode devices includes: a first diffusion region of a first P-type or N-type conductivity formed in a device side surface of the semiconductor die, the first diffusion region extending into a first epitaxial layer of a second P-type or N-type conductivity opposite the first conductivity type; the first epitaxial layer formed over a semiconductor substrate of the first P-type or N-type conductivity. The semiconductor substrate includes a backside surface facing away from the device side surface of the semiconductor die; metal contacts on the device side surface of the semiconductor die are electrically coupled to the first diffusion region; and stud bumps formed on the metal contacts and arranged to form terminals of the semiconductor device.

Materials, methods, structures and device including the same can provide a semiconductor device such as an LED using an active region corresponding to a non-polar face or surface of III-V semiconductor crystalline material. In some embodiments, an active diode region contains more non-polar III-V material oriented to a non-polar plane than III-V material oriented to a polar plane. In other embodiments, a bottom region contains more non-polar m-plane or a-plane surface area GaN than polar c-plane surface area GaN facing an active region.

A semiconductor device includes a first semiconductor region of a first conductive type, a second semiconductor region of a second conductive type, a first electrode, a third semiconductor region of the second conductive type, a fourth semiconductor region of the first conductive type, and a conductive portion. The second semiconductor region is provided on the first semiconductor region. The first electrode is provided on the second semiconductor region. The third semiconductor region is provided on the first electrode. The fourth semiconductor region is provided on the third semiconductor region. The conductive portion is surrounded by the third semiconductor region and an intervening insulation portion and is electrically connected to the first electrode.

A diode string having a plurality of diodes for ESD protection of a CMOS IC device comprises a first diode and a last diode in the diode string, wherein the first diode and the last diode are both formed on a bottom layer in a silicon substrate, and remaining diodes in the diode string. The remaining diodes are formed on a top layer placed on top of the bottom layer. The diode string further comprises a plurality of conductive lines that connect the first diode and the last diode on the bottom layer sequentially with the remaining diodes on the top layer to form a three dimensional (3D) structure of the diode string.

A diode is integrated on a semiconductor chip having anode and cathode surfaces opposite to each other. The diode comprises a cathode region extending inwardly from the cathode surface, a drift region extending between the anode surface and the cathode region, and a plurality of anode regions extending from the anode surface in the drift region. The diode further comprises a cathode electrode coupled with the cathode region, and an anode electrode that contacts one or more contacted anode regions of said anode regions and is electrically insulated from one or more floating anode regions of the anode regions. The diode is configured so that charge carriers are injected from the floating anode regions into the drift region in response to applying of a control voltage exceeding a threshold voltage.

Diodes for ESD protection devices are described. The diodes have low capacitance. In an example, a semiconductor device includes a substrate, an n-type epitaxial layer on the n-type substrate in a first region of the n-type substrate, and a p-type epitaxial layer on the n-type epitaxial layer with an interface between the n-type and p-type epitaxial layers. The p-type epitaxial layer has a first concentration of p-type dopants throughout the p-type epitaxial layer. Also, the semiconductor device includes a p-type dopant distribution straddling across the interface, the p-type dopant distribution having a first peak concentration of p-type dopants greater than the first concentration, and an n-type dopant distribution straddling across the interface, the n-type dopant distribution having a second peak concentration of n-type dopants. The second peak concentration is substantially same as the first peak concentration.

A micro light-emitting diode display panel and a micro light-emitting diode display device. A prism layer is provided with a void, which surrounds a light-emitting chip and is arranged axially symmetrically with respect to a center line of the light-emitting chip. Therefore, a distance between the light-emitting chip and the void in a transverse direction is equal to a distance between the light-emitting chip and the void in an oblique direction, and an angle at which a light ray emitted from the light-emitting chip is reflected at a contact surface between the prism layer and the void in the transverse direction is same as an angle at which a light ray emitted from the light-emitting chip is reflected at the contact surface in the oblique direction. Accordingly, a plane formed by the light-emitting chip and the contact surface is same as a tangential focal plane or a sagittal focal plane.